Global Atomic Layer Deposition (ALD) Diaphragm Valves Market Research Report 2021
By: QYResearch
Publication Year: 2021

Market Analysis and Insights:
The global Atomic Layer Deposition (ALD) Diaphragm Valves market was valued at USD 65.36 million in 2020 and is expected to reach USD 123.59 million by the end of 2027, growing at a CAGR of 9.44% between 2021 and 2027.

Drivers and Restrains:
The research report has incorporated the analysis of different factors that augment the market's growth. It constitutes trends, restraints, and drivers that transform the market in either a positive or negative manner. This section also provides the scope of different segments and applications that can potentially influence the market in the future. The detailed information is based on current trends and historic milestones. This section also provides an analysis of the volume of production about the global market and about each type from 2016 to 2027. This section mentions the volume of production by region from 2016 to 2027. Pricing analysis is included in the report according to each type from the year 2016 to 2027, manufacturer from 2016 to 2021, region from 2016 to 2021, and global price from 2016 to 2027.

A thorough evaluation of the restrains included in the report portrays the contrast to drivers and gives room for strategic planning. Factors that overshadow the market growth are pivotal as they can be understood to devise different bends for getting hold of the lucrative opportunities that are present in the ever-growing market. Additionally, insights into market expert's opinions have been taken to understand the market better.

Segment Analysis:
The research report includes specific segments by region (country), by manufacturers, by Type and by Application. Each type provides information about the production during the forecast period of 2016 to 2027. by Application segment also provides consumption during the forecast period of 2016 to 2027. Understanding the segments helps in identifying the importance of different factors that aid the market growth.

Atomic Layer Deposition: R&D Portfolio Assessment and Growth Opportunities
By: Frost & Sullivan
Publication Year: 2021

The Increase in Demand for Thin Films is Driving Adoption Across Industries.

The demand for thin films has been immense because of the miniaturization trend. Developers of semiconductors and energy storage devices have been experimenting with atomic layer deposition technology for mass deployment, recognizing the shift from testing the product for specific application requirements to scaling the technology according to growing industry requirements. Atomic layer deposition is a surface-controlled thin film deposition technique that allows manufacturers to fabricate thin films in various thicknesses in a controlled manner. The biomedical industry is a notable area of research and development, exploring the deposition of nanostructured materials that can be used for precise and patient-specific drug delivery, customized implants, and tissue engineering.

Atomic Layer Deposition Systems Global Market Insights 2021, Analysis and Forecast to 2026, by Manufacturers, Regions, Technology, Application
By: Prof Research
Publication Year: 2021

This report describes the global market size of Atomic Layer Deposition Systems from 2016 to 2020 and its CAGR from 2016 to 2020, and also forecasts its market size to the end of 2026 and its CAGR from 2021 to 2026.

For the geography segment, regional supply, demand, major players, price is presented from 2016 to 2026.

Atomic Layer Deposition Market Forecasts and Opportunities, 2021- Trends, Outlook and Implications of COVID-19 to 2028
By: VPA Research
Publication Year: 2021

Atomic Layer Deposition Companies are revising their long-term strategies to emerge stronger in the post-COVID pandemic scenario. After facing series of challenges such as supply chain disruption, demand fluctuations, other pressing concerns during 2020, companies are revising their strategies through modifying the composition of product portfolios, investing in capital expenditures, R&D strategies, mergers and acquisitions, and other growth strategies.

The report analyzes multiple recovery scenarios considering evolving Atomic Layer Deposition market demand, economic recovery conditions, and other global and regional changes. The impact of the COVID-19 crisis on long-term Atomic Layer Deposition markets, growth outlook across types and application segments, strategies for emerging from the crisis are detailed in the report. The global semiconductors and electronics industry witnessed diverse trends over the past two years with manufacturing and other heavy industries facing operational challenges due to restricted cash flow during the pandemic. On the other hand, data center services, cloud computing, and other online supporting sectors gained significantly from the market trends. End-user spending of Atomic Layer Deposition market is expected to rebound significantly over the near term future.

