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By Admin Account / February 08, 2026

Sunday Dose of ALD week 6, 2026. Read all ALD related scientific articles of Feb 02 - 08.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

[HTML] Role of idealized surface representations in computational area-selective atomic layer deposition: Assessing trimethoxypropylsilane blocking performance for Al2O3 deposition with crystalline SiO2

Interfacial Oxygen Coordination Controlled by Mo, Cu, and Cr Electrodes in ALD-Grown IGZO Thin-Film Transistors

Ferroelectric Field Effect Transistor With Annealing-Free Ultralow Process Temperature (250 °C) of Hf_xZr_1-_xO₂ for BEOL Application

The milder synthesis and highly-efficient purification of tetrakis (dimethylamino) titanium with ultrahigh-purity for wafer-scale TiO2 film under atomic layer deposition

Multiscale Modeling of Area-Selective Atomic Layer Deposition of SiO2 on Al2O3 and SiO2 Surfaces with Intermediate Etching Steps

Nonplanar Atomic Layer Deposition (ALD)‐Niobium Oxide (NbOx) Neurons for Oscillatory Neural Network Applications

Material and Electrical Characteristics of a Thin-Film Transistor Using Cationic Composition-Controlled Atomic Layer-Deposited In–Ga–Sn–O (IGTO) Thin Film

[HTML] A Mini Review on the Status of Thin Film Deposition Techniques for High-Performance Solar Cells: Successes, Challenges, and Future Prospects

[HTML] CeOx-functionalized Pd nanoparticles on single-walled carbon nanotubes for alkaline hydrogen oxidation reaction

STUDY OF ATOMIC LAYER DEPOSITED METAL OXIDES AS ADHESION LAYER FOR PLATINUM ONTO THERMAL SILICON DIOXIDE

Ruthenium (ii) carbonyl amidates–a new class of precursors for atomic layer deposition

Electrochemical classification of electron-transfer mechanisms at Pt/TiO2 interfaces: Transition from barrier-limited to tunneling-mediated pathways

Atomic Layer Deposited Pd Nanoparticles in TiO2 Thin Film Enabling Selective Photoresponse for Visual Nociceptor

Deposition Methods of Multilayer Hard Coatings for Improving Tribological Performance: A Mini-Review

Materials Studies of Niobium Thin Films for Quantum Circuit Applications: Progress and Challenges

Atomic layer deposition of MoO2 using a tetravalent precursor for template-driven rutile TiO2 growth in DRAM capacitors

Chemisorption of tetrakis (dimethylamido) hafnium on hydroxylated HfO2: A comparative theoretical study with Zr and Ti precursors

Inorganic High-Performance Fiber-Based Materials for Electromagnetic Interference Shielding: Fundamentals, Fabrications, and Emerging Applications

Index-Tapered Nanostructured Films via Selective Porosification for Enhanced Light Harvesting and Environmental Robustness

Surface Modifications of Titanium Alloys: How to Achieve Bioactivity and Antibacterial Surface Not Enhancing Cytotoxicity?

Topographically Selective Atomic Layer Deposition of HfO2 Thin Films in High Aspect Ratio Structures by Vapor-Dosed Surface Protector

Influence of particle size uniformity on the sintering behaviour of platinum nanoparticles on graphene

Amido‐Amine Co (II) Precursor‐Based Atomic/Molecular Layer Deposition Processes for Cobalt‐Organic Thin Films and Their Thermal Conversion to CoO Thin Films

[HTML] Hot carrier charge dynamics in hafnium oxynitride thin films synthesized using plasma-enhanced atomic layer deposition

Beyond ZrO₂: Rutile TiO₂ as the Dielectric Platform for Next-Generation DRAM Capacitors

Area‐Selective Atomic Layer Deposition of AlO_x at the Buried Interface for High‐Performance Perovskite Solar Cells