ALD Systems

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ATLANT 3D Nanosystems NANOFABRICATOR 1 Area Selective Deposition Tool
Direct patterned ALD coating system using micronozzle
ATLANT3D™ Technology involves the sequential deposition of gases for direct patterning of various coating materials. It uses a micronozzle that sequentially ejects reactive vapors over a moving substrate. So far the following materials have been tested: TiO2, Pt, ZnO, SiO2.Unique ATLANT3D™ technology allows- Direct patterned ALD coating using micronozzle- Rapid atomic layer prototyping and manufacturing- Highly selective atomic layer patterning- Excellent 2D/3D conformal deposition on simple and complex surfaces- Combining multiple materials with excellent compatibility- Excellent pattern adhesion to almost any surfaces- Digital and atomically precise control over the printing process- With possibility to apply up to 450 different commercially available materials4 different precursors and 4 different reactants can be loaded at the same time, allowing you to quickly switch between the materials you wish to deposit or test
Beneq R2 Research ALD system
Research ALD system
The Beneq R2 is Beneq's most affordable premium research reactor with sticker price of 130,000 EUR. This tool is compact, scalable and ergonomically designed to be the perfect way to start your ALD journey.  VALUE: Beneq R2 has all the components of a premium ALD reactor packed into an affordable and approachable tool. With upscale features like a dual chamber design, R2 provides the best value for an ALD starterpack.SIMPLICITY: The R2 is standardized to provide users with a straightforward and pragmatic tool ready to be used out of the box. All main components and electrical box are included in the tool frame, giving it a small, unassuming footprint. UPGRADABLE: The modular design of the R2 allows for quick upgrades and easy maintenance, including a 3D chamber and plasma options, for when your ALD needs change. Options include: Single wafer, batch, and plasma chambersOzone cabinet and extra gas linesSet of 2 hot sources with either vapor draw or loadand-release dosing 
Beneq Genesis ALD Vacuum spatial roll to roll ALD system
Vacuum spatial roll to roll ALD system
The Genesis ALD is ideal for coating any roll-format substrates, and for multiple functional applications.Passivation of cathodes and anodes for various types of lithium-ion and solid-state batteriesConductive layers and encapsulation for flexible solar cellsMoisture barriers for flexible electronicsAdditional contentBrochure of the Genesis ALD can be found here.Additional video about the Genesis ALD can be found here.Learn more about the science of spatial ALD here.
Beneq C2R Vacuum Spatial ALD system
Vacuum Spatial ALD system
The Beneq C2R is a cluster-compatible vacuum spatial ALD (V-SALD) tool equipped with a continuous rotary mechanism and robust plasma-enhancement. With rotation speeds up to 200 rpm and in-situ optical broadband monitoring (BBM), C2R is the perfect production tool for high throughput optical coatings with tailored plasma ALD processes. Optical coatings often require micrometer thick layer, making spatial ALD speeds particularly useful.Technical highlightsVacuum spatial ALD (V-SALD) toolUltra-high deposition rates, up to several micrometers per hourRotary Batch Plasma Enhanced PEALD process for up to 7 pcs of 200 mm wafersFor lenses and other 3D substrates with thickness up to 30 mmHigh film thickness uniformity, suitable for demanding optical coating applicationsCan be equipped with a load lock or  (cluster tool) wafer automation.Typical uniformity <2 % over the batchTypical materials SiO2, TiO2, Ta2O5, Al2O3Typical substratesWafers, up to 200 mmMirrorsHigh curvature lensesAdditional contentBrochure of the C2R can be found here.Additional video about the TFS-200 can be found here.Learn more about the science of spatial ALD here.
Beneq TFS 500 R&D Batch ALD System
R&D Batch ALD System
The TFS 500 is ideal for diverse use in thin film coating applications. Being the first Beneq reactor model, has proven its case as a versatile tool for both in-depth ALD research and robust batch processing. The TFS 500 is an ideal tool for multi-project environments.The TFS 500 can handle several types of substrates; wafers, planar objects, particles and porous bulk materials, as well as complex 3D objects with high aspect ratio features. It can further be equipped with a manually operated load lock for increased wafer processing capabilities. Different types of reaction chambers can easily be fitted inside the vacuum chamber, which in turn enables optimizing each reaction chamber for each customer application.A list of open access scientific publications where the Beneq TFS 500 was used, can be found here.
