Sunday Dose of ALD week 11, 2026. Read all ALD related scientific articles of March 09 - 15.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Hemp shives conformally-coated by ALD ZnO for a sustainable application in wastewater remediation

Aromatic organic-tin hybrid films as electron beam resists

Suppression of Metal Boundary Effect by Inserting a Middle Barrier Layer of TaN for Metal Gates

Low-damage p-GaN surface for Ohmic contact after passivation layer removal by atomic layer etching

Improved Molybdenum Dioxide Atomic Layer Deposition Process by Introducing Pre‐Reduction Agent

Area-Selective Atomic Layer Deposition of Ru Using Phenyl Silane Inhibitors: Comparison between Amino and Methoxy Head Groups

[HTML] Limits in crystallinity of AlN thin films produced by PE-ALD at low temperature

PEALD-Grown HfTiO High-k Dielectrics Enabling High-Performance IGZO Thin Film Transistors

Deterministic Exfoliation of N-Layer Transition Metal Dichalcogenides

Post-Deposition Plasma Treatment on Atomic-Layer-Deposited Tantalum Nitride Films for Enhancement of Copper Diffusion Barrier Performance

Particle atomic layer deposition in fluidized bed reactors: An updated perspective on reactor design and low-pressure fluidization

Structure and electrical properties of Ga 2 O 3 thin films grown by atomic layer deposition on Ru and TiN electrodes

Modeling remote inductively coupled plasmas for plasma-enhanced atomic layer deposition

Novel method for preparation neutron sensitive 10B-doped nMCP

A combined CFD-DDPM modeling and experimental study on cohesive particle atomic layer deposition process

Integrated photonics on titania-polymer hybrid platforms

Improving Atomic Layer Deposition Process of Silicon Oxide (SiO₂) with single and double pulse processes

Symmetric Phase-Engineered Hf₁₋ ₓZrₓO₂ Enabling Reliable Non-Destructive Memory Readout

Surface Modification of MEMS Chips for Increased Thermal and Chemical Stability

Scalable atomic layer deposition of titanium dioxide films for high-volume manufacturing of AR waveguides

Unveiling the Nanoscale Structure of Metal Oxide Thin Films Grown by Atomic Layer Deposition for Photocatalytic Applications

Advancing atomic layer deposition through artificial intelligence: Generative modeling and predictive analytics for TiO2 growth rate prediction from TDMAT/O3

High-count-rate saturation behavior in MCP-PMT: an experimental study

Selective Peeling Lithography for Wafer-Scale Isolated Sub-5 nm Nanogaps

Self‐Aligned Spacer Doping in MoS₂ High‐κ Top‐Gate Transistors

Grain-Size Engineering in Vapor-Deposited ZIF-8 MOF: Low-Leakage Low-k Films with Enhanced Breakdown Field

Mechanistic study on In 2 O 3 atomic layer deposition using InCp and H 2 O/O 2

Photocatalytic Degradation of Microplastics Using ZnO Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Plasma-assisted Thermal Atomic Layer Etching of Ruthenium via O2/Ar Plasma Oxidation and Formic Acid Chelation

Engineered surfaces for biomedical implants: advances in coatings, materials, and techniques

Investigation of InGaN/GaN MicroLED structure for improving quantum efficiency at low current density

Impedance spectroscopy of field-emission and resistive switching in dielectric films for MEMS capacitive switches applications

[HTML] Wearable metal oxide semiconductor gas sensors synthesized in situ on hollow glass microfibers

Ultrathin and conformal ITO nanolayers for time varying nonlinear photonics

[HTML] Low through-plane thermal conductivity in amorphous HfO2/SiO2 nanolaminates

Dimer Formation as the Key Removal Pathway in the Isotropic Atomic Layer Etching of Al₂O₃: A First-Principles Study

Temperature-Dependent Dielectric Function of Tantalum Nitride Formed by Atomic Layer Deposition for Tunnel Barriers in Josephson Junctions

Single-atom catalysts as Frontier materials for advanced gas sensors

First-principles mechanism of TDMAH adsorption on pristine and laser-functionalized graphene toward area-selective atomic layer deposition of HfO₂

Engineering Pt-loaded shape-selective ZSM-5 via atomic layer deposition for stable Para-xylene Production

Minimum Effective Thickness of Cathode Protective Layers for Sulfide-Based All-Solid-State Batteries via Powder-Atomic Layer Deposition

[CITAAT] 2D Materials Beyond Graphene

[PDF] A Novel Thermally Stable Ruthenium Precursor Enabling Dense, Lower Resistivity and Inherent Selectivity against SiO2 via Atomic Layer Deposition for Advanced Interconnects

Atomic Layer Deposition

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Sunday Dose of ALD week 11, 2026. Read all ALD related scientific articles of March 09 - 15.

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