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By Agnieszka Gozdek / February 22, 2026

Sunday Dose of ALD week 8, 2026. Read all ALD related scientific articles of Feb 16 - 22.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Accelerating Discovery to Deployment: Argonne's Materials Engineering Research Facility (MERF) and Its Role in Scaling Materials Technologies for Water and Resource Solutions

Precisely constructing subsurface electron pump stabilizes Pt catalysts against oxygen-induced degradation in fuel cells

Study on improving performance of In₂O₃/ZnO heterojunction thin-film transistors fabricated by atomic layer deposition process

Sensing of Hydrogen Diffusion through Protective Caps: An Ellipsometric Approach to Estimate Hydrogen Content in Pd/Hf Stacks with an Al₂O₃ Cap

Progress and perspectives on p-GaN Cap Layer etching engineering over p-GaN/AlGaN/GaN heterojunctions

The effect of atomic layer etching (ALE) processes on polyhydroxystyrene-based EUV chemical amplification resist

[PDF] Symmetric Pulse-enabled Highly Linear Analog Switching in ALD-grown HfO2/Ta2O5-based Memristor for Multi-level Storage and Synaptic Applications

Rational regulation of palladium dual active sites for highly efficient hydrogenation of phenol

[HTML] Interface engineering of Pt–ZnO–CeO2 by atomic layer deposition for advanced applications

Atomic Layer Deposition of Textured ZnO on 200 mm Wafers for Device Applications

Surface Chemistry in the Initial Stages of Titanium Nitride Atomic Layer Deposition Using Operando Ambient Pressure X-ray Photoelectron Spectroscopy

Spatial homogeneity of superconducting order parameter in NbN films grown by atomic layer deposition

[HTML] Toward scalable solar cells: optimizing atmospheric-pressure spatial atomic layer deposition SnOX for enhanced perovskite crystallization and performance

Crystallinity and stoichiometry engineering in TiO2 thin films via O3 post-treatment for enhanced dielectric properties

Study of pulsation-assisted atomic layer deposition of cohesive particles via the TFM-PBM simulation

Real-time observation and mitigation of Pt nanoparticle sintering during propane dehydrogenation: ALD-based strategies for nanocatalyst stabilization

Impact of variations in ALD procedure on nanomorphology, protecting properties and chemical stability of thin TiO 2 films

ALD-Engineered ZnO Gradient-Doped Coating for Enhanced Carbon Compatibility and Stability of Nickel-Rich Cathodes

Nanoionics Drastically Accelerating Mass Transfer at Elevated Temperatures over 750° C

Vacancy Passivation and ALD Alumina Encapsulation Strategies for Stable Multilayered All‐Inorganic Halide Perovskite Pc‐WLEDs

Selective Pore Sealing of Anodic Porous Alumina by Atomic Layer Deposition of TiO₂ Layer

[HTML] Enhancement of Corrosion Resistance in 304 Stainless Steel Through Hybrid Parylene C–ALD Al₂O₃ Composite Coatings

Atomic Layer Epitaxy of (002) κ-Ga₂O₃ on c-Plane Sapphire

Expanding the zinc precursor toolbox: a comparative study of precursors for thermal ALD of ZnO thin films

[HTML] Recent Advances in Antimony Sulfide (Sb2S3) Thin Films

[HTML] Metal surface passivation in semiconductor processing of Mo, W, TiN/TiSiN, and Cu: emerging strategies for corrosion and etching control

[HTML] Advances and Perspectives in Gate Dielectric Thin Films for 4H-SiC MOSFETs