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By Agnieszka Gozdek / June 21, 2026

Sunday Dose of ALD week 25, 2026. Read all ALD related scientific articles of June 15 - 21.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Conformal Metallosaccharide Hybrid Films for Protecting Wood Surfaces From Environmental Damage

The crystalline carbonated hydroxyapatite growth on the hafnium dioxide thin films for enhanced osseointegration

Growth of an alumina overlayer deposited on a Au101/TiO2 model catalyst via atomic layer deposition

Ultrathin atomic layer deposition oxide coatings for suppressing Ni dissolution and enhancing stability in molten carbonate electrolysis cells

Investigating the impact of gate stacks on ALD IGZO transistors via source/drain contact characterization

Oxygen plasma-induced hyperdispersed Pt on small-size TiO₂ for enhanced oxygen reduction reaction

Development of trench-structured oxide thin-film transistors using atomic layer deposited active layers and selective dry etching for high current performance

Area-selective nucleation control based on 2D transition metal dichalcogenides

Inorganic thermoelectric thin films: From synthesis to application

Regulating the Resistive Switching Performance of CBRAM Devices by Controlling ALD Process Purge Time

Oxygen-pressure-controlled rapid thermal annealing for defect modulation and performance optimization in ALD ZnO thin-film transistors

Multiscale Interface Engineering of ALD-Coated Co2Z@ Al2O3 Nanocomposites for Low-Loss Broadband Magnetodielectric Substrates

Preparation of visible light-activated molybdenum-doped TiO2 thin films by atomic layer deposition for environmental photocatalytic applications

[HTML] Oxygen-plasma screening of ALD Al₂O₃ barriers on 3D-printed PLA for low-earth-orbit atomic-oxygen durability

[TXT] DOCTORAL DISSERTATION Atomic Layer Deposition of Zirconium Oxide and Rare Earth Oxides from Heteroleptic Precursors

Machine learning-guided optimization of atomic layer deposition process

Mechanistic insights into 4-nitrophenol reduction over alumina-confined gold catalysts via PCA-enhanced in-situ UV-Vis

Mechanistic Atomic Hydrogen Chemistry for Ruthenium Deposition: From Ligand Elimination to Area-Selective Patterning

Low-temperature multilayer barrier strategy for wearable, automotive, and outdoor perovskite photovoltaics

Tunable electrical and photoelectric properties of ex-situ Ge-doped Ga2O3 thin films by annealing

Temperature‐Graded Deposition of HfZrO_x for Ferroelectric Capacitors With Enhanced Polarization, Reliability, and Switching

In-situ oxygen plasma-assisted ALD of Hf0. 5Zr0. 5O2 ferroelectric thin films with high endurance and imprint resistance

Recent efforts of vapour-phase strategies for EUV resist toward high-and hyper-NA extreme ultraviolet lithography

A study on low-temperature plasma-enhanced ALD of amorphous carbon nitride for next-generation low-k dielectrics

Quantum Confinement Effect in a Heteromorphic PbS/SnS₂ Superlattice Grown by Atomic Layer Deposition

[HTML] An Ether-Containing Hafnium–Diethylene Glycol Dry Resist Prepared by Molecular Layer Deposition for Mild-Acid Development

Molecular dynamics simulations of thin film and coatings: A review

Effects of annealing conditions on the interfacial adhesion energy of ALD Ru/ZnO films for advanced interconnects

Tunable dissolution of poorly soluble gliclazide by surface coating via room-temperature atomic layer deposition

[HTML] Atomistic calculations of the precursor molecular diffusivity at rarefaction: Understanding gas transport in semiconductor fabrication lines

Evaluating Different ALD Techniques on NCM811 Cathodes to Mitigate Degradation and Improve Cycle Life

An Atomic Layer Etching (ALE)-Inspired Synthetic Protocol and Rapid Screening Process for ZnO Etching with β-Diketone Reagents

Nano-Photonic Engineering of Low-Dimensional Materials for Optoelectronics

Synergistic chemistry in dual-atom catalysts: Unraveling electronic effects for enhanced electrocatalysis