A study on the nickel thin films formed by oxidation-reduction ALD

Author
Jung-Hun Chae
Year
2002
Language of the thesis
Korean
Thesis name in original language
산화-환원 ALD 증착법에 의해 형성된 Nickel 박막의 특성에 관한 연구
Abstract & Cover
Source of Information
Korea Advnaced Institute of Science and Technology (KAIST)
University
Korea Advanced Institute of Science and Technology
(Daejeon, Republic of Korea)
External Link
LinkedIn
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