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Sunday Dose of ALD week 16, 2024. Read all ALD related scientific articles of April 15 - 21

Scientific articles related to ALD/MLD/ALE/VPI        

 April 15 - 21, 2024

 


Atomic Layer Deposition Films for Resistive Random‐Access Memories


Temperature-Dependent Hydrogen Modulations of Ultra-Scaled a-IGZO Thin Film Transistor Under Gate Bias Stress


Tuning the Thermal Conductivity of Organic-Inorganic Double-Shell Thermal Storage Microcapsules triggered by atomic layer deposition


Interface Defect Formation for Atomic Layer Deposition of SnO2 on Metal Halide Perovskites


Evidence for reversible oxygen ion movement during electrical pulsing: enabler of the emerging ferroelectricity in binary oxides


Study of precisely controlled selective isotropic quasi-ALE of SiGe


A novel kinetic framework-based multiscale modeling of spatial atomic layer deposition process


New oxidants for thermal atomic layer etching of Cu


Amorphous zinc-imidazolate all-dry resists


Development of ALD precursors for low resistivity Zr, Hf, and Nb nitride films


Directed self-assembly: PS-b-PMMA materials readiness and high-chi platforms for extended geometry scaling


Selective Detection of H2 Gas in Gas Mixtures Using NiO‐Shelled Pd‐Decorated ZnO Nanowires


Impact of interface and surface oxide defects on WS2 electronic properties from first-principles


Dense and Uniform Integration of Cu-BDC Particles on a Nafion Film for a High-Performance Hydrogen-Producing Device


Highly Scaled BEOL-Compatible Thin Film Transistors With Ultrathin Atomic Layer Deposited Indium–Tin–Zinc–Oxide Channel


Design and High-Frequency Characterization of a Wafer-Scale Vertical Bridge Structure Nanoscale Vacuum Electronic Device


Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD


Enhanced cyclability of lithium-ion batteries resulting from atomic layer deposition of Al2O3 on LiFePO4 electrodes


Low global warming gases for plasma etching processes


Vapor-phase infiltration (VPI)/sequential infiltration synthesis (SIS) for advanced patterning applications


Vertically tailored hybrid multilayer EUV photoresist with vertical molecular wire structure


Applying area-selective atomic layer deposition for high-precision pattern transfer


Enabling advanced patterning through area selective deposition: applications, challenges and road to high volume manufacturing


Area-selective deposition and bottom-up approaches: an overview of applications in IC manufacturing


Pattern shaping optimization and applications


Atomic layer deposition of boron nitride on carbon nanotubes for fabricating one-dimensional van der Waals heterostructures


Advanced Optical Control through Atomic Layer Surface Engineering


Polypeptoid brushes as growth-promoters in vapor phase infiltration for area-selective deposition of aluminum oxide hard masks


On the reduction of gas permeation through the glass windows of micromachined vapor cells using AlO coatings


Overlapping Top Gate Electrodes based on Low Temperature Atomic Layer Deposition for Nanoscale Ambipolar Lateral Junctions


Atomic Layer Deposited TiO 2 Nanofilm on titanium implant for reduced the release of particles


Laser chemical processing of nanomaterials


Toward injection lasing in halide perovskite semiconductors


High on-chip gain spiral Al2O3:Er3+ waveguide amplifiers


Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers


Area-selective atomic layer deposition of Ru thin films by chemo-selective inhibition of alkyl aldehyde molecules on nitride surfaces


Recent Advances in Vacuum-and Laser-based Fabrication Processes for Solar Water-splitting Cells


The effects of substrate interaction on the chemical properties of atomic layer deposited ultrathin ceria layers


Wafer-scale Deep UV Si Photodiodes Based on Ultra-shallow Junction


High-Speed and Low-Power Ferroelectric HfO 2 /ZrO 2 Superlattice FinFET Memory Device Using AlON Interfacial Layer


 

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