Sunday Dose of ALD week 17, 2024. Read all ALD related scientific articles of April 22 - 28

Scientific articles related to ALD/MLD/ALE/VPI        

 April 22 - 28, 2024


Efforts of implementing ultra‐flexible thin‐film encapsulation for optoelectronic devices based on atomic layer deposition technology

HfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer

Direct characterization of interface sites in Au/TiO2 catalysts prepared using atomic layer deposition

[PDF] Simplifying HigH-Density memory: exploiting Self-rectifying reSiStive memory witH tio2/Hfo2 Bilayer DeviceS

[PDF] Selective Detection of H

Plasma atomic layer etching of SiO2 with a low global warming potential fluorocarbon precursor (C6F6)

Atomic layer annealing for spatial tailoring in sub-4 nm AlN RRAM devices with low-voltage operation

The N egative D ifferential R esistance E ffect of S ubstitutional D oped M onolayer GeS and its A pplication in G as S ens or

Design Guidelines for Oxide Semiconductor Gain Cell Memory on a Logic Platform

Enhanced electrochemical performances and mechanistic understanding of nitrogen-doped porous carbon nanofibers with adjustable porosity for use as freestanding …

An innovative strategy towards highly efficient flame-retardant silk

A channel-homogenized micro gas chromatography column for light alkane separation with uniform HKUST-1 stationary phase

P-GaN/p-AlGaN/AlGaN/GaN heterojunction field-effect transistor with a threshold voltage of 6 V

Interface-Engineered Atomic Layer Deposition of 3D Li4Ti5O12 for High-Capacity Lithium-Ion 3D Thin-Film Batteries

Controllable Interface Engineering for the Preparation of High Rate Silicon Anode

Solid and Polymer Electrolyte Materials and Related Processing Methods Suitable for Three-Dimensional Battery Architectures

Ultrathin Al2O3 film modification on waterborne epoxy coatings by atomic layer deposition for augmenting the corrosion resistance

Atomic layer deposition of Y2O3 as high-k dielectrics by using a heteroleptic yttrium precursor and water

[PDF] Atomic Layer Deposition of Cobalt at Low Temperatures

Effect of substrate temperature on growth mechanism and properties of PEALD-MgO dielectric films for amorphous-IGZO TFTs

Solution Processing Silicon Heterojunction Photocathode for Efficient and Stable Hydrogen Production


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