Thin films are at the core of a variety of applications. In that, hybrid films are unique as they combine the properties of their inorganic and organic constituents in the same film. To synthesize thin, conformal and uniform hybrid films with controlled composition, molecular layer deposition (MLD) is a familiar and accomplished technique. The general aim of this dissertation is to investigate routes to realize high-throughput, reproducible processing of hybrid films using MLD where the following chapter serves to lay the foundation and discuss the outline. Firstly, the chapter introduces the technique of molecular layer deposition (MLD) as a part of the well-established atomic layer deposition (ALD) and chemical vapor deposition (CVD) family. Further introduced is an ALD processing scheme called spatial ALD that can be used for high throughput MLD. Lastly, few challenges and research questions related to the upscaling of hybrid MLD using spatial MLD that this dissertation aims to answer are laid out.