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By Agnieszka Gozdek / March 01, 2026

Sunday Dose of ALD week 9, 2026. Read all ALD related scientific articles of Feb 23 - March 01.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

A Liquid Ge (IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films

Signatures of Dynes superconductivity in the THz response of ALD-grown NbN thin films

Elucidation of Enhanced Lysine Sensing via Pt-Functionalized 2D WS₂ for Biosensing Applications

Multifunctional and Robust Optoelectronic Synapses Based on Metal Oxide/Metalcone Heterojunctions by Atomic/Molecular Layer Deposition

Analysis of the Advantages and Emerging Applications of ALD Technology in Semiconductor Manufacturing

Life Cycle Assessment of CVD and ALD of Gallium Nitride

Atomic Layer Deposition of Al₂O₃ Regulates the Pt/ZSM‐23 Metal‐Acid Balance to Promote Efficient Hydroisomerization of n‐Hexadecane

Carbon-supported, size-tunable Ni nanoparticles by atomic layer deposition

Elucidating the super-cycle mechanism in atomic layer growth of HfAlOx ternary metal oxide from an ab-initio study

Nanolaminated Structural Design of PEALD InAlO TFTs for Optimizing Mobility and Stability

Hydrothermally Controlled ZnO Nanorod Dimensions in ZnO/CdS Photoanodes for Enhanced PEC Water Splitting

Scheduling Dual-Arm Cluster Tools With Multifunctional Process Modules Using Deep Reinforcement Learning

Effect of molecular layer deposition parameters on the electron beam resist properties of hafnicone hybrid films

Anisotropic quasi-atomic layer etching of InGaZnO₄ using unbiased CH₄ and continuous/pulsed biased O₂ plasmas

Controlling tail-group configurations in self-assembled monolayers for high performance area-selective atomic layer deposition

Investigation of Buried Channel Array Transistor as a Scalable High-Voltage Pass Transistor for 3D NAND Flash Memory

Reduced Leakage and Enhanced Endurance via an ITO Oxygen Reservoir Layer in HZO Ferroelectric Capacitors

Polarization Enhanced GaN SBDs with p-NiO/LiNiO Junction Termination Extensions Achieving 1 kV Breakdown Voltage

Monolithically Stackable 1T1C 3-D DRAM: A Technical Survey

Understanding and Tuning Mobile Interfaces in Ferroelectric Hf_0.5Zr_0.5O₂ Thin Films in Relation to Microstructure

Al-Doped Rutile TiO₂ with Y₂O₃–ZrO₂ Stacks Achieving Thin Thickness and Low Leakage for Dynamic Random-Access Memory Capacitors

Simultaneous H₂O:O₂ Co‐Reactant Pulsing for Functional Property Control of Atomic Layer Deposited ZnO, TiO₂, and Al₂O₃ Thin Films

Tuning of Atomic Layer Deposition Pulse Time through Physics-Informed Bayesian Active Learning

Recent advances in designing efficient dual-atom electrocatalysts: an in-depth investigation from material to mechanism

Enhanced stability of tin-lead perovskite solar cells through low-temperature atomic layer deposition Al2MgO4 encapsulation layer

Epitaxial Growth of Void-Free Pd Nanofilm Using Ethylenediamine via One-Cell Electrochemical-Atomic Layer Deposition

Atomic Layer Deposition of Pd: Schottky Junction Construction on CoP-Co₂P for Efficient Hydrogen Evolution

Introduction to Advanced Coating and Cladding Technologies