Metal Oxide Thin Films and Nanostructures Made by ALD

Mårten Rooth
Abstract & Cover

Rooth, M. 2008. Metal Oxide Thin Films and Nanostructures Made by ALD. Acta Universitatis Upsaliensis. Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology. 56 pp. Uppsala. 
Thin films of cobalt oxide, iron oxide and niobium oxide, and nanostructured thin films of iron oxide, titanium oxide and multilayered iron oxide/thanium oxide have been deposited by Atomic Layer Deposition (ALD). The metal oxides were grown using the precursor combinations Col,/02, Fe(Cp)2/02, Nb110, and Ti14/11,0. The samples were analysed primarily with respect to phase content, morphology and growth characteristics. Thin films deposited on Si (100) were found to be amorphous or polycrystalline. depending on deposition temperature and the oxide deposited; cobalt oxide was also deposited on MgO (100), where it was found to grow epitaxially with orientation (001)1100]Co20,11(001)(100)Mg0. As expected, the polycrystalline films were rougher than the amorphous or the epitaxial films. The deposition processes showed properties characteristic of self-limiting ALD growth; all processes were found to have a deposition temperature independent growth region. The deposited films contained zero or only small amounts of precursor residues. The nanostructured films were grown using anodic aluminium oxide (AAO) or carbon nanosheets as templates. Nanotubes could be manufactured by depositing a thin film which covers the pore walls of the AAO template uniformly; free-standing nanotubes retaining the structure of the template could be fabricated by removing the template. Multilayered nanotubes could be obtained by depositing multiple layers of titanium dioxide and iron oxide in the pores of the AAO template. Carbon nanosheets were used to make titanium dioxide nanosheets with a conducting graphite backbone. The nucleation of the deposited titanium dioxide could be controlled by acid treatment of the carbon nanosheets. 

Source of Information
Mats Boman
Uppsala University, Department of Materials Chemistry.
(Uppsala, Sweden)
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