The Atomic Layer Deposition website is an interactive ALD community website by and for ALD researchers. It consists of a few main parts:
The ALD Journal
“Atomic Layer Deposition, International Journal” (ISSN 2772-2570) is a diamond open access journal. This means that it is free to publish and free to read, and the authors retain their copyright. See our open access policy page for more details. You can submit high quality scientific articles about atomic layer deposition and related fields. Submitted articles will be read by our Editors, and after their approval, will be subject to a peer review process. They will be published on our website, and shared with the relevant databases. See our Journal pages for more details.
The interactive community website
Our moderators place interesting news content on the website from time to time, and registered users can also post articles and links. When a registered user presses the “Create Post” button, either on the home page or on the Social/User Posts page, they can create news content that is immediately visible on the home page.
We hope you enjoy the website and the Journal and look forward to meeting you! You can become a registered member for free just by clicking the “Join” button in the top menu.