Atomic Layer Deposition Equipment Market Forecasts to 2028 - Global Analysis By Equipment Type (Batch & Spatial, Plasma and Others), Segment (NAND, DRAM and Others), Product (Catalytic, Metal and Others), Application and By Geography
By: Stratistics Market Research Consulting
Publication Year: 2021

According to Stratistics MRC, the Global Atomic Layer Deposition Equipment Market is accounted for $8.38 billion in 2020 and is expected to reach $43.62 billion by 2028 growing at a CAGR of 22.9% during the forecast period. Increasing demand from end use industries such as medical equipment, rise in the usage of solar power cells and growing amount of data generated are driving the market growth. However, economic slowdown and geopolitical matters are hampering the growth of the market.

Atomic Layer Deposition is a sequential deposition method, which is different from most bottom-up deposition methods. Atomic layer deposition uses two different types of precursor material for formation of film or coatings, unlike the sequential deposition method in which one precursor gets deposition then another. Various equipment used for atomic layer deposition based on the application type. Based on the product, the aluminium oxide atomic layer deposition (ALD) segment is going to have lucrative growth during the forecast period which can be attributed to the ease of availability of precursor material, stability to various substrates and phenomenal characteristics. By geography, Asia Pacific is going to have high growth during the forecast period as the region is moving towards becoming a hub for original equipment manufacturers (OEMs) particularly in the electronics industry. Furthermore, emerging countries in the region have displayed keen interest on investing in the industry which is leading to the growth of the market. Some of the key players profiled in the Atomic Layer Deposition Equipment Market include Aixtron, ALD Nanosolutions, Applied Materials, Arradiance, ASM International, Beneq, CVD Equipment, Encapsulix, Entegris, Kurt J. Lesker, Oxford Instruments, Picosun, SENTECH Instruments, Ultratech and Veeco Instruments.

Atomic Layer Deposition Equipment for More than Moore 2021
By: Yole Developpement
Publication Year: 2021

ALD has historically been the scaling enabler   for mainstream devices such as memory and   logic. During the past 20 years of high-volume   manufacturing (HVM), 300mm ALD platforms   have evolved to address the high throughput   needs of mainstream devices despite the   intrinsic-to-ALD low growth rate. Regarding   More-than-Moore (MtM) devices, CMOS Image   Sensors and some Si power applications closely   follow logic and memory device production   approaches and use similar 300mm ALD   platforms. Other MtM devices require 200mm   ALD platforms capable of delivering acceptable   throughput for smaller batch sizes or single   wafer reactors. These deposit excellent quality   thin films, often on non-Si materials such as   compound semiconductors (GaN, SiC, GaAs),   piezoelectrics, or ferroelectrics, among others.   The MtM applications considered here are   MEMS and sensors, power devices, and RF   devices, as well as photonics (including miniLED, micro-LED, and VCSEL applications).   Amongst other processes, ALD is used for   surface and sidewall passivation, trench coatings   and gate dielectrics, optical coatings, processing   layers, and hermetic sealing. Suitable 200mm   ALD platforms have been unveiled during the   past few years and are now truly entering MtM   HVM, propelled by wafer production volume  increase.

Atomic Layer Deposition (ALD)
By: Global Industry Analysts, Inc.
Publication Year: 2021

Global Atomic Layer Deposition (ALD) Market to Reach $3.5 Billion by 2027

Amid the COVID-19 crisis, the global market for Atomic Layer Deposition (ALD) estimated at US$1.7 Billion in the year 2020, is projected to reach a revised size of US$3.5 Billion by 2027, growing at a CAGR of 11.2% over the analysis period 2020-2027. Aluminum Oxide, one of the segments analyzed in the report, is projected to record a 11% CAGR and reach US$1.2 Billion by the end of the analysis period. After an early analysis of the business implications of the pandemic and its induced economic crisis, growth in the Metal segment is readjusted to a revised 10.3% CAGR for the next 7-year period.

The U.S. Market is Estimated at $493.5 Million, While China is Forecast to Grow at 10.8% CAGR

The Atomic Layer Deposition (ALD) market in the U.S. is estimated at US$493.5 Million in the year 2020. China, the world`s second largest economy, is forecast to reach a projected market size of US$618.5 Million by the year 2027 trailing a CAGR of 10.8% over the analysis period 2020 to 2027. Among the other noteworthy geographic markets are Japan and Canada, each forecast to grow at 9.7% and 9.5% respectively over the 2020-2027 period. Within Europe, Germany is forecast to grow at approximately 8.2% CAGR.

