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By Agnieszka Gozdek / August 30, 2026

Sunday Dose of ALD week 35, 2026. Read all ALD related scientific articles of Aug 24 - 30.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

[HTML] Controlled Strong Metal–Support Interactions in Pt@ GaOx Catalysts for Efficient and Durable Propane Dehydrogenation

Atomic Layer Deposition of AlO_x/SnO_y Passivating Charge Transport Bilayer for Silicon Solar Cells

Nanothermochromic smart windows: Nanostructures, doping and multifunctional strategies for high thermochromic performance

Electrochemical Stability and Biological Performance of ALD Sno₂-Coated Ti-13Nb-13Zr Alloy for Biomedical Applications

First-principles investigation of chlorine adsorption onto GaN (0001) during atomic layer etching

Front Channel Carrier Confinement Enabled by Interface-Engineered Gradient InZnO Channels via PEALD

Phase formation in ALD Hf_1–_xTi_xO₂ and Zr_1–_xTi_xO₂ films from amorphous to crystalline solid solutions

Plasma-Enhanced Atomic Layer Deposition of Molybdenum Thin Films with High Purity, Superior Uniformity, and Low Resistivity Using MoO₂Cl₂ as a Precursor

Model for Predicting Film Thickness Depending on the Values of the Atomic Layer Deposition Process Parameters

Defect-anchored confinement of PtIn clusters via atomic layer deposition in hierarchical ZSM-5 for durable propane dehydrogenation

[HTML] ALD/ALE 2026 Session AM-MoP: ALD for Manufacturing Poster Session

[HTML] Bias-pulsed atomic layer etching of 4H-silicon carbide producing subangstrom surface roughness

High-Performance Soft Magnetic Composites for High-Frequency Power Electronics: A Review of Insulating Coating Technologies

ALD HfSiO Versus MOCVD SiN Gate Dielectrics in N-Polar Deep-Recess GaN HEMTs

PDA-Processed Hafnium-Based Capacitors with Ultrahigh-k (~ 81) Enabled by Capping Layers for Capacitive Memory Applications

Enhancing Durability of Bioelectronic Implants: Innovations in Encapsulation Materials and Methods

Monolayer MoS₂ With Ultrahigh Piezoelectricity: From ALD Dose Control to Device Performance

Atomic Layer Deposition of Ferroelectric HfxZr (1-x) O2 from Metal-β-diketonate Precursors with Fine Cation Tunability.

Growth characteristics and methanation behaviors of Ni/SiO2 nanocatalysts prepared by fluidized bed atomic layer deposition

Systematic optimization of low-temperature ALD ZnO thin-film transistors with epoxy interlayer toward monolithic 3D integration

Ultra-Shallow Si Junction Formation by Non-Melt Laser Annealing of ALD B2O3 Films

Comparative Mechanistic Framework of Titanium Alkoxide Surface Chemistry During Thermal ALD-TiO2: Adsorption, Oxidation, and Decomposition Pathways

Effects of PALD coating on the high-frequency magnetic properties and corrosion resistance of FeSiBCrC amorphous powders