Beneq P1500 Batch Production Equipment
Batch Production Equipment
The Beneq P1500 is the world’s largest ALD reactor. With a vacuum chamber width of 1.7 meters, this tool is uniquely designed to coat very wide area substrates and large batches of 3D components. As the latest innovation in Beneq’s P-Series, the P1500 continues to enable ALD on the biggest scale with viable high-volume manufacturing solutions.The P1500 is used for optical coatings on large diameter substrates, anticorrosive coatings of semiconductor equipment parts, and various applications where ALD is used on glass or metal sheets.
Beneq P800 Production Equipment
Batch Production ALD system
The Beneq P800 is specifically designed to coat big parts of complex shapes or large batches of smaller parts. Our customers use the P800 for optical coatings, anticorrosive coatings of semiconductor equipment parts, and various applications where ALD is used on glass or metal sheets. Perfect for industrial manufacturing. Boasting a vacuum chamber with a diameter of 800 mm, this tool provides ample space for high volume coating production while still providing excellent batch uniformity. It is ideal for depositing thick optical coatings and etch-resistant barrier films.Additional contentBrochure of the P800 can be found here.Additional videos about the P800 can be found here and here.
Beneq P400A Batch Production Equipment
Batch Production Equipment
The Beneq P400A is built specifically to coat different types of substrates in an optimized batch size – large enough to offer significant capacity, but small enough to maintain excellent uniformity within batches and short cycle times. Our customers use the P400A for optical coatings and applications where ALD is used on glass or metal sheets. The Beneq P400A is a highly optimized, production-proven batch ALD system for high volume manufacturing of optical coatings and moisture barriers. P400A is large enough to offer significant capacity, but small enough to maintain excellent uniformity within batches and short cycle times.
Beneq Prodigy™ Semiconductor Production Tool
200 mm Semiconductor Wafer Batch Production Tool
Beneq Prodigy™ is the ideal manufacturing solution for VCSEL, LED and MEMS manufacturers and foundries looking to enhance the device performance and reliability through an affordable stand-alone ALD batch tool. Beneq Prodigy provides best-of-breed passivation and/or encapsulation films across multiple wafer types and sizes. Prodigy is a simple, yet elegant, solution for enhancing device performance on 75–200 mm wafers with a low-cost batch tool with the latest ALD technology.Prodigy offers pure simplicity through an automated loader with horizontal wafer handling and easy maintenance & serviceability with easy side access.
Beneq Transform® Cluster Tool
200 mm single wafer plasma ALD & 200 mm batch thermal ALD cluster system
Thermal and Plasma ALD systems connected in one cluster system. Single wafer or batch processing. Widest range of high-performance oxides and nitrides. Maximize your options for flexible volume production. With its flexible automation platform and unique capability to combine both thermal batch and plasma enhanced ALD process modules in one integrated system, Beneq Transform® offers unparalleled flexibility in how processing sequences can be realized to meet the most demanding thin-film deposition requirements.Beneq Transform® establishes a completely new class of ALD cluster tool products in it’s versatility and adaptability to address a broad range of applications and market segments. The Beneq Transform® is a one-stop ALD solution for Power Electronics, MEMS and Sensors, RF, LED, Photonics, and Advanced Packaging applications and other More than Moore applications. Beneq Transform® configured with multiple ALD process modules to meet a specific wafer capacity requirement or be later upgraded in response to growing volumes or with new ALD applications.The Transform 200 cluster consists of:Brooks transfer module200 mm thermal batch ALD reactor2 units of 200 mm single wafer plasma ALD reactorsBatch wafer heater moduleBrooks transfer moduleThe Transform 200 Lite cluster consists of:Brooks transfer module200 mm thermal batch ALD reactor200 mm single wafer reactorBatch wafer heater moduleBrooks transfer moduleAdditional contentBrochure of the Transform can be found here.Additional video about the Transform can be found here.Atomic Layer Deposition (ALD) equipment percolates into serial production of More-than-Moore devices, a conversation  with Yole Développement. 
