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By Agnieszka Gozdek / April 19, 2026

Sunday Dose of ALD week 16, 2026. Read all ALD related scientific articles of April 13 - 19.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

From Nanoparticles To Continuous Films: Plasma-Enhanced Atomic Layer Deposition as a Tool for Designing High-Performance Cobalt Electrocatalysts

Advancing nanopatterning with ALD and ALE: Selective processing in 2D and 3D

Electron-Enhanced Atomic Layer Deposition of Tunable TiC_xN_y Ternary Nitride Films Using Tetrakis(dimethylamido)titanium with Ammonia Reactive Background …

Atomic layer deposition of titanium phosphate onto carbon fibers using varied pulse sequences of titanium tetraisopropoxide, tris (trimethylsilyl) phosphate and water

Encapsulation of Laccase/TEMPO in Nanoreactors with Different Microenvironments for Aerobic Diol Lactonization

Low-temperature atomic layer deposition of oriented ZnO thin films on c-plane Al₂O₃: influence of precursor ratio and growth temperature

Recent advances and future trends in flexible OLED encapsulation technology

Air stable La2O3-Al2O3 composite films grown by atomic layer deposition for plasma etch resistance

Grafted Low-Leakage Si/AlN pn Diodes Enabled by Fluorinated AlN Interface

Room‐Temperature Atomic Layer Deposited Titanium Oxide as Electron‐Selective Passivating Layer for Dopant‐Free Crystalline Silicon Solar Cells

[HTML] Tailored waveform biasing in atomic and molecular plasmas for atomic scale processing

Adduct-mediated low-temperature spatial atomic layer deposition of P-type nitrogen-doped amorphous gallium oxide thin films

ALD Zinc Tin Oxide Buffers for Chalcopyrite Solar Cells: Electrical Barriers and Conduction Band Cliffs

Breakthrough in 19 nm half-pitch W damascene interconnects using nanoimprint lithography and atomic-scale processing

Thin-film Al₂O₃ coatings on hydraulic lime mortar: Microstructural behavior and performance

Aluminum nanoparticles with active surface protective coatings fabricated by atomic layer etching/deposition

Room-Temperature Conformally Coated Cotton Fabrics for Integrated Textile Sensors

Turing-patterned Ta₂S₃ enables sub-2 nm diffusion barrier for advanced Cu interconnects

Role of Reactive Oxygen and Nitrogen Species on Al2O3 Growth by Plasma-Activated Water Atomic Layer Deposition: Evidence for Nitrate-Mediated Enhancement

Selective plasma-enhanced atomic layer etching of ZrO2 over TiN for DRAM capacitor recess etching

Roles of organic components on hybrid dry EUV resist thin films synthesized via atomic layer deposition

Dose dependent effects in novel organic-inorganic EUV resists

DNA origami for 3D nanoscale manufacturing

AI-native equipment design for atomic precision etching

Self-aligned quadruple patterning made simple: extending the applications of atomic layer etch-induced pitch splitting (APSTM)

Transient assisted processing (TAP): a novel plasma approach for precise, sustainable, and scalable patterning

Topography-controlled TiN-based spacer engineering via plasma ALD for pitch-walking suppression in EUV SADP-based MP18 integration

Advances in single atom alloy: synthesis, electronic regulation and application in energy-related electrocatalysis

Small Molecule Inhibitor-Modulated Al₂O₃ Atomic Layer Deposition on Monolayer MoS₂ for Controlled Nucleation

[HTML] Control of Microstructure, Trap Levels, and Trap Distribution in HfO₂ Films Grown by Atomic Layer Deposition

[HTML] Application of Single-Atom Nanozymes in the Detection of Small Biomolecules: A Review

Mechanistic study of infiltration synthesis of organic-inorganic hybrid resists for EBL and EUVL resist

Low-k fine patterning using ALE to improve the profile and etch damage

Atomic layer etching pitch splitting (APSTM) for nanoimprint lithography: combining simplicity, precision, and sustainability

[HTML] Using Atomic Layer Deposition to Improve Catalyst Performance and Longevity

Thermal stability of ALD ZrO2/fused silica optical coatings: observation on annealing-induced transmittance degradation and film delamination

Atomic Layer Deposition of Disordered p-Type SnO using a Heteroleptic Tin (II) Precursor: Influence of disorder on P-Channel SnO Thin-Film Transistor …

Atomic layer deposition of SnO2 thin films using tin (IV) acetate as a novel precursor

[PDF] Encapsulation of photoresistive structures based on colloidal HgTe quantum dots by atomic layer deposition

In-Situ Plasma Treatment and Low-Temperature Lithicone Protective Layer for Interfacial Stability of Ultrathin Li Metal Anodes

Polymer Doping via Vapor Phase Infiltration