Atomic Layer Deposition on Fiber Forming Polymers and Nonwoven Fiber Structure.

Joseph Spagnola
Abstract & Cover

Recent advances in fiber processing technology have allowed the formation of fibers with sub-micron and nanoscale dimensions. Such fibers have received much recent attention due to their potential in wide ranging applications including but not limited to tissue scaffolds, affinity membranes, and other advanced filtration applications. This is due to their ability to provide high surface area, high porosity and good mechanical properties. However, in order to expand the range of applications and improve chemical and physical functionality, the ability to uniformly and predictably modify the surface of fibers in highly dense and tortuous nonwoven structures, in an environmentally friendly manor, is required. A variety of different techniques are currently used to modify the surface of planar polymers as well as nonwoven fiber structures. In this study, a vapor phase film deposition technique called atomic layer deposition (ALD) has been used to modify the surface of planar films of fiber forming polymers as well as nonwoven fiber structures. In-situ gravimetric and chemical analyses have been employed to investigate film precursor and polymer chemical and physical interaction, as well as the effect of process variables such as temperature on the nucleation and growth of ALD films on polymer materials. 

Source of Information
Gregory Parsons
North Carolina State University
(Raleigh, North Carolina, USA)
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