Chemical and technological bases of low temperature interphase boundaries formation between insulator and semiconductor

Author
A. P. Alekhin
Year
1999
Language of the thesis
Russian
Thesis name in original language
Химико-технологические основы низкотемпературного формирования межфазных границ раздела диэлектрик-проводник
Abstract & Cover
Source of Information
Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
University
Research Institute of Physical Problems by N.F. Lukin
(Zelenograd, Moscow, Russia)
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