Beneq Transform 300 Cluster Tool
300 mm single wafer plasma and 300 mm batch thermal ALD cluster system
Thermal and Plasma ALD systems connected in one cluster system. Single wafer or batch processing. Widest range of high-performance oxides and nitrides. Maximize your options for flexible volume production. With its flexible automation platform and unique capability to combine both thermal batch and plasma enhanced ALD process modules in one integrated system, Beneq Transform® offers unparalleled flexibility in how processing sequences can be realized to meet the most demanding thin-film deposition requirements.Beneq Transform® 300 is the only 300 mm ALD cluster tool combining thermal ALD (batch) and plasma ALD (single wafer) technologies to provide a highly versatile solution to IDMs and foundries. Transform® 300 is dedicated to a broad range of advanced thin-film applications from gate dielectric to anti-reflection coating, final passivation or encapsulation and beyond.Transform 300 consists of:2 units of single 300 mm wafer plasma ALD reactor Batch 300 mm wafer thermal ALD reactorBatch 300 mm wafer preheater moduleBrooks transfer moduleAdditional contentBrochure of the Transform can be found here.Additional video about the Transform can be found here.
SparkNano Omega Series Roll to Roll spatial ALD
Roll to Roll spatial ALD
The optimized design enables ultrafast deposition onto flexible substrates, such as polymer or metal foils.  The system can be configured for thermal or plasma enhanced Spatial ALD to match the desired material to be deposited.  The web width, web speed and deposition materials will be ready to be adopted according to the overall customer application. The standard web-with is ranging from 300 to 2000 mm and a web speed up to 60 m/min. SparkNano uses proven technology used for other high throughput energy applications. Additionally,  optional integrational designs for line integration are offered. 
SparkNano Vellum series R&D and production spatial ALD tool for large flat substrates
R&D and production spatial ALD tool for large flat substrates
Vellum is tailored designed for sheet to sheet (S2S) applications for deposition on substrates ranging from 0,5 x 0,5m up to 1 x 1.5 m. Substrates like metal or polymer foils, wafers, glass and porous substrates. All aimed at real production throughput up to 20 substrates per minute. In combination with a large variety of deposition materials and deposition temperatures.  The substrate flow handling and inline integrated set-up of the system will be in designed as the overall set-up requires.The Vellum product line is a fully automatic processing platform for high throughput.
SparkNano Labline Series 6" and 12" R&D  Spatial ALD Tool
R&D Spatial ALD Tool
The LabLine series are designed for versatility and flexibility and are especially suited for process development and pilot-line production.  Through its unique design, it is possible to accommodate a wide variety of types and sizes of substrates and different materials. The LabLine series is available in two sizes; for maximum 6 inch and for maximum 12 inch substrates . The LabLine series  combines the highest quality Spatial ALD film depositions together with the flexibility of the system to fit future needs and applications. Learn more about the science of atmospheric spatial ALD here.
ForgeNano HELIOS Object Coating
Object Coating
Commercial ScaleThe HELIOS industrial line offers cost-effective ALD coatings on parts ranging from microns to meters. HELIOS coating systems bring film quality, atomic-level control and conformal performance of ALD to industrial manufacturing, opening up new possibilities and enabling novel applications as protective of functional surface engineered objects. HELIOS is designed for efficiency with ‘zero-waste’ processing, substantially lower factory power consumption and small footprint. A patented integrated abatement ensures minimal maintenance and exceeds uptime records of legacy CVD and PVD equipment.
ForgeNano CIRCE Particle coating
Particle coating
Commercial scaleThe CIRCE system is designed to coat each particle with unrivaled thickness and conformity control, without aggregating particles. CIRCE is designed for your product specifications to optimize reliability and performance. The Continuous Vibrating System lets you maximize production capacity with a compact footprint.
ForgeNano MORPHEUS Particle coating
Particle coating
Commercial scale (Sub-Nanoscale at Kiloton volume)Morpheus bridges the gap from small-scale to commercial-scale. MORPHEUS Semi-Continuous Reactor Systems are designed for commercial Atomic Layer Deposition at scale. Configurable and customizable to nearly any application or footprint. Only Forge Nano can make PALD this simple and this scalable.
ForgeNano LITHOS Particle coating
Particle coating
Commercial Scale (medium to large)LITHOS Rotary Blender Reactor System combines industry expertise in rotary particle handling with a deep understanding of ALD, resulting in an easy-to-use, flexible, and reliable production system. LITHOS is designed to coat each particle with unrivaled thickness and conformity control, while minimizing or eliminating particle agglomeration. 
