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By Admin Account / June 07, 2026

Sunday Dose of ALD week 23, 2026. Read all ALD related scientific articles of June 1-7

Plasma-Enhanced Atomic Layer Deposition of p-type Nickel Oxide Thin Films Using an Amidinate Precursor

1V operable high mobility Amorphous Indium–Tin–Gallium–Zinc Oxide Thin-Film Transistors with High-k Hafnium Dioxide Gate Dielectrics through Continuous Atomic Layer Deposition

Defect engineering of ALD Al2O3-x surface coatings for stabilizing SFMO cathodes in SOFCs

A curated dataset of thermal stability measurements for atomic layer deposition precursor compounds

Atomic layer-deposited nucleation layers to control zinc morphology and suppress hydrogen evolution

Multiscale Modeling and Soft Sensing of Semiconductor Manufacturing Processes [Thesis]

Construction of Co/OV-TiO₂ Nanobranch Arrays and the Enhanced Mechanism for Photoelectrocatalytic Water Splitting

Low-temperature ALD-grown HfS2 for wafer-scale memristive device integration

Sacrificial polyvinyl alcohol substrates to transfer atomic layer deposition grown dielectric thin films

nonvolatile ferroelectric memory devices for beol integration

Enhancing stability of halide perovskite memristors via atomic layer deposition surface passivation

Advances in Amorphous Oxide Thin Film Transistors for 2T0C Dynamic Random Access Memory

3D NAND Scaling Performance Enhancement using 2D MoS₂ Channel

Effect of continuous -to-Discontinuous Layer Transition on the Interface Evolution and Dielectric Response in Subnanometric Al2O3/TiO2 Laminates Grown by Atomic Layer Deposition

Recommendations to Improve Tool Uptime during Maintenance for the Case Company

Atomic layer deposited iridium-ruthenium precious nanolaminate heterointerface electrodes for next-generation electrocatalysts

Multiscale Modeling, Control and Soft Sensing in Semiconductor Manufacturing Processes

Plasma Processes and Associated Mechanisms of Hybrid Bonding for Heterogeneous Integration–A Review

Magnetic flux expulsion lens: Concept and measurements

In-situ surface analysis during atomic layer etching of TiN by chlorine radical irradiation at low temperature and thermal desorption

Site Engineering of MIL‐100(Fe) via Atomic Layer Deposition of TiO₂ for Photocatalytic Water Splitting

Thin-film Al₂O₃ coatings on hydraulic lime mortar: Microstructural behavior and performance

Ozone Surface Pretreatment for Enhanced β-Ga₂O₃/Dielectric Interface Engineering

Engineering Assembly Kinetics and Line Roughness in Solvent Vapor-Annealed Block Copolymer/Homopolymer Blends

Advancing Spatial Atomic Layer Deposition for More Materials and More Demanding Application [PhD Thesis]

Vapor-Phase Infiltration of Al-Doped Zinc Oxide into Poly (Methyl Methacrylate) for Enhanced Low-Temperature Thermoelectric Performance

Investigations Into Low-Temperature Vapor Deposition of Max-Phase Titanium Aluminum Nitride Thin-Films [Master's Thesis]

ALD NiO_X hole transport layers for semi-transparent perovskite solar cells with average visible transmittance exceeding 50%

Bottom-Up Fabrication of Bicontinuous Bulk Nanocomposites for Optical and Electronic Applications

Coordinated sub-cycle modulation atomic layer deposition of atomically homogeneous GeTe 9 thin films for high-performance OTSs