Address: Amsterdam, Netherlands

Type: Research Institutes

The ALD Journal and website is an ALD community organization, hosting scientific articles and ALD news around the world.

Address: Chicago, USA

Type: Universities

Prof. Omar K. Farha’s research seeks to solve exciting problems in chemistry and materials science ranging from energy and environment related applications to challenges in national defense by employing atomically precise functional materials. By exploiting the modular nature of metal–organic frameworks (MOFs) and porous organic polymers (POPs), we work to fundamentally understand the role of three-dimensional architecture in modifying a material’s function for applications in gas storage and separation, catalysis, water remediation and detoxification of chemical warfare agent simulants.

Address: Austin, USA

Type: Universities

We study surface and materials chemistry as it relates to the growth and properties of ultrathin metal and metal oxide films for optical and electronic applications. We seek to understand and describe nucleation and growth of films and nanostructures, structure-property relationships, and site-specific reaction

Address: Raleigh, USA

Type: Universities

Parsons’ research explores chemical reactions on surfaces, particularly for formation of thin films by atomic layer deposition. He joined the faculty at NC State in 1992, after a postdoc position at IBM TJ Watson Research Center. His research interests include: Atomic Layer Deposition and Related Processes; Physics of Electronic Materials and Devices; Polymer Fiber and Film Formation, Coating and Chemical Surface Modification; Metal-Organic-Framework (MOF) Materials and Thin Films; Advanced Energy Storage and Solar Energy Conversion. His expertise also includes: Thin Film Transistor (TFT) and Flat Panel Active Matrix Display (esp. AMLCD) Devices and Manufacturing, Chemical Vapor Deposition, Plasma Enhanced CVD, Plasma Etching and other processes.

Address: Brno, Czech Republic

Type: Research Institutes

Research areas Nanomaterials with low dimensions (100 nm and below) for applications in power engineering, biology and catalysis. Main objectives The main objective of the research is a synthesis of new low dimensional structures, such as nanotubes, nanolayers, nanofibers, by various means. It includes also the necessary investigation of the structure-property relationship of these materials. The most promising materials are explored in various fields, such as photovoltaics, catalysis, batteries, etc. together with cooperating partners. Content of research Self-organized valve metal oxide nanostructures by electrochemical anodization development of novel tubular shapes and morpologies investigation of various Ti and Ti-based substrates for nanotube synthesis improvement of the tube ordering towards ideal hexagonal ordering understanding their structure/properties/application relationship Atomic layer Deposition of Various funcitonal coatings functionalization of nanomaterials by secondary materials development of new precursors and processes for new advanced coatings realization of complete functional devices Inorganic and polymeric nanofibers and microfibers new formulations of solutions for inorganic fibers by centrifugal spinning and electrospinning synthesis vs. calcination vs. property relationship evaluation of the potential for various applications

Address: Oslo, Norway

Type: Universities

NAFUMA focuses on inorganic functional materials and nanostructures. The main objective is to understand their physical properties on the basis of crystal structure and chemical bonding (electronic structure) and on this background be able to synthesize novel materials with specific properties by design. This implies close integration of experimental and theoretical modeling activities. Organic- inorganic hybrid materials / MLD growth. Modelling the evolution of texture in ALD growth. Complex oxides. Battery materials. Nanostructures. Materials for photovoltaics. Characterisation techniques

Address: Incheon, South Korea

Type: Research Institutes

Professor Han-Bo-Ram Lee’s current research interests and topics are focused on understanding and controlling surface chemistry and reactions, and applying this knowledge to various applications of which properties could be improved by functionalization of surface from nanoscopic to macroscopic ranges. Atomic-level theoretical calculations using density functional theory (DFT) and Monte Carlo (MC) simulation are employed, and experimental controls and functionalization of surface properties are realized by atomic layer deposition (ALD). Metal deposition using ALD.