ForgeNano PROMETHEUS Powder coating
Powder coating
R&D/Pilot ScalePrometheus accelerates the understanding of Atomic Layer Deposition and develops its commercial applications. Prometheus is a lab-scale atomic layer deposition tool, built with scaleability in mind, with multiple reactor sizes available, batch size is adjustable
Encapsulix Infinity M500 Manually Loaded Tool
Manually Loaded Tool
The Encapsulix Infinity M500D is a versatile product family for extremely fast sheet-to-sheet low temperature, deposition in pilot manufacturing and advanced R&D. Typical applications are OLED (lighting and displays) , LED , photovoltaics ( Perovskite and organic PV, passivation layers on silicon PV), batteries and ultracapacitors as well as flexible electronics and advanced optical coatings. Substrate handling can be adapted easily to accommodate a variety of substrates such as Gen 2.5 FPD glass ( 400mm x 500 mm) or multisubstrate cassettes for Silicon PV cells. Substrate loading can be either manual or automated with interfacing to a robot in a glovebox. The Infinity product family is based on Encapsulix Parallel Precursor Wave™ (PPW) reactor architecture, which allows for extremely fast deposition, even at low temperature. For example, in the case of OLED encapsulation by Al2O3 at 80°C, the cycle time is less than one second. All tools of the family use the same core technology subsystems. Thus, process transfer between R&D on smaller substrates and manufacturing on larger substrates is smooth and hassle free.  Modular zero-dead-volume ALD valves allow for ultrarapid change between metal precursors (less than 1 second). Hence, the tool is extremely well suited for the deposition of multilayers and nanolaminates. The tool is highly configurable with a large number of options ( see below).The control system uses the Encapsulix UCS architecture, the core of which is a real time controller with state machine and OPC-UA dataserver. Recipe files are text based on an open syntax format, allowing for off-line recipe creation and remote process support. The tool has extensive real time and delayed data logging and monitoring capabilities. A list of scientific publications where the Encapsulix has been used can be found here.
Beneq TFS 200 R&D wafer, 3D and powder coating tool
R&D wafer, 3D and powder coating tool
ALD research equipment that grows with you. Beneq TFS 200 is the most flexible ALD research platform ever designed for academic research and corporate R&D. Beneq TFS 200 has specifically been designed to minimize any cross contamination that could happen in a multi-user research environment. The large number of available options and upgrades means that your Beneq TFS 200 will grow with you to meet even the most demanding research requirements. Beneq TFS 200 represents technical solutions that enable deposition of superior quality coatings on wafers, planar objects, porous bulk materials and complex 3D objects with very high aspect ratio (HAR) features. Direct and remote plasma-enhanced deposition (PEALD) is available in Beneq TFS 200 as a standard option. The plasma is capacitively-coupled (CCP), which is the industry standard today. The CCP plasma option offers both direct and remote plasma-enhanced ALD (PEALD) for substrates up to 200mm, face-up or face-down.Process cycle time customarily less than 2 seconds. In specific cases even less than 1 secondHigh Aspect Ratio (HAR) available for structures with vias and porous substratesCold-wall vacuum chamber for rapid heating and coolingAuxiliary entry ports in vacuum chamber enable plasma, in situ diagnostics etc.Load lock available for rapid substrate change and integration with other equipment.A list of open acces scientific publications where the Beneq TFS 200 has been used can be found here.
ForgeNano THEIA Wafer and object coating
Wafer and object coating
THEIA delivers ultra fast deposition with Forge Nano’s patented SMFD-ALD™ in a low cost system for R&D budgets. Sub-second ALD cycle times allow efficient and rapid exploration of applications requiring thick films. Covering challenging patterned substrates such as advanced-generation DRAM device wafers, membranes, sensors, electron multipliers, etc. with aspect ratios up to 1,000. The flexible chamber design allows for both; round up to 200 mm substrate chuck that fits semiconductor wafers, or square parts carrying tray that better accommodates panels or randomly shaped parts.
ForgeNano PANDORA Powder coating
Powder coating
R&D scalePANDORA makes Particle Atomic Layer Deposition faster, more affordable, and more convenient than anything else on the market today. This instrument comes ready to run out of the box and ensures worry-free, reliable operation, day in and day out.
ForgeNano APOLLO Wafer and object coating
Wafer and object coating
Commercial Scale APOLLO provides fully automatic cassette-to-cassette ALD processes with high throughput performance at the lowest cost of ownership. APOLLO leads in every aspect of ALD productivity, performance, cost, and sets a new standard for efficiency while reducing environmental impact. With its ‘zero-waste’ processing, APOLLO lowers factory power consumption and occupies a smaller footprint on the clean-room floor.
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