Sunday Dose of ALD week 46, 2025. Read all ALD related scientific articles of Nov 10-16.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

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This week's ALD related articles:

[THESIS] Divide in Time to Conquer the Surface: ALD Studies to Understand Surface Chemistry of AlxTi1-xN CVD

Solution ALD of (CH₃NH₃)(PbI₃) Perovskite Thin Films Yields Functional Quality and Stability Superior to Classical Processing

Effect of atomic layer deposition and alumina actions of optoelectronic behaviour of polyfluorene OLEDS

Sacrificial Atomic Layer Deposition for Chalcogenide Thin Films

High-Performance Indium Oxide Quasi-Two-Dimensional Electron Gas Transistors Using Atomic Layer Deposition and Interface Engineering

Low-temperature plasma-enhanced atomic layer deposition of Ga2O3 films using N2O plasma for silicon surface passivation

Atomic Layer Processes for UV-Stable Polymers: Synergistic Effects of Infiltration and Deposition of ZnO

Directional atomic layer etching of lithium niobate using Br-based plasma

Effect of plasma parameters on the properties of V2O5 deposited by plasma-enhanced atomic layer deposition

High mobility In₂O₃ thin films grown by atomic layer deposition using a microwave remote plasma source for field-effect transistor applications

Second Harmonic Characteristics of Large‐Area ALD‐Grown MoS₂ Monolayers and MoS₂/WS₂ Heterostructures with Sub‐Millimeter Crystalline Orientation

Boosting the Mechanical Strength and Photocatalytic Activity of 3D-Printed Titania Aerogels by Atomic Layer Deposition and Heat Treatment

Single-atom enzymes: from nano-enzyme evolution to the biomedical frontier of precision catalysis

Breaking the Humidity Barrier: ALD-Engineered Pt–WO₃ Photoelectrode for Ultra-Stable Photo-Assisted Li–O₂ Batteries

First-principles and kinetic Monte Carlo study of plasma-induced reactive sites in SiNx/SiCN plasma-enhanced atomic layer deposition

[HTML] 600 K Temperature Robustness and 10 Resistance Levels Memristor based on AlN Films

Sandwich-Structured Lithiophilic Layer with Mixed Ionic–Electronic Conductivity for Lithium Metal Batteries

Atomic layer deposition of ZnO on NH2-MIL-125 (Ti) for enhanced selective CO2 to CH4 conversion via S-scheme heterojunction engineering

[HTML] In situ Al2O3 atomic layer deposition on pristine (0 0 1) GaAs: interface chemistry and its implication on charge carrier recombination and Fermi level pinning

[HTML] Alumina layers deposited with different precursors by atomic layer deposition and magnetron sputtering: negative charge and its origin

Engineering metal/oxide interfaces in IGZO thin-film transistors via atomic-layer-grown SiO2 interlayers for improved contact performance

Atomic layer etching-enabled interface engineering for enhanced carrier transport in GaN trench MOSFETs

Low-Temperature Processed Al-Doped HfO₂ Ferroelectric Memristor with IGZO Exhibiting High Polarization, Endurance, and Retention

Low-Damage Atomic Layer Etching for Contact Resistance Reduction in Millimeter Wave AlGaN/GaN HEMTs on Si

Long-Term Stable Neural Interfaces with Nanoporous Graphene Electrodes and Hybrid Polyimide-Aluminium Oxide Encapsulation

Investigation of anomalous positive bias temperature instability in GaN MIS-HEMTs with PEALD SiNx gate dielectrics

Investigation of kinetic inductance and microwave loss in thin-film TaCxN1− x superconducting resonators

[HTML] Atomic layer etching of TiN by oxidation and SF6-H2 plasma exposure: ALE window defined by HF, H, and F