Plasma Enhanced Segment to Record 12.4% CAGR

In the global Plasma Enhanced segment, USA, Canada, Japan, China and Europe will drive the 12.2% CAGR estimated for this segment. These regional markets accounting for a combined market size of US$232.5 Million in the year 2020 will reach a projected size of US$520.3 Million by the close of the analysis period. China will remain among the fastest growing in this cluster of regional markets. Led by countries such as Australia, India, and South Korea, the market in Asia-Pacific is forecast to reach US$415.9 Million by the year 2027.

Vapor Deposition Market - Forecast(2022 - 2027)
By: IndustryARC
Publication Year: 2022

Vapor deposition market size is forecast to reach $19.4 billion by 2027, after growing at a CAGR of 8.6% during 2022-2027, owing to the increasing demand for electronic products worldwide. Vapor deposition is extensively used in coating applications of thin films in the electronic industry. Macro factors such as the growing middle-class population and rising disposable income are driving the electronics industry in the various regions. In addition, decreasing prices of electronics and the adoption of high-end technology devices are leading to an increase in electronic device consumption. Thus, the increasing consumption of electronic products is anticipated to drive the vapor deposition market substantially during the forecast period.

Thin Layer Deposition Market - Growth, Trends, COVID-19 Impact, and Forecasts (2022 - 2027)
By: Mordor Intelligence Pvt Ltd
Publication Year: 2022

The thin layer deposition market is expected to register a CAGR of 15.25% over the forecast period of (2021 - 2026). In April 2019, The Centre for Process Innovation (CPI) and Beneq have signed a long term collaboration agreement for the use of atomic layer deposition (ALD) technologies in printable electronics applications.

Key Highlights
Thin-film semiconductor deposition is a next-generation technology which is achieving rapid acceptance across various industries. Range of applications of thin-film semiconductor in solar panels will create an increasing demand in thin-film semiconductor deposition manufacturing. The demand for thin layer deposition semiconductors has increased due to their advantages such as lightweight, higher efficiency, less space consumption, and flexibility in shape. They are widely used in various applications such as solar panels, DRAMs, microprocessors, and wearable technologies among others. The market is largely driven by the increasing demand for microelectronics and flexible electronics such as flexible display & batteries. Moreover, the need for miniaturization of the circuit had supplemented the growth of Thin-layer deposition market. The requirement for advanced OLED displays will further boost the demand in the coming years. Moreover, the surge in demand of sensors in the smartphone industry and increasing application of solar systems in household equipment, transportation facilities, and aircrafts are expected to create numerous opportunities for the growth of thin-layer deposition market in the coming years. However, restraints associated with the thin layer deposition market is huge initial investment required for setting up a new manufacturing facility for thin layer deposition and increasing the cost of raw materials.

Thin Film Deposition: Trends, Key Issues, Market Analysis
By: Information Network
Publication Year: 2022

CVD (Chemical Vapor Deposition) is used to deposit materials in various forms, including monocrystalline, polycrystalline, amorphous, and epitaxial. By subtypes, there are mainly LPCVD (low pressure), PECVD (plasma enhanced), and ALD. PVD deposition techniques include sputtering and eBeam and thermal evaporation.

The CVD process involves mixing the source material with one or more volatile precursors using a plasma to chemically interact and breakdown the source material. The processes use heat with higher pressures leading to a more reproducible film where the film thicknesses could be managed by time/power. These films are more stoichiometric, they are denser and are capable of growing higher quality insulator films. The PVD processing uses a solid precursor metal that is gasified through some electrical energy. The gasified atoms are then transferred to the substrate. These processes manages thicknesses using a quartz crystal rate monitor to control rate and thickness of the film.

ALD films are very conformal approaching 2000:1 aspect ratios, thus providing excellent step coverage over features. The process is repeatable and can grow thinner layers under 10nm thickness predictably. Films include Alumina oxide (AL2O3), Hafnium oxide (HfO2) and Titanium oxide (TiO2). Its use in the semiconductor industry has advanced ALD rapidly in recent years to develop thin, high-K gate dielectric layers.

The PECVD process offers good step coverage over features. Films include Silicon Dioxide (SiO2), Silicon Nitride (Si3N4) and lower stress Oxynitride (SiON) films. The PECVD films offer more flexibility than ALD with higher deposition rates leading to higher throughputs.

This report discusses the technology trends, products, applications, and suppliers of deposition materials and equipment. It also gives insights to suppliers for future user needs and should assist them in long range planning, new product development and product improvement. Market shares and a market forecast for each sector of thin film deposition tools is presented.