Address: Helsinki, Finland

Type: Universities

Prof. Ritala has one of the largest bodies of work in the field of Atomic Layer Deposition, including development of novel materials, see https://researchportal.helsinki.fi/en/persons/mikko-ritala/publications/

Address: lille, france

Type: Research Institutes

Thermal ALD PE-ALD FAMILLE DE MATÉRIAUX Oxydes Films métalliques Nitrures Composés lithiés APPLICATIONS Transition énergetique (catalyse, PV, batteries, piles à combustibles, nucléaire, ..) Transition numérique: (écrans, capteurs, micro-electronique, Qubits, ...)

Address: Marseille , France

Type: Research Institutes

Thermal ALD PE-ALD Croissance, instrumentation in-situ FAMILLE DE MATÉRIAUX Oxydes Films métalliques Nitrures APPLICATIONS Transition énergetique (catalyse, PV, batteries, piles à combustibles, nucléaire, ..) Environnement (traitement de l'eau, de l'air, ..) RÉACTEUR(S) ALD Réacteur maison Veeco/Cambridge Nanotech

Address: Johannesburg, south africa

Type: Universities

The ALD Research Centre will adopt the advanced ALD practices and focus on the development of ALD research capacities in South Africa. Strategically, ALD RC will prioritize the research activities in both fundamental research and applied research: Fundamental research The Centre will focus on six specific research areas to provide UJ with a better understanding of the ALD technologies and important advances in the future 4IR world. The immediate research focus areas are exampled below: ALD Operations: focus on the adoption of advanced ALD processes and design of the novel ALD reactors to provide the best supports. Smart Energy: focus on ALD fabrication process of advanced catalysts for H2 & fuel cells technologies, membrane with improved performance, etc. Smart Manufacturing: focus on the ALD smart machining, automation and Industrial Internet of things (IIOT) to demonstrate the concept of automation and IIOT for the future smart manufacturing in the 4IR world. Smart Materials: focus on the advancements for ALD-MOFs, ALD-graphene and ALD-drugs delivery/discoveries. Smart Membrane: focus on ALD-membrane with improved performance, etc. Computational Modelling and Simulation: focus on the modelling and simulation to predicate the results from the research design to guide the ALD practices.

University, Institute or Company name : CNRS

Address: Nantes, France

Type: Research Institutes

PE-ALD Précurseurs Simulations et/ou modélisation Croissance, instrumentation in-situ Atomic Layer Etching FAMILLE DE MATÉRIAUX Oxydes Sulfures Nitrures Oxynitrures avec inclusions métalliques APPLICATIONS Transition énergetique (catalyse, PV, batteries, piles à combustibles, nucléaire, ..) Transition numérique: (écrans, capteurs, micro-electronique, Qubits, ...)

University, Institute or Company name : Leibniz Institute for Solid State and Materials Research

Address: Dresden, Germany

Type: Research Institutes

Our group has been working in this area for many years. Various oxide systems, metals, transition metal dichalcogenides, and nitrides have been developed for different applications including but not limited to: 2D materials and topological insulators, Grain modifications of thermoelectric materials Surface modification of active battery components Protection layers and encapsulations Biocompatible thin films Planar, porous, and powder samples can be coated with the listed materials. Other materials are possible after consultation.

University, Institute or Company name : Tyndall National Institute

Address: Cork, Ireland

Type: Research Institutes

The Tyndall MMD group explores modelling of materials for a range of device applications. For this research cluster the focus is on atomic level processing, that is ALD, ALE and MLD, where the group has taken a leading position in the modelling of ALE and ALD processes. More recently we have started working on piezoelectric and multiferroic materials for new devices, as well as triboelectric generation. Funding for this work has been secured through Science Foundation Ireland partnerships including the US-Ireland Program, the SFI-NSF China program, the H2020 M-ERA.net.2 co-fund, SFI Frontiers for the Future and the SFI-EPSRC; these all involved close cooperation with experimental groups across Tyndall, Ireland, UK, Spain, Netherlands, USA and China and our ability to work closely with experiment on common problems is a key attribute of the group’s activities. Other funding includes the MSCA ITN HYCOAT (www.hycoat.eu), on molecular layer deposition, two Enterprise Ireland Innovation Partnerships and direct industry support. The latter show the relevance of our work to industry problems, allowing us to grow our links to key industry players and showcase the quality of this work. The value of support is in excess of € 2.5 million and team members have gone onto senior industry roles and permanent academic positions. https://scholar.google.com/citations?hl=en&user=NHw-9lYAAAAJ&view_op=list_works&sortby=pubdate https://orcid.org/0000-0002-5224-8580

