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By Admin Account / December 28, 2025

Sunday Dose of ALD week 52, 2025. Read all ALD related scientific articles of Dec 22 - 28.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Enhanced 2D MoTe₂ Analogue Switching through Laser Processing and ALD-Passivation for Dual-Function Neuromorphic Devices

Anhydrous Atomic Layer Deposition of HfO₂: Mechanistic Analysis of the Tetrakis(dimethylamido)hafnium (TDMAH)–O₂ Process

Remote Epitaxy and Phase Diagram of Single-Crystalline Ultrathin VO₂ Films on the TiO₂(001) Substrate

Rational Optimization of a Palladium-Nickel Core-Shell Semi-Hydrogenation Catalyst

Chirality Imprinting and Spin-texture Tunability in Conformally Coated 3D Magnetic Nanostructured Metamaterials

Metal–Organic Hybrid Material with Polar Covalent Bonds as a Protective Layer for Zn Anodes in Aqueous Zinc Batteries

Oxygen Plasma‐Treated Dielectric‐Channel Interface for BEOL‐Compatible IGZO TFTs with High Electrical Stability

Probing the Structure of D2O Ice Layers on ALD-grown ZrO2, Al2O3 and TiO2 Thin Films by Sum Frequency Generation (SFG) Spectroscopy

Unveiling crystalline silicon edge subsurface passivation impact on photovoltaics via three-dimensional spatially resolved micro-photoelectrical mapping

Unlocking Ferroelectricity in Scalable AlBN Films via Plasma‐Enhanced Atomic Layer Deposition

Tunable Electronic and Optoelectronic Properties of MoS₂ Through Molecular Coverage‐Controlled Polyoxometalate Doping

Thickness‐Driven Modulation of Electronic Transport in SnSe₂‐grown Films by Low‐Temperature Atomic Layer Deposition

Room Temperature and Atmospheric Pressure Atomic Layer Deposition of SiO₂ Thin Films Mediated by a Molecular Water Layer

Precursor development for the growth of Ru, Re, and Al metal films by thermal atomic layer deposition

Atomic Layer Deposition-Driven Nanoengineering of Cobalt Thin Film Morphology to Modulate Water Splitting Mechanisms

High-temperature high-growth-rate atomic layer deposition of SiO2 using hexamethyldisilylamino-dimethylamino-silane

High-Performance Low-Temperature SnO2 TFTs with Optimized Al-Doping and Ultra-Thin Channel via Atomic Layer Deposition

Reconciling the Stability-Activity Dilemma on Perovskite Oxide Electrode Surfaces with Oxygen-Deficient ZrO_x Nanocoatings

Atomic layer deposition of TiAlC for low work function ohmic contacts

[HTML] Progress and Perspectives in Nanostructured Thin Films

Effects of aluminum content and purge time on optoelectronic properties of ALD AZO films

Enhancing non-volatile memory and neuromorphic computing: integration of PRAM and OTS for scalable, energy-efficient architectures

Acid-Catalyzed Liquid ALD Growth of Lanthanum Aluminate Thin Films Using Stoichiometric Injections

Band-gap engineering in TiOx and TiOx-Ni thin films by plasma-enhanced atomic layer deposition: Structural and optical insights

Design of Nickel-based Electrocatalysts for Water Splitting: Thin Films, 3D Electrodes, and Activation Mechanisms

Influence of the number of growth cycles on the solar-blind photoresponse of amorphous and crystalline Ga₂O₃ films by atomic layer deposition

Film and surface stress during Al2O3 and AlF3 atomic layer deposition using in situ wafer curvature measurements s

Robust multilevel storage characteristics of Al₂O₃/HfO₂/Al₂O₃ trilayer-structured memristor fabricated by atomic layer deposition for neuromorphic computing

if you made it this far, congratulations and Merry Christmas from the ALD Cat!

Sunday Dose of ALD week 52, 2025. Read all ALD related scientific articles of Dec 22 - 28.