The 2023-2028 World Outlook for Atomic Layer Deposition
By: ICON Group International
Publication Year: 2022

This study covers the world outlook for atomic layer depositions across more than 190 countries. For each year reported, estimates are given for the latent demand, or potential industry earnings (P.I.E.), for the country in question (in millions of U.S. dollars), the percent share the country is of the region, and of the globe. These comparative benchmarks allow the reader to quickly gauge a country vis-à-vis others. Using econometric models which project fundamental economic dynamics within each country and across countries, latent demand estimates are created. This report does not discuss the specific players in the market serving the latent demand, nor specific details at the product level. The study also does not consider short-term cyclicalities that might affect realized sales. The study, therefore, is strategic in nature, taking an aggregate and long-run view, irrespective of the players or products involved.

In this report we define the sales of atomic layer depositions as including all commonly understood products and/or services falling within this broad category, irrespective of product packaging, formulation, size, or form. Companies participating in this industry include Adeka, Air Liquide, Aixtron, ALD Nano Solutions, Inc., Applied Materials, Arradiance, Inc., ASM International, ATMI, Beneq, Centrotherm Photovoltaics, CVD Equipment, Denton Vacuum, Encapsulix, Entegris, Hitachi Kokusai Electric, Kurt J. Lesker Company, Lam Research, Levitech B.V., Lotus Applied Technology, Merck KGaA, Metryx, Ltd., NCD Company, Oxford Instruments, Picosun, Praxair Technology, SENTECH Instruments, Sigma-Aldrich Company, SVT Associates, Tokyo Electron, Tosoh Corporation, Ultratech, and Veeco Instruments. In addition to the sources indicated, additional information available to the public via news and/or press releases published by players in the industry was considered in defining and calibrating this category. All figures are in a common currency (U.S. dollars, millions) and are not adjusted for inflation (i.e., they are current values). Exchange rates used to convert to U.S. dollars are averages for the year in question. Future exchange rates are assumed to be constant in the future at the current level (the average of the year of this publication's release in 2022).

Market Briefs – Precursor Development – How to take a precursor from lab to fab
By: Techcet
Publication Year: 2022

Coming Soon – The precursor development briefing explains all about how to take it from lab to fab.

Market Briefs – Precursor Development – ALD / CVD Systems and Precursors
By: Techcet
Publication Year: 2022

The report details about the Precursor Development in ALD/CVD Systems and Precursors

Global Atomic Layer Deposition Equipment Market - Growth, Trends, COVID-19 Impact, and Forecasts (2022 - 2027)
By: Mordor Intelligence Pvt Ltd
Publication Year: 2022

The Atomic Layer Deposition (ALD) Equipment Market is expected to grow at a CAGR of 25% over the forecast period 2021 to 2026. The COVID -19 outbreak affected the overall semiconductor and chip fabrication market from the demand side and the supply side. The nationwide lockdowns and closure of semiconductor plants have fueled the supply shortage trend further, which mainly emerged in 2019. However, these effects are likely to be in the short term and affect the demand of ALD technologies temporarily. Moreover, government precautions across the world to support automotive and industrial sectors could help revive foundry industry growth.

Dielectric Precursors
By: Techcet
Publication Year: 2022

• Provides market and technical trend information on organic and inorganic precursors, addressing CVD, ALD, and SOD applications including ILDs & low-κ dielectrics, hard masks, sidewall spacers and etch stop layers
• Provides focused information for supply-chain managers, process integration and R&D directors, as well as business development and financial analysts
• Covers information about key suppliers, issues/trends in the material supply chain, estimates on supplier market share, and forecast for the material segments

Atomic Layer Deposition Market Share, Insight, Report, Trends, Analysis, & Forecast
By: DataM Intelligence
Publication Year: 2022

Atomic layer deposition is a technique performed in the vapour phase, which is used to deposit thin films onto a substrate. The majority of the ALD reactions are performed using two chemicals called precursors. Numerous chemicals are made to react with the surface material during a reaction, and all the steps are performed that create a thin film. ALD is in greater demand for products such as data storage devices and small electronic components and displays, where the film thickness is imperative. Owing to such a wide application range, ALD becomes a popular tool for developing nano-coatings, thin films and fabricating semiconductor devices. Apart from this, ALD applications include deposition of the gate oxide, microelectronics, deposition transition-metal nitrides, metal films, etc.

