The SC Qube is an ALD batch system for R & D and small scale production to coat different kinds and sizes of 3D parts. Flexible, versatile and scalable to meet the user requirements. Robust and capable of ALD or PEALD in single substrate or batch mode. Accommodating from single wafer up to 70L size chambers of various materials (Al, SS, Ti), shapes and sizes. Enabling a growing list of ALD chemistries onto single substrates of various kinds (wafers, 3D parts, particles, bulk, porous, high aspect ratio) up to mid size batches for small or mid size production with outstanding performance. Either stand alone, automation integrated inside or outside your cleanroom, it will enable your ALD journey from lab to fab.

Chamber Dimensions: From single wafer to 70 L, W x L x H adapted to part geometry and optimised to production volume.

Chamber Type: Single Wafer, Batch Production, FBR integration, Microwave plasma sources for PE-ALD compatible for wafer and small batches.

Loading: Manual/automated front loading, Custom frame holders for 3D parts. Cleanroom and glovebox compatible.

Temperature: Up to 400°C (higher on request)

Precursors: Up to 15 gas sources with 10 individual inlets, (Non-)heated precursor bubbler bottles, Ozone generator option.

Standard Materials: Al2O3, ZnO, SiO2, TiO, Y2O3, ZrO2, HfO2, LiNbO5, Nitrides, and more.

Substrate Sizes: Single wafer 4 -12". Multiple substrates or 3D objects of various shapes and sizes.

Dimensions of chamber and holder: are optimally adapted to the parts and coating material.

 Application Domains: Materials Discovery & Device Prototyping, Process Transfer & Scale-Up Validation, Conformal Coatings on High-Aspect-Ratio Structures, Surface Functionalization of Powders