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By Agnieszka Gozdek / April 26, 2026

Sunday Dose of ALD week 17, 2026. Read all ALD related scientific articles of April 20 - 26.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Atomic and Molecular Layer Deposition of Nd-and Eu-Based Oxide and Hybrid Thin Films: Computationally Guided Precursor Selection

[PDF] Evidence-Grounded Evaluation of Materials Science Knowledge Graph in ALD

TiN/dielectric nanolaminates: effects of metamaterial engineering and disorder on the superconductive properties

UV ozone oxidized high-k TaOx dielectric with van der Waals interface for two-dimensional electronic devices

[HTML] Atomic layer etching-enabled interface engineering for reduced subthreshold swing and improved uniformity in p-channel GaN MOSFETs

Reversible Thickness Engineering in Amorphous In₂O₃ Transistors

[CITAAT] ALD alumina (Al2O3)-enabled wafer-level anodic bonding of LTCC and SOI for MEMS integration

ALD W-Doped SnO TFTs for Indium-Free BEOL Electronics

High throughput Snox Thin Films Deposited by Atmospheric-pressure Spatial Atomic Layer Deposition as in-free Transparent Electrodes in Silicon Heterojunction Solar Cells with PCE > 20.0%

Vapor phase metal-oxide infiltration synthesis of high-sensitivity positive-tone hybrid EUV resists

Fabrication and Characterization of Al/Ti/HfO₂/W Memristor-Based RF Switches

Atomic Layer Deposition of Disordered p‐Type SnO Using a Heteroleptic Tin (II) Precursor: Influence of Disorder on P‐Channel SnO Thin‐Film Transistor …

From Trimers to Chains: Growth and Defect Dynamics in Anisotropic Tellurium Films

Atomic layer deposition of ZrO2 coated LiNi0. 6Co0. 2Mn0. 2O2 cathode with enhanced high-voltage cycling performance

High-Stability and High-Charge-Density HfZrO₂ MFM Capacitors With In Situ CF₄ Plasma at TiN Electrode

Enhanced Gas Sensing Performance of WO3/ZnO Heterojunctions Constructed via Atomic Layer Deposition

Precursor design principles for area-selective atomic layer deposition of alumina: quantifying the role of Lewis acidity, steric repulsion and dimerization in surface adsorption

[HTML] Plasma-assisted atomic layer etching of single-crystal diamond

300-unit-per-second roll-to-roll manufacturing of visible metalenses using ALD

Dual-gate Hf-doped InZnO field-effect transistors with sub-0.1 V threshold voltage shift under bias stress

Preparation methods of single-atom catalysts: a review

Numerical analysis of atomic layer deposition of AL2O3-CNT/Ca O hybrid nanomaterial for multi-applications

First-principles calculations reveal precursor-dependent reaction mechanisms in ZrO₂ atomic layer deposition

A CFD-Based Digital Twin Framework for Transient Molybdenum Pentachloride Transport in an Experimental Atomic Layer Deposition Process

[HTML] Hydroxylation of Organic Substrate Surfaces for the Atomic Layer Deposition of Al2O3 Thin Films

Machine Learning-Driven Optimization of ALD Coatings for Enhanced Interfacial Stability in Advanced Battery Materials

[HTML] Understanding the crystallization mechanism of atomic layer deposited InOx/GaOx nanolaminate structures

Revealing the Intrinsic Electronic Structure of 2D MoS₂ Buried Beneath Thick Dielectric Overlayer via Hard X‐ray Photoelectron Spectroscopy

Catalyzed selective atomic layer deposition of SiO2 on amorphous carbon via silicon blocking by alkyltrichlorosilane self-assembled monolayers

Interfacial chemistry regulation of Na (Ni1/3Fe1/3Mn1/3) O2 cathodes via atomic layer deposition for high-performance sodium-ion batteries

Engineering with gases: using vapors to create bioinspired materials for a resilient future

Hierarchically engineered ALD multilayers for sustainable protection of stone cultural heritage

Reductive Transformation of ALD TeO₂ into Continuous and Impurity‐Free Tellurium Films

Scalable Aluminum‐Doped Zinc Oxide Transparent Electrodes via Spatial ALD for High‐Efficiency Perovskite Modules

Direct Evidence for Oxygen-Vacancy-Mediated Domain Switching in Hf 0.5 Zr 0.5 O 2 Ferroelectric Films

MOF film growth assisted by atomic layer deposition of oxide nanomembrane: from principles to applications