Market Dynamics

The global atomic layer deposition market is driven by the massive demand for the product in semiconductor & power converting systems. ALD is gaining popularity in biomedical applications for creating flexible sensing devices. Also, ALD is increasingly being used in lithium batteries as it can store a large amount of energy in a compact size.

By: 360iResearch
Publication Year: 2022

The Global Atomic Layer Deposition Market size was estimated at USD 1,095.86 million in 2020, USD 1,285.56 million in 2021, and is projected to grow at a Compound Annual Growth Rate (CAGR) of 18.03% to reach USD 2,963.69 million by 2026.

Market Statistics:

The report provides market sizing and forecast across five major currencies - USD, EUR, JPY, GBP, AUD, CAD, and CHF. It helps organization leaders make better decisions when currency exchange data is readily available. In this report, the years 2018 and 2019 are considered historical years, 2020 as the base year, 2021 as the estimated year, and years from 2022 to 2026 are considered the forecast period.

Market Segmentation & Coverage:

  • This research report categorizes the Atomic Layer Deposition to forecast the revenues and analyze the trends in each of the following sub-markets:
  • Based on Type, the market was studied across Aluminum Oxide ALD, Catalytic ALD, Metal ALD, and Plasma Enhanced ALD.
  • Based on Application, the market was studied across Electronics, Medical Equipment, Semiconductors, and Solar Devices.
  • Based on Region, the market was studied across Americas, Asia-Pacific, and Europe, Middle East & Africa. The Americas is further studied across Argentina, Brazil, Canada, Mexico, and United States. The United States is further studied across California, Florida, Illinois, New York, Ohio, Pennsylvania, and Texas. The Asia-Pacific is further studied across Australia, China, India, Indonesia, Japan, Malaysia, Philippines, Singapore, South Korea, Taiwan, and Thailand. Europe, Middle East & Africa is further studied across France, Germany, Italy, Netherlands, Qatar, Russia, Saudi Arabia, South Africa, Spain, United Arab Emirates, and United Kingdom.
    Cumulative Impact of COVID-19:

COVID-19 is an incomparable global public health emergency that has affected almost every industry, and the long-term effects are projected to impact the industry growth during the forecast period. Our ongoing research amplifies our research framework to ensure the inclusion of underlying COVID-19 issues and potential paths forward. The report delivers insights on COVID-19 considering the changes in consumer behavior and demand, purchasing patterns, re-routing of the supply chain, dynamics of current market forces, and the significant interventions of governments. The updated study provides insights, analysis, estimations, and forecasts, considering the COVID-19 impact on the market.

Competitive Strategic Window:

The Competitive Strategic Window analyses the competitive landscape in terms of markets, applications, and geographies to help the vendor define an alignment or fit between their capabilities and opportunities for future growth prospects. It describes the optimal or favorable fit for the vendors to adopt successive merger and acquisition strategies, geography expansion, research & development, and new product introduction strategies to execute further business expansion and growth during a forecast period.

FPNV Positioning Matrix:

The FPNV Positioning Matrix evaluates and categorizes the vendors in the Atomic Layer Deposition Market based on Business Strategy (Business Growth, Industry Coverage, Financial Viability, and Channel Support) and Product Satisfaction (Value for Money, Ease of Use, Product Features, and Customer Support) that aids businesses in better decision making and understanding the competitive landscape.

Market Share Analysis:

The Market Share Analysis offers the analysis of vendors considering their contribution to the overall market. It provides the idea of its revenue generation into the overall market compared to other vendors in the space. It provides insights into how vendors are performing in terms of revenue generation and customer base compared to others. Knowing market share offers an idea of the size and competitiveness of the vendors for the base year. It reveals the market characteristics in terms of accumulation, fragmentation, dominance, and amalgamation traits.

Competitive Scenario:

The Competitive Scenario provides an outlook analysis of the various business growth strategies adopted by the vendors. The news covered in this section deliver valuable thoughts at the different stage while keeping up-to-date with the business and engage stakeholders in the economic debate. The competitive scenario represents press releases or news of the companies categorized into Merger & Acquisition, Agreement, Collaboration, & Partnership, New Product Launch & Enhancement, Investment & Funding, and Award, Recognition, & Expansion. All the news collected help vendor to understand the gaps in the marketplace and competitor’s strength and weakness thereby, providing insights to enhance product and service.

