Manufacturer
Beneq
Product model
R2
Type of product
Research ALD system
Description

The Beneq R2 is Beneq's most affordable premium research reactor with sticker price of 130,000 EUR. This tool is compact, scalable and ergonomically designed to be the perfect way to start your ALD journey.  

VALUE: Beneq R2 has all the components of a premium ALD reactor packed into an affordable and approachable tool. With upscale features like a dual chamber design, R2 provides the best value for an ALD starterpack.

SIMPLICITY: The R2 is standardized to provide users with a straightforward and pragmatic tool ready to be used out of the box. All main components and electrical box are included in the tool frame, giving it a small, unassuming footprint. 

UPGRADABLE: The modular design of the R2 allows for quick upgrades and easy maintenance, including a 3D chamber and plasma options, for when your ALD needs change. 

Options include: 

  • Single wafer, batch, and plasma chambers
  • Ozone cabinet and extra gas lines
  • Set of 2 hot sources with either vapor draw or loadand-release dosing 
Technical features

Main dimensions

  • 1200mm x 600mm x 1630mm (W x D x H)

Weight

  • 500 kg

LIQUID SOURCES

  • Number of sources:  4
  • Container volume: 50 ml
  • Temperature range: RT…40 ºC

Plasma chamber

  • 200 mm x 3 mm (effective diameter x height)
  • Particle coating chamber
  • Flow-through chamber, gross volume 58 ml

REACTION CHAMBER

  • Operating temperature range
  • 50…400 ºC
  • Single wafer chamber: 200 mm x 3 mm (effective diameter x height)
  • Wafer batch/3D chamber: 200 mm x 95 mm (effective diameter x height)
  • Plasma chamber: 200 mm x 3 mm (effective diameter x height)
  • Particle coating chamber: Flow-through chamber, gross volume 58 ml

VACUUM CHAMBER

Heating method

  • Internal resistive tube heaters with IR reflectors

Cooling method

  • Air cooling

HEATED SOURCES (OPTIONAL)

  • Number of sources: 2
  • Container volume: 200 ml
  • Temperature range: RT…200 ºC​

GAS SOURCES (OPTIONAL)

  • Number of sources: 1 or 3

PLASMA ALD (OPTIONAL)

Principle of operation

  • Capacitively coupled plasma at 13.56 MHz​
  • Power: 300 W​
  • Number of plasma gases: 2

REDUCED-FLOW HIGH-ASPECT RATIO (OPTIONAL)

Principle of operation

  • Controlled reduction of exhaust flow to enhance precursor diffusion to high-aspect ratio structures​​

Additional Content

  • Beneq R2 brochure can be found here.
  • Additional video about the Beneq R2 can be found here.
Product Links
Beneq R2 Video
LinkedIn
linkedin invite