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By Agnieszka Gozdek / June 28, 2026

Sunday Dose of ALD week 26, 2026. Read all ALD related scientific articles of June 22 - 28.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

[HTML] Rapid surface smoothing of monocrystalline diamond with bias-pulsed atomic layer etching

Novel core-shell structured Fe@ Al2O3 nanofibers prepared by atomic layer deposition as a high-performance microwave absorbent

Design of Experiments-Based Optimization of Crystallographic and Physical Characteristics of Atomic Layer Deposition-Grown TiO₂ Thin Films

[HTML] Integrated Experimental–Theoretical and Data-Driven Multiphysics Analysis of Material Properties in Coatings, Pretreatments, Interfaces, and Artificial Intelligence-Assisted Reliability for Medical and Biomedical Devices

Phase evolution and nucleation control of continuous and ultrathin ruthenium films via oxidant-controlled atomic layer deposition

Self-Powered Smart Textiles for Accelerated Wound Healing through Band Alignment in Piezoelectric Heterojunctions

Control of carbon content in WO3 films obtained by atomic layer deposition

Effects of PALD coating on the high-frequency magnetic property and corrosion resistance of FeSiBCrC amorphous powders

Highly Conductive Tungsten Carbide Thin Films with a Suppressed Size Effect Prepared by Plasma-Enhanced Atomic Layer Deposition

Atomic Layer Deposition of TiO2 and TiN on cemented carbide

Reversible Light-Induced Surface Superwetting of Atomic/Molecular Layer-Deposited TiO₂:Organic Superlattices for Flexible Optical Applications

Reactions of Bis (tert‑butylimino) bis (dimethylamino) Tungsten (VI) with molecular silanol, silica and silicon wafer: Analogy Between Molecular and Surface Chemistries relevant to ALD thin film growths from BTBMW

Atomic layer deposition processes: versatile platforms for engineering ZnO‐chitosan biointerfaces

Atomic Layer Etching of MoS2 using cyclic Argon and CF4 plasmas in deposition regime at cryogenic temperatures

Inducing chemical selectivity in the atomic layer deposition (ALD) of oxide films via gas-phase silylation using N-(Trimethylsilyl) dimethylamine (TMSDMA)

Impact of process temperature and reactant pressure on the vapor phase infiltration in polyimide-based thin-film composite carbon molecular sieve membranes for gas separation

Precise modulation of atomic surface arrangement in high-entropy alloys for oxygen evolution

Tailoring properties of ZnO through amorphous Al2O3 interleave design

Recent progress in atomic-scale controlled plasma processing

[HTML] Interface-Engineered, Low-Damage IGZO/HfO₂ Charge-Trapping Memory Devices Fabricated Using a Remote Plasma ALD Process

RGA Leak Detection in an ALD Vacuum System

Spatial Control of Trace TiO₂ by Atomic Layer Deposition to Tune Co–TiOₓ Interfaces for Fischer–Tropsch Synthesis

Implementation of a Custom Controlled-Atmosphere Glovebox for Air-Sensitive Atomic Layer Deposition of Ultra-High-k Dielectrics

Recent Advances of Atomic/Molecular Layer Deposition Engineering Silicon Interface for Lithium-Ion Batteries

Numerical simulation of molecular layer deposition for the formation of amorphous zeolitic imidazolate framework films

Atomic-Scale Full-Size Engineering of Platinum Nanozymes Enables High-Efficiency Catalytic Therapy

[HTML] Insights into ALD Growth of Al-Based Dielectric Stack on 4H-SiC

[HTML] Ultrathin ALD Metal Oxide Coatings Improve the Triboelectric Performance of Regenerated Cellulose