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Sunday Dose of ALD week 21, 2024. Read all ALD related scientific articles of May 20 - 26


Residual Stress Development in Lattice Mismatched Epitaxial Thin Films via Atomic and Molecular Layer Depositions


High-k dielectric for flexible pressure sensors


Thermal Atomic Layer Etching of Gold Using Sulfuryl Chloride for Chlorination and Triethylphosphine for Ligand Addition


[HTML] Electrochemical characterization of localized corrosion mechanism of ALD Al2O3-coated copper for microelectronic application


Lightweight titanium dioxide/carbon nanotube composites prepared by atomic layer deposition for broad-band microwave absorption


Chemisorption of Tetrakis (dimethylamino) zirconium on Zirconium Oxide: Density Functional Theory Study


[PDF] Atomic-Level Insight into Si-Cl2-Ar Atomic Layer Etching from Molecular Dynamics Simulations


Fabrication Techniques and Principles


Improvement of Corrosion, Mechanical Properties, and Biocompatibility of Mg-Ca Alloy with Peald Al2o3/Zro2 Multilayer Films


[HTML] Architecting precise and ultrathin nanolayer interface on 4.5 V LiCoO2 cathode to realize poly (ethylene oxide) cycling stability


Identifying high-order plasmon modes in silver nanoparticle-over-mirror configuration


Self-Induced Ge-Doped HfO2 Applied to Ge Stacked Nanowires Ferroelectric Gate-all-Around Field-Effect Transistor with Steep Subthreshold Slope Under O3 Treatment with …


Reduction in Gap State Density near Valence Band Edge at Al2O3/p‐type GaN Interface by Photoelectrochemical Etching and Subsequent SiO2 Cap Annealing


Direct Analysis of Stacked Au/Ti/In2O3/Al2O3/p+-Si Transport Mechanisms Using Operando Hard X-ray Photoelectron Spectroscopy


Properties of AZO films grown by ALD applied as a TCO layer in perovskite solar cells


Tailoring the interface in tungsten doped cobalt sulfide positive electrode with ultrathin cobalt oxide atomic layer for high performance energy storage application


Comparative Performance of Fluorite-Structured Materials for Nanosupercapacitor Applications


Antiover-Reduction of Ni/In2O3 Nanocatalysts by Atomic Layer Deposition of Al2O3 Films for Durable CO2 Hydrogenation to Methanol


Engineering Ferroelectric HZO with n+-Si/Ge Substrates Achieving High 2Pr =84 μC/cm2 and Endurance > 1E11


Correlating the coating cycles, integrity and magnetic properties of Fe-Ni-Mo soft magnetic composites by a powder atomic layer deposition method


Atomic layer deposition (ALD) of 2D MoS2 for soft gripper application


Diamond-lattice photonic crystals assembled from DNA origami


Substrate temperature effects on PEALD HfAlO dielectric films for IGZO-TFT applications


Applications of low-valent compounds with heavy group-14 elements


Improving quality of AlN films on GaAs substrate via in-situ plasma pre-treatment in plasma enhanced atomic layer deposition


Modulating Charge Storage Mechanism of Cobalt-Tungsten Nitride Electrodes Using In Situ Formed Metal-pn Heterojunction for Ultrahigh Energy Density …


[PDF] Next Materials


[HTML] Copper catalysts for CO2 hydrogenation to CO through reverse water–gas shift reaction for e-fuel production: Fundamentals, recent advances, and prospects


Selectively Located Pt Clusters on Au/CeO2 for Highly Robust Water-Gas Shift Reaction via Atomic Layer Deposition


 

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