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By Agnieszka Gozdek / May 24, 2026

Sunday Dose of ALD week 21, 2026. Read all ALD related scientific articles of May 18 - 24.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Cu Films Using Liquid Copper Precursor Bis(1-ethylmethylamino-2-propoxy)copper, Cu(emap)₂

Design of a CMUT Structure Enhanced by ALD High-κ HfO₂ and the LOCOS Process

Atomic Layer Deposition of Copper using Cu (II) Hexafluoroacetylacetonate and Diethylzinc: Surface Reaction Mechanisms and Surface Material Selectivity

Thermal Atomic Layer Deposition of the Group 11 Metals

Differentiable library-based inverse design of achromatic metalens for full-color near-eye displays

Atomistic insights into ion irradiation effects in plasma-enhanced atomic layer deposition of silicon nitride

AI-Driven Inverse Design of Complex Oxide Thin Films for Semiconductor Devices: A Case Study of Hf–Zr–O

DC-Biased PEALD and Post-annealing for Highly Crystalline HfOx Thin Films

Plasma-enhanced atomic layer deposition of MgO thin films with superior fluorine plasma resistance

Surface Engineering of Oxide-Supported Catalysts for Renewable Chemistry

[PDF] New Magnesium Precursor Chemistry Enables Low-Temperature MgO Thin Films by Atomic Layer Deposition

Transforming the Breakdown Behavior of GaN Vertical SBDs via Conformal PEALD-SiN x Mesa Surface Passivation

Thin Film Deposition Techniques and Nanofabrication: A Comparative Analysis vis-à-vis Recent Advances

[TXT] VTT PUBLICATIONS 770 Thin Al2O3 barrier coatings grown on bio-based packaging materials by atomic layer deposition

Atomic layer deposition of Pd and SnO2 on TiO2 nanotubes: A route to efficient hydrogen evolution

[HTML] Scandium Nitride Thin Films: Structure, Growth, Properties and Applications

VUV/UV radiation-induced damage of extreme ultraviolet photoresist in atomic layer etching process

Unraveling Synergistic Dual-Element Doping Mechanisms in Solid-State Synthesis via Atomic Layer Deposition-Enabled Model Systems

Reducing Zinc Oxide Toxicity via Surface Modification: Emerging Strategies for Cosmetic Applications

[PDF] Systematic Process Development for Atomic Layer Deposition of InGaZnO

Deposition-Driven Phase Evolution in Hf_1–_xZr_xO₂ Enabled by a Thermally Stabilized Cyclopentadienyl Precursor System

Selective Plasma Enhanced Atomic Layer Deposition For Deep Trench Filling: A Design-Of-Experiments Approach

Rapid Atmospheric Vapor Deposition of H: In2O3 Transparent Conducting Oxide Thin Films

A Scalable PEALD Platform for Dielectric Integration in 2D Electronics

Influence of composition and structure on resistive switching properties of hafnium–titanium-oxide thin films grown by atomic layer deposition

Backbone‐Length‐Optimized Inhibitors Deliver Long‐Retention Selectivity in Area‐Selective ALD of VO₂

Ni-interlayer-induced modulation of electrical and dielectric properties in ZnO/Ni/ZnO thin films fabricated using hybrid deposition techniques

A Dual-Si Atomic Precursor Enabling High-Quality SiN_x Thin Films via Very High-Frequency Plasma Atomic Layer Deposition

[PDF] Unveiling Cu Atomic Layer Deposition (ALD) Process Chemistry

Introducing Chemical Vapor Etching (CVE): A Material‐Selective Approach for Surgically Precise Tarnish Removal