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By Agnieszka Gozdek / April 05, 2026

Sunday Dose of ALD week 14, 2026. Read all ALD related scientific articles of March 30 - April 05.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Atomic Layer Etching for Extreme Manufacturing: Pushing the Limits of Atomic Scale Precision

ALD-derived Pt nanocluster-decorated SnO2/In2O3 heterostructure thin films for efficient room-temperature hydrogen sensing

Spatially Quantitative Profiling of Defect Density for Hydrogen-Induced Passivation Mechanism of Metal–Insulator–Semiconductor Photoanodes

Atomic layer etching of sputter-deposited AlN thin films in radiofrequency Cl₂-Ar plasmas

[HTML] A CFD-based digital twin framework for transient MoCl5 transport in an experimental atomic layer deposition process

Using ALD to prepare Al2O3 of core-shell composites to improve photochemical performance

Enhancing Broadband Antireflection Performance of Silicon Solar Cells Using Grass‐Like Alumina via Atomic Layer Deposition

High-Temperature-Stable Polycrystalline ALD-InGaO Channels Enabled by Buffer-Layer Engineering

Review of coatings used for corrosion protection of aluminium alloys

Interface engineering of HfO₂-based ferroelectric devices for crystal phase control and enhanced ferroelectricity using atomic-layer-deposited ZrO₂ nucleation layers

[PDF] AI-Enabled Atomic-Scale Manufacturing via Direct Atomic Layer Processing for Accelerated Materials Discovery

Tailoring Li–Al–O Interphases in Garnet-Type Solid-State Electrolytes via Powder Atomic Layer Deposition

Cellulose Acetate Fibers With Infiltrated ZnO Nanocrystals: Activation of Antibacterial Properties Against Acne vulgaris by Oxygen Plasma Treatment

[PDF] Performance testing and simulation of microchannel plates for CALO-IsCMOS

Immobilization of Titanium Dioxide Ultrathin Films onto Porous Membranes via Atomic Layer Deposition for Photodegradation of Water‐Borne Pollutants

Development of an atomic layer etching process for diamond substrates

[HTML] Nitrogen-Enabled Amorphous Stabilization of High-Mobility In-Rich IGO via PEALD for Uniform and Reliable Oxide TFTs

CoNi-LDH/TiOx Type-II Heterojunction via Atomic Layer Deposition for Enhanced Photocatalytic Hydrogen Evolution

Oxidant-driven growth and crystallization of MoOx in H2-gas-free thermal atomic layer deposition using a high-volatility liquid Mo precursor

Thermal Atomic Layer Deposition of Ultrathin LiPON at a 200 mm Wafer-Scale