EDITOR IN CHIEF: APPLICATIONS
Professor Ruud van Ommen
Antoni van Leeuwenhoek professor in Chemical Engineering at Delft University of Technology; Co-founder of Delft-IMP.
Interests: Multiphase reactor engineering, scalable production of nanostructured materials, nanoparticle coating via fluidized bed and pneumatic transport ALD reactors, energy conversion, storage and pharmaceutical applications.
EDITOR IN CHIEF: PRECURSORS
Professor Sean Barry
Professor and Principal Investigator in the Department of Chemistry, Carleton University, Ottawa, ON.
Interests: Precursor chemistry, surface reactivity, metal depositions, thermal mechanisms
Professor Mark Losego
Associate Professor and Principal Investigator at the School of Materials Science and Engineering at Georgia Institute of Technology, Georgia, USA.
Interests: Textiles, polymers, ceramics, nanostructures
Professor Mato Knez
Researcher and Group Leader in Ikerbasque, CIC nanoGUNE in San Sebastián, Spain.
Interests: Synthesis and properties of nanomaterials, material science, thin film coating, bio-inorganic and organic-inorganic hybrid materials
Professor Michael Nolan
Head of Group Materials Modelling for Devices at Tyndall National Institute & Chair ICHEC Science Council
Interests: applying first principles modelling to metal oxides, in particular in the following research themes: Metal Oxides in Renewable Energy Applications. Electronic Structure of Ceria. Reactions at Ceria Surfaces. Vapor infusion in polymers.
Professor Yang Zhao
Assistant Professor and Principal Investigator in the Department of Mechanical and Materials Engineering at Western University, London, Canada.
Interests: Energy storage devices, nanomaterials and nanostructure design and fabrication, surface and interface engineering, next-generation batteries, advanced characterization for materials and interfaces.
Professor Fred Roozeboom
Professor Emeritus at the faculty of Science & Technology, University of Twente, Enschede, The Netherlands and Research Fellow at LionVolt B.V., Eindhoven, The Netherlands
Interests: Semiconductor thin-film & device integration technologies*, next-generation Li-batteries, catalysis, EUV optical lifetime, inorganic membranes for nanofiltration. *[plasma-enhanced] CVD, PVD, ALD, RIE, ALE, MBE, sol-gel deposition, electroplating, RTP, TSV technology.
Professor Jian Liu
Associate Professor and Principal’s Research Chair in Energy Storage Technologies in the School of Engineering at the University of British Columbia, Kelowna, Canada
Interests: atomic/molecular layer deposition, nanofabrication, surface and interface engineering, energy storage and conversion, lithium-ion batteries and next-generation batteries (solid-state, lithium-sulfur, and zinc-ion), interfacial phenomena in complex energy systems
Professor Tamar Segal-Peretz
Assistant Professor of Chemical Engineering at the Technion- Israel Institute of Technology.
Interests: Vapor-phase infiltration and growth of inorganic materials in polymers using atomic layer deposition (ALD). This strategy enables the fabrication of inorganic patterns and hybrid organic-inorganic composites. We are investigating new chemistries and processes in order to develop materials and composites with novel optical and electronic properties and to control their three-dimensional structure.
Dr. Henrik H. Sønsteby
Principal Investigator and Senior Lecturer at the Center for Materials Science and Nanotechnology, University of Oslo, Norway.
Interests: Low temperature epitaxy of functional complex oxides for next generation electronics, spintronics and photonics. Fundamental aspects of ALD for ternary- and quaternary oxides, with special focus on alkali- and transistion metal complex oxides.
Professor Tania Sandoval
Assistant Professor in the Department of Chemical and Environmental Engineering at Universidad Técnica Federico Santa María, Santiago, Chile.
Interests: Computational materials chemistry, surface functionalization, and thin film deposition (ALD and ASD).
Dr. Alfredo Mameli
Researcher and principal investigator at Holst Centre at TNO, Eindhoven, the Netherlands.
Interests: materials science, surface chemistry, plasma-surface interaction, atomic-scale selective deposition and etching, surface functionalization.
Professor Martyn Pemble
Professor Emeritus at School of Chemistry Scoil na Ceimic, University College Cork, Cork, Ireland.