Company Usability Profiles:

The report profoundly explores the recent significant developments by the leading vendors and innovation profiles in the Global Atomic Layer Deposition Market, including Adeka Corporation, ALD NanoSolutions, Inc., Anric Technologies LLC, Applied Materials Inc., Arradiance, LLC, ASM International N.V., Beneq Oy, Denton Vacuum LLC, Entegris, Inc., Eugenus, Inc., Kurt J. Lesker Company, Lam Research Corporation, Oxford Instruments PLC, Picosun Oy, Tokyo Electron Limited, and Veeco Instruments Inc..

The report provides insights on the following pointers:

1. Market Penetration: Provides comprehensive information on the market offered by the key players
2. Market Development: Provides in-depth information about lucrative emerging markets and analyze penetration across mature segments of the markets
3. Market Diversification: Provides detailed information about new product launches, untapped geographies, recent developments, and investments
4. Competitive Assessment & Intelligence: Provides an exhaustive assessment of market shares, strategies, products, certification, regulatory approvals, patent landscape, and manufacturing capabilities of the leading players
5. Product Development & Innovation: Provides intelligent insights on future technologies, R&D activities, and breakthrough product developments

The report answers questions such as:

1. What is the market size and forecast of the Global Atomic Layer Deposition Market?
2. What are the inhibiting factors and impact of COVID-19 shaping the Global Atomic Layer Deposition Market during the forecast period?
3. Which are the products/segments/applications/areas to invest in over the forecast period in the Global Atomic Layer Deposition Market?
4. What is the competitive strategic window for opportunities in the Global Atomic Layer Deposition Market?
5. What are the technology trends and regulatory frameworks in the Global Atomic Layer Deposition Market?
6. What is the market share of the leading vendors in the Global Atomic Layer Deposition Market?
7. What modes and strategic moves are considered suitable for entering the Global Atomic Layer Deposition Market?

Atomic Layer Deposition Market - Forecast (2022 - 2027)
By: IndustryARC
Publication Year: 2022

Atomic layer deposition (ALD) market generated revenue of $3.2 billion in 2020 and is projected to grow at a CAGR of 7.8% during the forecast period 2022-2027 to reach a revenue of $4.4 billion by 2026. Atomic Layer deposition (ALD) is a thin film coating method utilized to deposit the film on a component or system in a controlled manner one atomic layer at a time. This technology has been utilized in the semiconductor industry for a number of years as the increasing size conformity requirements make this process an ideal development as traditional thin film technologies such as chemical vapor deposition (CVD), spin coating and physical vapor deposition (PVD) cannot function in nanometer scale deposits. The chemical and structural purity of ALD method has resulted in increased usage in a number of industries including electronics, chemical, healthcare, energy and mechanical applications. Atomic Layer Deposition also allows usage of sensitive substrates such as plastic or paper, which is not possible with traditional thin film coating methods. Atomic Layer deposition is utilized in applications such as manufacture of Integrated Circuits (IC), various components and devices, MEMS products as well as industrial applications. Silicon wafers form the building blocks of semiconductors, since semiconductor devices or chips are fabricated on these substrates. Growing need for semiconductor devices in industries such as consumer electronics, industrial equipment, automotive products, and healthcare equipment is fuelling the silicon wafer market growth and demand for ALD equipment.

ALD/ High K Metal Precursors
By: Techcet
Publication Year: 2022

• Provides market and technical trend information on organic and inorganic precursors, addressing CVD, ALD applications including high κ metal-oxides, barrier layers, metal interconnects, and capping layers, among others.
• Provides focused information for supply-chain managers, process integration and R&D directors, as well as business development and financial analysts
• Covers information about key suppliers, issues/trends in the material supply chain, estimates on supplier market share, and forecast for the material segments

ALD Equipment Market by Film Type (Oxide, Metal, Sulfide, Nitride), Deposition Method, Application (Semiconductor) (More-than-Moore, Research & Development Facilities, More Moore), Application (Non-semiconductor) and Region - Global Forecast to 2027
By: marketsandmarkets
Publication Year: 2022

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The ALD equipment market size is expected to reach USD 6.0 billion by 2027 from USD 4.1 billion in 2022 to grow at a CAGR of 8.2% during the forecast period.