University, Institute or Company name : FAU -- Friedrich-Alexander-Universität Erlangen-Nürnberg

Address: Erlangen, Germany

Type: Universities

We develop chemical interface engineering methods for green energy conversion applications. Energy conversion between its light, electrical, and chemical forms always entails the transfer of charge carriers at interfaces as the crucial step. Here, “the interface is the device” — in stark contrast to the bulk amounts of materials traditionally utilized in classical energy conversion devices. Therefore, smart engineering of interfaces enables one to minimize the utilization of expensive, highly purified, rare, or toxic materials. In fact, we contend that we can even replace those materials with inexpensive, abundant, innocuous ones using a combination of interface nanostructuring (on the scale of 20 to 5000 nm) and interface functionalization by ultrathin coatings (on the scale of 0.5 to 50 nm). To achieve the level of control required, we develop chemical nanostructuring methods based mostly on atomic layer deposition (ALD) and electrochemistry. We then implement them towards devices, the functional performance of which depends on the degree of perfection achieved preparatively.

University, Institute or Company name : University of Colorado Boulder

Address: Boulder, USA

Type: Universities

The Steven M. George research group concentrates on surface chemistry, thin-film growth & etching, and nanoscale engineering. We focus on atomic layer deposition (ALD), atomic layer etching (ALE), and molecular layer deposition (MLD). We develop the science and engineering of atomic layer processing (ALP). In the research group, we welcome the diversity of students, researchers, and collaborators. We strive for an accessible, inclusive, and equitable work environment.

University, Institute or Company name : Maxima Sciences LLC

Address: Montgomery, OH, 45242, United States

Type: Companies

Maxima Sciences llc provides ALD Consulting, Coating Services, and sells the R-ALD research & development system.

University, Institute or Company name : Leipzig University

Address: Leipzig, Germany

Type: Universities

University-based research group working on theory and modelling of ALD, especially on area-selective ALD. Adsorption, reaction mechanisms, packing, SMI-based approaches, decomposition, dynamics, etc. Collaboration with various experimental groups on AS-ALD.

University, Institute or Company name : University Grenoble Alpes, LMGP

Address: Grenoble, France

Type: Universities

The Materials and Physical Engineering Laboratory (LMGP) is a research laboratory in materials science and materials for biomedical engineering. It is a joint Research Unit (UMR 5628) of CNRS and Grenoble INP within the Grenoble Alpes University. Thanks to the dynamism of its three research teams and the favorable multidisciplinary environment, LMGP has gained an international reputation in the fields of crystal growth, nanomaterials and structured thin film materials and interaction of materials with biological matter. The interaction between the teams help fostering synergies and new skills. LMGP develops functional materials for applications in the field of microelectronics, energy, and health and thus participates in applied research, in close relationship with companies. With about fifty researchers, lecturers, engineers, technicians and administrative staff, the laboratory welcomes every year about 60 students and non-permanent researchers at all levels.

University, Institute or Company name : CNRS - UM - ENSCM

Address: Montpellier, France

Type: Research Institutes

The team's main activities entail the development of novel electrolyte and electrode materials for proton/anion exchange membrane fuel cells and electrolyzers. As an example, we are preparing and characterizing nanostructured electrocatalyst supports (based on carbon, metal oxides, and carbide nanofibres), a range of low loaded PGM catalysts (Pt and IrO2 nanoparticles and thin films, Pt/Rare Earth Metal nanoalloys) and ionomer membranes reinforced with polymer fiber webs.

