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By Agnieszka Gozdek / September 06, 2026

Sunday Dose of ALD week 36, 2026. Read all ALD related scientific articles of Aug 31 - Sept 06.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

In-Situ Laser-Assisted Atomic Layer Deposition for Enhanced Thin Film Growth: A Demonstration with HfO2

[HTML] Interfacial Engineering with PEO-Based Ultrathin Layers for Stable All-Solid-State Lithium Batteries: From Passive Protection to Active Regulation

Nanocatalytic Metal Sites Inside 2D Silica Confined Microenvironment

Scalable Single-Step Open-Air Combinatorial Growth of Multifunctional Metal Oxide Thin Films by Spatial Atomic Layer Deposition

Buried-Gate Ferroelectric Memcapacitors for Scalable Capacitive Compute-in-Memory

Improving Catalytic Activity in Metal-Acid Bifunctional Catalysts by Selective Deposition of Trace Pt Single Atoms

Current status of atomic layer etching and its adoption to low-k fine patterning: An industrial perspective

Engineering Cobalt‐Based Thin Films for Fischer–Tropsch Synthesis

[CITAAT] Atomic layer etching brings 'cutting-edge'method to semiconductor nanofabrication

Influence of Mn Interlayer Thickness on the Structural Evolution and Derived Optical Modeling of ZnO/Mn/ZnO Multilayers Thin Films

Resolving the Hydrogen Paradox at ALD Al₂O₃/Si Interfaces in Dopant‐Free Silicon Photovoltaics

MXene-supported single-atom catalysts for next-generation seawater electrolysis: a roadmap to ocean-derived green hydrogen

[HTML] ALD/ALE 2026 Session AF2-TuM: Powder ALD

Atomic layer deposition-armored MnO2 enables ultra-stable aqueous ammonium-ion storage via dual-ion co-intercalation

Grain Boundary Engineering of Pt Passivation Layers for Enhanced Low-Temperature Copper Bonding

Energy band alignment between faceted Cu₂O particles and ZnO by atomic layer deposition

Gas-phase surface functionalization of plasma-deposited amorphous silicon and silicon nitride surfaces with aldehydes

In-plane thermal transport in porous nanolattice structures

Nanofabrication techniques and lithography process

Development in nanoscale device simulation and opportunities in electronic fabrication

Surface sp2 carbon elimination and hydroxylation of polycrystalline diamond

PEALD growth of Ni3Cx thin films and annealing-induced catalytic growth of graphene

[PDF] STRUCTURE AND OPTICAL ABSORPTION PROPERTIES OF TiO₂ THIN LAYER OBTAINED BY ATOMIC LAYER DEPOSITION

Evaluating LLM-based AI agents integrated with materials synthesis tools: the case of atomic layer deposition

Temperature Dependence and Relaxation Kinetics of Photoconductivity in Nanocrystalline InP Films Grown by PE-ALD

[HTML] RRAM-Based Neuromorphic Devices for Artificial-Intelligence Hardware: Device Physics, Materials, Processing, and Packaging

Carborane-Derived Monolayers as Blocking Layers for Area-Selective Deposition and Semiconductor Process Integration

Diversely Substituted Porphyrins for Molecular Layer Deposition and Comparative Studies of Their Physical Properties

A Critical Near-wafer Péclet Criterion for Wafer Rotation in Single-wafer Silicon Nitride Atomic Layer Deposition