Chemistry of Atomic Layer Deposition

Author
Seán Thomas Barry (Author)
Publication Year
2021
Summary & Cover

This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how the surface-precursor interaction governs atomic layer deposition processes. The underlying principles in atomic layer deposition rely on the chemistry of a precursor with a surface. Publisher ‏: ‎ De Gruyter; 1st edition (November 8, 2021), 225 pages.

Contents

Foreword

Chapter 1. Introduction
1.1 Atomic layer deposition
1.2 Precursor
1.3 Adsorption
1.4 Surface vs. substrate
1.5 Monolayer
1.6 Self-limiting
1.7 Layer-by-layer growth
1.8 Atomic layer deposition history
1.9 Trimethyl aluminum and water
1.10 Helpful resources

Chapter 2. Saturation
2.1 The saturation curve
2.2 Selectivity and saturation
2.3 Steric bulk and saturation
2.4 Selectivity

Chapter 3. Ligands
3.1 Ligand bonding

Chapter 4. Precursors
4.1 Atmospheric sensitivity
4.2 Halide precursors
4.3 Alkyl precursors
4.4 General synthetic reactions
4.5 Designing precursors
4.6 Volatility
4.7 Thermal stability
4.8 Reactivity

Chapter 5. Thermolysis
5.1 Definitions of thermal onset temperatures
5.2 Thermogravimetry
5.3 Differential scanning calorimetry
5.4 Thermal range and figure of merit
5.5 Decomposition testing
5.6 Volatility control
5.7 Impurity control

Chapter 6. Nucleation
6.1 Protonated surface nucleation sites
6.2 Metal surface nucleation sites
6.3 Hydride surfaces
6.4 Surface blocking groups and selective area deposition

Chapter 7. ALD processes
7.1 Alumina deposition
7.2 Titanium nitride deposition
7.3 Copper metal deposition
7.4 Gold metal deposition
7.5 Tin oxide deposition

Chapter 8. MLD processes
8.1 Alucone deposition
8.1.1 Bifunctional monomers
8.2 Tetracyanoethylene deposition
8.3 Alq3 deposition
8.4 Kevlar deposition
8.5 PEDOT deposition

Chapter 9 ALE processes
9.1 Etching oxides
9.2 Etching metal

Index

External Link
Find it at De Gruyter
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