The report "ALD Equipment Market by Film Type (Oxide, Metal, Sulfide, Nitride), Deposition Method, Application (Semiconductor) (More-than-Moore, Research & Development Facilities, More Moore), Application (Non-semiconductor) and Region - Global Forecast to 2027" The ALD Equipment Market is projected reach USD 6.0 billion by 2027 from USD 4.1 billion in 2021, at a CAGR of 8.2% during forecast period. Constantly developing semiconductor industry, proliferation of 3D NAND SSDs, and the advantages offered by ALD are some of the major factors driving the market growing during the forecast period.

The research study involved 4 major activities in estimating the size of the ALD equipment market. Exhaustive secondary research has been done to collect important information about the market and peer markets. The validation of these findings, assumptions, and sizing with the help of primary research with industry experts across the value chain has been the next step. Both top-down and bottom-up approaches have been used to estimate the market size. Post which the market breakdown and data triangulation have been adopted to estimate the market sizes of segments and sub-segments.

Secondary Research

In secondary research, various secondary sources have been referred to for obtaining the information that was needed for the study. Various secondary sources that were used for the research include, corporate filings such as annual reports, press releases, investor presentations, and financial statements, trade, business, and professional associations, whitepapers, journals based on atomic layer deposition, certified publications, and articles from recognized authors and databases.

In the ALD equipment market report, the top-down as well as the bottom-up approaches have been used for the estimation of the global market size, along with several other dependent submarkets. The major players in the market were identified with the help of extensive secondary research and their presence in the market was determined using secondary and primary research. All the percentage shares, splits, and breakdowns have been determined using secondary sources and verified through primary sources.

Primary Research

Extensive primary research has been conducted after understanding the ALD equipment market scenario through secondary research. Several primary interviews have been conducted with key opinion leaders from both demand- and supply-side vendors across 4 major regions— North America, Europe, Asia Pacific, and the Rest of the World. Approximately 25% of the primary interviews have been conducted with the demand-side vendors and 75% with the supply-side vendors. Primary data has been collected mainly through telephonic interviews, which consist of 80% of the total primary interviews; questionnaires and emails have also been used to collect the data.

After successful interaction with industry experts, brief sessions were conducted with highly experienced independent consultants to reinforce the findings of our primary research. This, along with the in-house subject matter experts’ opinions, has led us to the findings as described in the report.

Driver: Constantly developing semiconductor industry
The emergence of technologies such as the Internet of Things (IoT), artificial intelligence (AI), and 5G have led to a significant increase in the development of data-driven solutions. Many companies extensively focus on research & development (R&D) activities to develop advanced solutions using such technologies. This has led to increased demand for ICs to be embedded in devices to develop advanced, efficient, and smart solutions. Moreover, the growing trend of lightweight, miniaturized, and fast electronic devices have created a surge in demand for complex and compact ICs. This is expected to drive the ALD equipment market growth as ALD facilitates the deposition of very thin nano-layers on a wide range of substrates. Deposition of thin films and coatings using ALD enables the development of smaller ICs by maintaining their standard performance.

Restraint: Requirement of skilled workforce
Front-end wafer fabrication processes in manufacturing semiconductors such as lithography, wafer surface conditioning, wafer cleaning, and deposition are highly complex and require skilled technicians. The growing demand for semiconductor devices from many end-user industries such as consumer electronics and automotive has been creating ample growth opportunities for market players. However, the shortage of skilled technicians for such processes has not enabled the market players to exploit the opportunities to their fullest. The requirement of a skilled workforce to implement such complex processes is a major factor negatively affecting the market growth.

Opportunity: Rising demand for photovoltaics
Due to the rapid depletion of resources, there has been a surge in demand for renewable energy sources. According to International Energy Agency (IEA), renewable energy accounted for 28% of the total energy globally in 2021. With the help of PV cells and solar panels, energy from the sun can be converted into electricity. Due to the increasing energy crisis, there has been an increase in demand for solar energy in the last decade. The growing demand for photovoltaics is expected to create lucrative opportunities for market players offering solutions for ALD. In solar cells, ALD films can be used as surface passivation layers, buffer layers, window layers, absorber layers, and hole/electron contacts. Increasing demand for photovoltaics is expected to drive the market growth for ALD.