University, Institute or Company name : Technion- Israel Institute of Technology

Address: Haifa, Israel

Type: Universities

Our lab goal is to enhance the sustainable use of resources and improve nanotechnology by developing new nanofabrication processes and new hybrid organic-inorganic nanomaterials. We address challenges in a range of fields, from improving semiconductor nano-manufacturing to enhancing clean energy storage, clean water production, and sustainable plastics solution, using our expertise in nanomaterials and nanostructures. Our work is based on combining inorganic materials synthesis, polymer assembly and patterning, and advanced nanoscale characterization approaches. We specialize in the growth of inorganic materials onto and within polymers using atomic layer deposition (ALD) technologies (sequential infiltration synthesis- SIS and vapor phase infiltration- VPI) and in molecular layer deposition (MLD), as well as in electron microscopy characterization (TEM, SEM, FIB), including 3D characterization, to probe our nanomaterials and nanostructures. We work on understanding the fundamental behavior of molecules in these nanoscale-based systems and utilize this knowledge to create novel nanostructures that can tackle some of the pressing challenges in the water, energy, manufacturing, and sustainability fields.

University, Institute or Company name : CIC nanoGUNE

Address: San Sebastian, Spain

Type: Research Institutes

The nanomaterials group at CIC nanoGUNE performs research on functional materials, dominantly organic-inorganic hybrid materials, fabricated with vapor phase processess (VPI, MLD, ALD, CVD, etc.). Our focus lies on applications in the energy sector, textile, corrosion protection, packaging, bioapplications, and emerging electronics. We are involved in a variety of regional, national and international research projects of fundamental and industrial nature. We also host a startup company in-house which engineers and commercializes ALD/MLD/VPI instrumentation.

University, Institute or Company name : Georgia Tech

Address: Atlanta, United States

Type: Universities

The Losego Lab seeks a Phenomenological Understanding of Material Processes -- both in the making of materials (processing) and their performance (transport phenomena, chemical stability, etc.). Our goal is often to explain these processes with fundamental phenomenological models, providing new insights to materials design. We largely focus on the use of vapor phase processes to make and modify materials (e.g., atomic layer deposition [ALD], vapor phase infiltration [VPI], and physical vapor deposition [PVD]), with particular interest in understanding the synthesis and complex chemical and physical structure of organic-inorganic hybrid materials. The PI is committed to training creative and rigorous scientists and engineers that explore out-of-the-box ideas with well-reasoned methods.

University, Institute or Company name : Universidad Técnica Federico Santa María

Address: Santiago, Chile

Type: Universities

I'm Assistant Professor in the Department of Chemical and Environmental Engineering at the Technical University Federico Santa María in Santiago, Chile. My group focus on the fundamental understanding of ASD and ALD processes using computational modeling.

University, Institute or Company name : Missouri State University

Address: Springfield, MO, USA

Type: Universities

Developing AI-based forcefields to model the ALD processes.

University, Institute or Company name : 4D LABS at Simon Fraser University

Address: Burnaby, Canada

Type: Research Institutes

4D LABS is an open-access applications- and science-driven Core Facility at Simon Fraser University's Burnaby campus in British Columbia, Canada. We offer fully customized research and development programs for researchers, start-ups and industry. Our Vision: Living better through material science and engineering. Our Mission: Providing clients with material science services, tailored to their specific needs, that fast track their technology’s deployment.

University, Institute or Company name : CNyN-UNAM

Address: ensenada, México

Type: Research Institutes

Our interest involves bandpass filters and mirrors, waveguides, 2D solid electrolytes for energy storage, photocatalysis, transparent conductive oxides, and theoretical models on the interaction of ALD precursors and surfaces. The team leader is Dr. Hugo Tiznado. https://scholar.google.com/citations?user=TMM8G5MAAAAJ&hl=en

University, Institute or Company name : ICMAB-CSIC

Address: BARCELONA, SPAIN

Type: Research Institutes

Development of functional complex oxide films and membranes by chemical methods for energy and electronic applications

University, Institute or Company name : Brookhaven National Laboratory

Address: Upton, NY 11973, USA

Type: Research Institutes

Chang-Yong Nam at Center for Functional Nanomaterials of Brookhaven National Laboratory leads a research program focused on development and application of ALD techniques, especially vapor-phase infiltration, towards microelectronics (e.g., hybrid EUV photoresist) and energy technologies (e.g., membranes)

