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By Agnieszka Gozdek / March 29, 2026

Sunday Dose of ALD week 13, 2026. Read all ALD related scientific articles of March 23 - 29.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Surface engineering and functionalization of powder-based materials by fluidized-bed atomic layer deposition for emerging applications

Temperature effects in oxidative molecular layer deposition (oMLD) of polypyrrole

All-Inorganic, Bicontinuous, Bandgap-Engineered Epitaxially-Fused PbSe Quantum Dot/CdS Matrix Heterostructures for Optoelectronic and Electronic Applications

Defect Engineering in Atomic-Layer-Deposited Cerium Oxide

Enabling Long Term, Shelf‐Stable Perovskite Solar Cells: Alumina Barriers to Protect Perovskite Devices from Moisture and Oxygen

Polyurea Molecular Layer Deposition using Low Melting Point Precursors for Use in Biosensor Design

CMOS-fabricated ultraviolet light modulator using low-loss alumina piezo-optomechanical photonics

Atomic Layer Processing for Ångström-scale precision in 3D-integrated Semiconductor Manufacturing

Near-Room-Temperature Plasma and UV-Assisted Atomic Layer Deposited Al2O3@ Graphene Composite for Efficient and Flexible Encapsulation

Scalable Edge Contacts to Two-dimensional Semiconductors

Nanoneedles in Modern Medicine: Emerging Frontiers in Drug Delivery, Gene Therapy, and Biosensing

[PDF] USING ATOMIC LAYER DEPOSITION TO CREATE NON-POLARIZING COATING

Enhancing long-term cycling and interfacial stability of PEO/LLZO quasi solid-state batteries through atomic layer deposition Al₂O₃ coatings

Overcoming the Mobility–Stability Trade-Off Using an Ultra-Thin Oxide Capping Layer via N2O Plasma Treatment

Crystal Structures of Tris(dimethylamido)(pentamethylcyclopentadienyl)zirconium(IV) (Cp*Zr(NMe₂)₃) and Its Temperature-Induced Order–Disorder Phase Transition Behavior

[HTML] Atomic Layer Deposition of ZnO and ZnO/Cu Coatings for Fresh Food Packaging Application

Plasma pretreatment to increase benzaldehyde attachment to the SiNx surface before atomic layer etching

Solution and Vacuum‐Based Scalable Deposition Methods for Perovskite/Si Tandem Solar Cells

Investigation of SiO₂:HfO₂ Composition Effects on ALD HfSiO_x as Gate Dielectric on β-Ga₂O₃ (001)

Atomic Layer Deposition of Ga2O3 over a Wide Temperature Range Using a Novel Heteroleptic Precursor (N, N-di-tert-butylacetimidamido) dimethylgallium …

Low-temperature plasma-enhanced ALD of c-axis textured GaN on sapphire

[HTML] Hydrogen in aluminium oxide films grown for silicon surface passivation by plasma-enhanced atomic layer deposition

Micro/Nano Fabrication Processes: Utilizing Borrowed and Dedicated Fabrication Processes for 6G and Future Network Devices

First Plasma Atomic Layer Etching of Diamond via O /Kr Chemistry