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By Admin Account / November 09, 2025

Sunday Dose of ALD week 45, 2025. Read all ALD related scientific articles of Nov 3 - 9.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Register here for the upcoming Beneq ALD for Power & RF Electronics Forum in Munich (During the Semicon Europa Exhibition) on Nov 19 (2025)!

[HTML] Transmission electron microscopy analysis of atomic layer deposited NbTiN/NbN superconducting thin films

Precursor ligand chemistry-driven engineering of SiNx gate insulators for enhanced IGZO TFTs

Fabrication of high-step-coverage HfO2 thin films via atomic layer deposition

Gain regulation of microchannel plate via atomic layer deposition of Al2O3 films

Characterization of ALD TiO2 Films on Nanostructured Black Silicon Layer

Effect of Vapor Phase Infiltration on Mechanical and Chemical Properties of Polyethersulfone Membranes

[HTML] Atomic layer deposition of SiO2 to cap SiO2: Al stacks for modulation acceptor doping of silicon

Soft materials engineered synthetic polymer membranes: Bridging design and application

Enhancing Electrical and Interfacial Properties of BeO/4H‐SiC Structures with SiO₂ Interlayer

Ab-initio Thermodynamic Study of Vapor Pressure of Mo(CO)₆ and Its Initial Surface Reaction on SiO₂ (111) Surface

High-Energy-Density Next-Generation Batteries: Advanced Engineering of Cathode, Anode, and Electrolyte

Atomic layer etching for vertical trench control and electrical optimization in high-density low-k materials

Patterning of Mg-Based Oxide Semiconductors (MgZnO) at Sub-100 nm Pitches: Reactive Ion Etching versus Atomic Layer Etching

Low-Power MEMS Gas Sensor Based on TiO₂/SnO₂ Core–Shell Nanorods for Ultrasensitive H₂S Detection

From Pinhole Density to Nucleation Onset: A Numerical Model for SAM Barrier Performance in Selective Atomic Layer Deposition

Process Condition Optimization for Atomic Layer Etching: Insights into Surface Phenomena from Multiscale Computational Framework and Experiments

Overcoming the Critical Thickness Limit: Interfacial Control of Crystallization Pathways in Atomic-Scale Dielectric Thin Films

Thermal Atomic Layer Etching of Indium Gallium Zinc Oxide (IGZO), In₂O₃, Ga₂O₃, and ZnO Using Sequential Hydrogen Fluoride and Acetylacetone Exposures

Scalable Dielectrics Technology for 2D Materials Electronics

Cryogenic atomic layer etching of SiO2 using CH2F2/Ar plasma for Improved process window for nanoscale fabrication

Surface Engineering of Polymeric Membranes with Metal Oxides for Improved Fouling Resistance and Superior Oil-Water Separation

Tunable photocatalytic activity of metal oxides: designing, principles, parameters, and progress

[PDF] Design and Modeling of Al₂O₃–Cr₂O₃ Thin Films and Binary Systems: Thermodynamic, Microstructural, and Functional Insights

[HTML] Single-atom catalysts for next-generation energy storage and conversion

Treatments to control the optical, electronic, and structural properties of monolayer MoS2 films

[HTML] Functional Coatings for Fiber Bragg Gratings: A Critical Review of Deposition Techniques for Embedded and Harsh-Environment Applications

Fabrication techniques for perovskite solar cells