University, Institute or Company name : Luxembourg Institute of Science and Technology (LIST)

Address: 41 Rue du Brill, 4422 Esch-Belval Belvaux Sanem, Luxembourg, Luxembourg

Type: Research Institutes

The Luxembourg Institute of Science and Technology (LIST) is a mission-driven research and technology organization dedicated to developing technological solutions for the digital and ecological age. Our focus spans various sectors, aiming to strengthen the European economy and enhance the quality of life through technological innovation. To achieve these goals, we collaborate with public and private stakeholders, developing competitive and market-oriented product and service prototypes that align with economic, social, and environmental needs. The Material Research & Technology (MRT) department at LIST plays a crucial role in driving innovation for the European industry by researching advanced materials and processes. With a team of 200 researchers and engineers, the MRT department focuses on five thematic pillars: nanomaterials, nanotechnology, scientific instrumentation and process technology, structural composites, and functional polymers. Additionally, we have four high-tech platforms specializing in composites, prototyping, characterization, and testing. One of our strengths lies in thin film coating expertise, which is recognized. We have developed a state-of-the-art thin film deposition platform using both physical and chemical methods. LIST contributes valuable insights, particularly in the domain of thin film technologies, specifically Atomic Layer Deposition (ALD). LIST actively participates in European networks, contributing to research efforts in various areas. It can establish partnerships to pilot advanced technology and collaborates on research, development, and innovation related to demanding applications such as processors and semiconductor technology. The micro-fabrication platform at LIST is designed for advanced applications and consists of specialized equipment capable of precise manufacturing processes in an ISO 4 & 5 cleanroom environment. This facility is equipped with essential tools for fabrication processes and functional characterization, including lithography, deposition, annealing, and etching equipment compatible with 200mm wafer size, glass, polymer, or particle coating. Our expertise primarily revolves around researching and applying ALD in various fields, with a particular emphasis on non-semiconductor applications. Projects include the development of innovative materials and understanding the influence of material structure on functional properties. For example, our latest developments involve low-temperature processing of III-Nitride thin films with controlled crystallinity, a class of materials strategically important for hybrid structures.

University, Institute or Company name : University of Washington

Address: Seattle, USA

Type: Universities

Bergsman Research Group, studying the use of ALD, MLD, and infiltration for nanotechnology, energy, and sustainability technologies.

University, Institute or Company name : Carleton University

Address: Ottawa, Canada

Type: Universities

We work in the field of atomic layer deposition (ALD), with key interests in the development of new ligands and precursor compounds. We study deposition processes from a mechanistic point of view and hope to bring fundamental chemical interpretation to gas and surface phase reactivity.

University, Institute or Company name : CNR

Address: Agrate Brianza, Italy

Type: Research Institutes

The research group is active in the deposition of thin films for microelectronics applications and in the growth of inorganic nanostructures by vapor phase infiltration into self assembled block copolymer templates. The presence of an in-situ spectroscopy ellipsometer offers the possibility to perform real time studies of the deposition and/or infiltration process, unveiling the chemical-physical mechanism governing the growth of the inorganic material.

University, Institute or Company name : McMaster University

Address: Hamilton, Canada

Type: Universities

Our research focuses on precursor and reactivity design of novel ALD processes, with a particular interest in electropositive metal ALD and main group element ALD. Collaborative projects focused on ALD of various other materials for applications involving battery, optical, and biological devices are also underway. Our research typically progresses from the design, synthesis and characterization of new precursor molecules (which must be volatile, thermally robust, and highly reactive towards the envisaged co-reactants), to solution reactivity studies, and then ALD reactor studies and characterization of the resulting thin films.

University, Institute or Company name : Argonne National Laboratory

Address: Lemont, IL 60439, United States

Type: Research Institutes

The ALD research program at Argonne National Laboratory is a joint initiative of the Energy Systems and Infrastructure Analysis and Materials Science divisions that combines basic and applied sciences. This program is expanding ALD into new fields and deposition platforms and developing ALD thin film technologies that address a wide variety of our nation’s energy challenges.