A Study on the Dielectric TiO2 Films for Fabrication of 3-D Structural Capacitor and Promising Electrodes for Next-generation DRAM Capacitor

Author

Cheol Jin Cho

Year

2019

Abstract & Cover

Source of Information

Cheol Seong Hwang

University

Seoul National University

(Seoul, Korea)

Other notes

http://dcollection.snu.ac.kr/common/orgView/000000154523

External Link