Interests: CVD/ALD applications in surface catalysts, materials science, electrochemistry, electronic materials, nanotechnology and anti-microbial and self-cleaning surfaces
Dr. Hao Van Bui
Research Director, Leader of ALD Research Group at Phenikaa University, Vietnam.
Interests: ALD for catalysis, fuel cells and Li-ion batteries; surface modification and passivation by ALD.
Dr. Jacques Kools
Founder, Encapsulix SAS ; PhD Technical Physics TU Eindhoven. Previous positions include Research scientist at Philips Research and VP of Technology at Veeco Instruments.
Interests : Design and optimization of Etch and Deposition Equipment ( ALD & ALE) , relationship between reactor design, process parameters and film Properties ; Simulation and virtual prototyping; Industrial aspects
Dr. Simon Elliott
Dr. Dennis Hausmann
Director at LAM Research
Interests: Functionalized Area Selective ALD, Atomic Layer Etching, Silicon based dielectrics, industrialization of ALD and ALE processes
Dr. Bora Karasulu
Assistant Professor, University of Warwick, Coventry, United Kingdom
Interests: ALD, PLD, Energy storage materials (solid-state batteries and supercapacitors): atomistic modelling, first-principles characterisation using ssNMR, XRD, EELS, XAS, stochastic crystal structure prediction, density functional theory (DFT), crystal structures, electronic and spectroscopic properties.
Dr. Dipayan Pal
Postdoctoral Scholar, Department of Chemistry and Biochemistry, University of California San Diego, USA
Interests: Surface and Interface Science: Atomic layer deposition (ALD) grown nanomaterials (thin films, nanoparticles), structure-property relationship; Electrical Energy Storage - building better batteries - exploring novel electrode materials and through surface /interface modification of electrodes; ALD for high efficiency perovskite solar cells.
Dr. Chi Thang Nguyen
Researcher in the Department of Materials Science and Engineering, Incheon National University, South Korea.
Interests: ALD, atomic layer modulation (ALM), Area selective ALD (ASD) and gradient ASD, theoretical calculations for ALD (Monte Carlo simulation, Johnson–Mehl–Avrami–Kolmogorov JMAK model).
Dr. Viet Huong Nguyen
Assistant Professor & Researcher at Faculty of Materials Science and Engineering, Phenikaa University, Vietnam
Interests: Atmospheric Pressure Spatial ALD; Area Selective Deposition; Surface functionalization and interface engineering; Functional coating for transparent, UV-protective, self-cleaning surfaces
Dr. Amin Bahrami
Senior Researcher at the Leibniz Institute for Solid State and Materials Research (IFW)- Dresden, Germany
ALD and its relation to: 2D materials and topological insulators, Grain boundary engineering of Thermoelectric materials, Active battery components, Protection layers, Biocompatible thin films and Multifunctional and flame-retardent textiles.
Dr. Ali K. Okyay
Researcher at Stanford University and Founder of OkyayTech
Interests: ALD of Wide Bandgap Materials, III-Nitrides and Gallium Oxide, Hollow Cathode Plasma ALD, Atomic Layer Processing, ALD Equipment Design.
Dr. Kailash Venkatraman
Electrochemist, Applied Materials & Case Western Reserve University
Interests: ALD, Dielectrics, semiconductor fabrication, electrodeposition, interconnect fabrication (Cu), methods: Cyclic voltammetry, polarization, rotating disk electrode, impedance spectroscopy, quartz crystal microgravimetry (QCM), AFM, XPS,, TEM, DSC, X-ray fluorescence, Auger electron spectroscopy
Dr. Madhan K. Arulanandam
ASSISTANT EDITOR (KF)
Ksenia Varga, MSc.
Ksenia has completed her Master of Science degree at Carleton University in Ottawa, Canada under the supervision of Professor Sean Barry and Dr. Charles Macdonald.
Currently, at Atomic Layer Deposition, Ksenia is assistant editor of the ALD Journal
Dr. D.J. Monsma
Owner of Ultimaterials BV in Amsterdam, Netherlands.
Interests: All ALD aspects, rechargeable batteries, microelectronics, materials science. Established the open access journal "Atomic Layer Deposition" (ISSN 2772-2570).
EDITORIAL BOARD MEMBERS
Jane & John Doe
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Additional team members will be listed soon.