Atomic Layer Deposition
ALD PRODUCTS
ALD Systems
- Manufacturer
- Beneq
- Product model
- Transmute
- Type of product
- High-Throughput batch 200 mm ALD Platform
- Description
Beneq Transmute — 200 mm ALD Production Platform for WBG, RF and μLED Devices
Beneq Transmute is a high-throughput ALD production platform designed for 200 mm semiconductor fabs, with a focus on wide-bandgap power electronics, RF devices, μLEDs and specialty semiconductor manufacturing. The system combines thermal batch ALD, plasma-enhanced ALD, and plasma pre-treatment in a modular cluster architecture, enabling high-quality conformal films, interface engineering, passivation layers and dielectric stacks for demanding device applications.
The platform is built around 25-wafer mini-batch thermal ALD chambers, supporting efficient production throughput while maintaining the film uniformity and conformality associated with ALD. Its cluster configuration can integrate multiple process modules, including thermal ALD, PEALD, plasma treatment, buffer and preheating modules.
- Technical features
Parameter Beneq Transmute™ Wafer size 200 mm Wafer handling Mini-batch, 25 wafers per thermal ALD chamber Process types Thermal ALD, plasma-enhanced ALD, plasma pre-treatment Main markets WBG power devices, RF devices, μLEDs, specialty semiconductors Typical substrates/devices GaN, SiC, RF and compound semiconductor wafers Applications Passivation, dielectric layers, interface control, conformal coatings, production ALD film stacks Production focus High throughput, low precursor waste, uniform wafer coverage and reduced cost of ownership - Product Links
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Beneq Transmute manufacturer page
