Sunday Dose of ALD week 16, 2024. Read all ALD related scientific articles of April 15 - 21

Scientific articles related to ALD/MLD/ALE/VPI        

 April 15 - 21, 2024


Atomic Layer Deposition Films for Resistive Random‐Access Memories

Temperature-Dependent Hydrogen Modulations of Ultra-Scaled a-IGZO Thin Film Transistor Under Gate Bias Stress

Tuning the Thermal Conductivity of Organic-Inorganic Double-Shell Thermal Storage Microcapsules triggered by atomic layer deposition

Interface Defect Formation for Atomic Layer Deposition of SnO2 on Metal Halide Perovskites

Evidence for reversible oxygen ion movement during electrical pulsing: enabler of the emerging ferroelectricity in binary oxides

Study of precisely controlled selective isotropic quasi-ALE of SiGe

A novel kinetic framework-based multiscale modeling of spatial atomic layer deposition process

New oxidants for thermal atomic layer etching of Cu

Amorphous zinc-imidazolate all-dry resists

Development of ALD precursors for low resistivity Zr, Hf, and Nb nitride films

Directed self-assembly: PS-b-PMMA materials readiness and high-chi platforms for extended geometry scaling

Selective Detection of H2 Gas in Gas Mixtures Using NiO‐Shelled Pd‐Decorated ZnO Nanowires

Impact of interface and surface oxide defects on WS2 electronic properties from first-principles

Dense and Uniform Integration of Cu-BDC Particles on a Nafion Film for a High-Performance Hydrogen-Producing Device

Highly Scaled BEOL-Compatible Thin Film Transistors With Ultrathin Atomic Layer Deposited Indium–Tin–Zinc–Oxide Channel

Design and High-Frequency Characterization of a Wafer-Scale Vertical Bridge Structure Nanoscale Vacuum Electronic Device

Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD

Enhanced cyclability of lithium-ion batteries resulting from atomic layer deposition of Al2O3 on LiFePO4 electrodes

Low global warming gases for plasma etching processes

Vapor-phase infiltration (VPI)/sequential infiltration synthesis (SIS) for advanced patterning applications

Vertically tailored hybrid multilayer EUV photoresist with vertical molecular wire structure

Applying area-selective atomic layer deposition for high-precision pattern transfer

Enabling advanced patterning through area selective deposition: applications, challenges and road to high volume manufacturing

Area-selective deposition and bottom-up approaches: an overview of applications in IC manufacturing

Pattern shaping optimization and applications

Atomic layer deposition of boron nitride on carbon nanotubes for fabricating one-dimensional van der Waals heterostructures

Advanced Optical Control through Atomic Layer Surface Engineering

Polypeptoid brushes as growth-promoters in vapor phase infiltration for area-selective deposition of aluminum oxide hard masks

On the reduction of gas permeation through the glass windows of micromachined vapor cells using AlO coatings

Overlapping Top Gate Electrodes based on Low Temperature Atomic Layer Deposition for Nanoscale Ambipolar Lateral Junctions

Atomic Layer Deposited TiO 2 Nanofilm on titanium implant for reduced the release of particles

Laser chemical processing of nanomaterials

Toward injection lasing in halide perovskite semiconductors

High on-chip gain spiral Al2O3:Er3+ waveguide amplifiers

Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers

Area-selective atomic layer deposition of Ru thin films by chemo-selective inhibition of alkyl aldehyde molecules on nitride surfaces

Recent Advances in Vacuum-and Laser-based Fabrication Processes for Solar Water-splitting Cells

The effects of substrate interaction on the chemical properties of atomic layer deposited ultrathin ceria layers

Wafer-scale Deep UV Si Photodiodes Based on Ultra-shallow Junction

High-Speed and Low-Power Ferroelectric HfO 2 /ZrO 2 Superlattice FinFET Memory Device Using AlON Interfacial Layer


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