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By Admin Account / November 02, 2025

Sunday Dose of ALD week 44, 2025. Read all ALD related scientific articles of Oct 27 - Nov 2.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Register here for the upcoming Beneq ALD for Power & RF Electronics Forum in Munich (During the Semicon Europa Exhibition) on Nov 19 (2025)!

[HTML] A dry-wet quasi-ALE approach for transition metals: tungsten as a model system

Atomic-layer-deposited ZnO tailors Niδ⁻–ZnOδ⁺ interfaces to switch CO2 hydrogenation selectivity from CH4 to CO

A Computational Study for Screening High-Selectivity Inhibitors in Area-Selective Atomic Layer Deposition on Amorphous Surfaces

Atomic Layer Deposition of Gallium Oxide using Gallium Triazenide and Water

Cyclic Plasma Treatment for Enhancing the Synaptic Performance of Bulk-Conductive Resistive Switching Memory

Influence of deposition conditions on ALD based Ru passivation for Cu-Cu hybrid bonding

Novel surface finish with nanometer-thick Al2O3 layers via atomic layer deposition process: Properties of solder joint for advanced semiconductor packaging

Comparative insights into structural and optical properties of ZnO/Ag/ZnO and Ag/ZnO/Ag ternary layer thin films

A transmon qubit realized by exploiting the superconductor-insulator transition

Atomic Layer Deposition-Enabled Trench Oxide Thin-Film Transistors with Selective Dry Etching for High-Current Driving Applications

Quasi-Lossy Mode Resonances in Long Period Fiber Gratings: Achieving Linear Wavelength Shifts with Metallic-Dielectric Thin Films

Utilizing ALD to fabricate ZnO ETL to improve the luminous efficiency of perovskite light-emitting diodes

[HTML] Plasma-enhanced atomic layer deposition of silicon nitride using bis (diethylamino) silane precursor with N2-plasma

Ru:Al₂O₃ Resistive Coatings Fabricated by Atomic Layer Deposition for Application in Microchannel Plates

Zn and Al vapour-phase metalation of polyamide-6 via ALD: structural, functional, and biomedical insights

MoN_x Nanoscale-Thick Films Using BTBMMo and Ammonia in Plasma-Enhanced ALD for Cu Diffusion Barriers in High-Aspect-Ratio Nanohole 3D Interconnects

Atomic-Scale Tailoring of Sub-4 nm Ferroelectric Films via Multi-Pulse Doping and Monolayer Control

Pinacolborane as a Reducing Agent in the Atomic Layer Deposition of Copper and Bismuth

Suppression of Interfacial Side Reactions and Performance Enhancement of NCA Cathodes via LNO Deposition Using Particle ALD

Ultra-High Permittivity in HfO₂/ZrO₂ Superlattices via Morphotropic Phase Boundary Engineering

Establishment and modulation of linear VTH model with low interface states using atomic layer etching for E-mode GaN-based P-MOSFETs for digital logic application