Challenge:Technical difficulties and process complexity
Processes involved in manufacturing semiconductors need clean rooms and clean equipment. Even a tiny amount of dust can hamper the process and result in a heavy financial loss. Delay in supply due to errors during manufacturing may result in additional losses and order cancelations. A few common challenges associated with semiconductor manufacturing include defects associated with raw materials, mechanical integrity, and problems at the chip level. Moreover, advanced and innovative technologies are needed at the fabrication stage to produce high-quality semiconductor devices and ICs. The growing trend of miniaturization has significantly increased the complexity of wafers due to the presence of multiple patterns at the chip level. ALD needs a very high degree of cleanliness. However, it is difficult to maintain cleanliness in ALD when process nodes are extremely small. Moreover, technicians must ensure that there should not be any leakage during ALD as the gases used in the production processes can be hazardous. The increasing number of challenges involved while manufacturing semiconductors may impede the market growth for ALD.

Medical applications to register the highest CAGR during forecast period
The rising demand for smart and connected healthcare solutions, wearables, and implants is expected to drive the ALD equipment market growth for medical applications. ALD is a suitable deposition method for medical devices as most of the materials used in ALD are biocompatible. The adoption of ultra-thin biocompatible ALD coatings also improves adhesion to the bone and protects patients from leakages from the implant to the body. Such advantages offered by ALD make it highly suitable for medical applications

Flouride films to register the highest CAGR during forecast period
In recent years, there has been an increasing demand for ALD of fluorides as they have a low refractive index and facilitate improved transmission at UV and IR wavelengths, making them highly suitable for optical applications. Compounds such as aluminum fluoride can also be used for developing protective coatings on lithium-ion batteries. High-performance mirrors at UV wavelengths require transparent dielectrics as protective coatings to prevent oxidation. Decreasing the thickness of protective layers subsequently reduces absorption losses. ALD of metal fluorides ensures superior transmission at UV wavelengths and facilitates the deposition of ultra-thin films to prevent absorption losses.

More Moore applications to account for the largest share of the ALD equipment market during forecast period
The increasing usage of various logic devices and memory technologies is a significant factor expected to drive the ALD equipment market growth for More Moore applications. In recent years, there has been a surge in demand for 3D NAND flash memory technology. The use of 3D NAND flash memory facilitates increased storage speed without the need of reducing the chip size. The increasing demand for 3D NAND flash memory technology, logic devices, and interconnect technologies is expected to drive the market growth for ALD equipment.

The study segments the ALD equipment market based on deposition method, film type, application (non-semiconductor), and application (semiconductor) at the regional and global level.

By Deposition Method
Plasma-enhanced ALD
Thermal ALD
Spatial ALD
Roll-to-Roll ALD
Powder ALD

By Film Type
Oxide Films
Metal Films
Sulfide Films
Nitride Films
Fluoride Films

By Application (Non-semiconductor)
Conventional Optics

By Application (Semiconductor)
More-than Moore
Research & Development Facilities
More Moore

By Region
North America
Asia Pacific
Rest of the World

Recent Developments
In June 2022, Applied Materials announced the acquisition of Picosun Oy, a global leader in ALD based in Finland. With this acquisition, Applied Materials aims to harness Picosun’s capabilities to provide innovative solutions for the IoT, communications, automotive, sensor, and power markets. This acquisition would broaden Applied Materials’ portfolio related to specialty chips
In March 2022, ASM International N.V. acquired Reno Sub-Systems Inc. (Reno), a company that offers RF matching sub-systems for equipment used to manufacture semiconductors. With this acquisition, ASMI aims to enhance its portfolio of plasma products with the help of Reno’s RF generators and matching networks
In September 2020, Lam Research Corporation launched the Striker FE ALD system that is highly suited for manufacturing high aspect-ratio chip architectures. The system uses ICEFill technology for filling structures in 3D NAND, logic devices, and DRAM chips
In September 2019, Tokyo Electron Limited announced the merger of TEL FSI, Inc. and TEL Epion Inc., subsidiaries of Tokyo Electron U.S. Holdings, Inc. (US). With the merger of these subsidiaries, the company optimized and enhanced manufacturing processes and improved operational efficiency
In May 2017, Veeco Instruments Inc. announced the acquisition of Ultratech, Inc., a leading supplier of lithography, laser processing, and inspection systems used in the production of LEDs and other semiconductor devices. With this acquisition, Veeco strengthened its product portfolio of advanced packaging lithography systems

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