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By Agnieszka Gozdek / October 04, 2026

Sunday Dose of ALD week 40, 2026. Read all ALD related scientific articles of Sep 28 - Oct 04.

Made possible by support from Beneq, Forge Nano, Atlant 3D, Swiss Cluster, Kurt J. Lesker, and Encapsulix!

Next-generation dental implant surface modifications for osseointegration: From nanoengineering to clinical translation

[HTML] Microfabrication Strategies for Silicon Anodes in On-Chip and Miniaturized Batteries

Energy velocity as an optical design indicator for the ultraviolet nonlinear response of ALD-grown TiO₂ thin films

Influence of In Situ Atomic Layer Annealing and Plasma-Enhanced Atomic Layer Deposition Techniques for Low-Temperature Deposition of HfO₂ High-κ Gate dielectrics

[HTML] Surface Coating Technologies: From Deposition Methods to Engineering Applications

Ultra-thin WS2 growth by ALD from bis (tert-butylimido) bis (dimethylamido) tungsten and 1, 2-ethanedithiol and detailed surface mechanism

Co3O4/TiO2 pn junction electrode materials prepared by atomic layer deposition for high-performance supercapacitors

[PDF] Unlocking the synergy of ALD and ALE

Thermal Spray as a Scalable Alternative Processing Route for Solid-State Thin-Film Batteries

[HTML] Growth-Temperature-Dependent Synaptic Plasticity in ALD-ZnO Optoelectronic Synaptic Devices on Polyimide Substrates

Linear and Nonlinear Optical Properties of SiO 2/TiO 2 Heterostructures Grown by Plasma-Enhanced Atomic Layer Deposition

Multiscale modeling of CpZr (NMe2) 3/O3 atomic layer deposition: From surface reaction networks to wafer-scale growth dynamics

Synthesis-programmed inherent area-selective atomic layer deposition for stable PGM-free cathodes in anion exchange membrane fuel cells

Thermal stability and interfacial reactions of Al₂O₃ ALD-encapsulated copper nanoparticle films

Fabrication and Characterization of β-Ga₂O₃-Based MIS Structures by Mist-CVD-Deposited Al₂O₃ Dielectric

Functionalization-Free Atomic Layer Deposition of Sub-1 nm EOT HfO₂ Directly on MoS₂ for Gate-All-Around Field-Effect Transistors

Spectroscopically probing the cobalt state in TiO2-supported CO2 hydrogenation catalysts derived from tailored materials via atomic layer deposition and surface organometallic chemistry

Atomic layer deposition of thermally stable conductive MoOx films using a low-valent precursor for ZrO2-based capacitors

Exposure-dependent secondary surface reactions in atomic layer deposition of silicon oxide from diisopropylaminosilane and ozone: an in situ and first-principles

Self-Assembled Metal–Insulator–Metal Tunnel Junctions

Growth of Hafnium Dioxide and Zirconium Dioxide Using the Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Devices

Designing Functional Nanolaminates From Complex Atomic Layer Deposition Reactions

Interfacial Modification of Pd/ZrO2 Catalyst by Atomic-Layer In2O3 for Enhanced CO2 Hydrogenation to Methanol

Substrate-Enhanced Atomic Layer Deposition of Lithium Niobate on NMC Cathodes for Sulfide-Based All-Solid-State Batteries