Atomic Layer Deposition for Nanotechnology

Author

Arthur Sherman (Author)

Publication Year

2008

Summary & Cover

This monograph is the first text to review the subject of Atomic Layer Deposition (ALD) comprehensively. It not only covers its application to microelectronics, but also many important new and emerging applications in Nanotechnology. It is the culmination of over 10 years of pioneering research and development by the author. Not only does it cover thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides, but also reviews the formation of mixed and multilayer materials. Also, the newer radical enhanced technology is described and evaluated. Finally, the author presents some of the most recent applications of ALD to the emerging field of Nanotechnology. These include MEMS, solar cells, optical coatings, and organic/inorganic films among others. This treatment of an important and emerging technology will be particularly useful to engineers and scientists both in industry and universities. 
 

Publisher: Ivoryton Press; First edition (June 16, 2008), Hardcover: 256 pages

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