Atomic Layer Deposition

Atomic Layer Deposition

ALD PRODUCTS

 

Manufacturer
Veeco
Product model
Savannah G2
Type of product
Deposition Tool
Description

Savannah® has become the preferred system for university researchers worldwide engaged in ALD and looking for an affordable yet robust platform. We have delivered hundreds of these systems in the past decade. Savannah®’s efficient use of precursors and power-saving features substantially reduces the cost of operating a thin film deposition system.

Savannah® is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Savannah® is available in three configurations: S100, S200, and S300. Savannah® is capable of holding substrates of different sizes (up to 300mm for the S300). The Savannah® thin film deposition systems are equipped with heated precursors lines and the option to add up to six lines. Savannah® is capable of handling gas, liquid, or solid precursors.

Scientific open access publications where the Savannah has been used are listed here.

Technical features

Key Features:

  • In-Situ Ellipsometry
  • In-Situ QCM
  • Self Assembling Monolayers
  • 2-Second Cycle Times
  • Integrated Ozone
  • Low Vapor Pressure Deposition
  • Batch Processing
  • Glove Box Integration

Specifications:

Substrate Size

Savannah S100: up to 100 mm
Savannah® S200: up to 200 mm
Savannah® S300: up to 300 mm

Dimensions (w x d x h)

Savannah S100: 585 x 560 x 980 mm
Savannah® S200: 585 x 560 x 980 mm
Savannah® S300: 686 x 560 x 980 mm

Cabinet

Steel with white powder coat paint with removable panels and lockable precursor door

Operational Modes

Continuous Mode™ (high speed) or Exposure Mode™ (ultra-high aspect ratio)

Power

115 VAC or 220 VAC,1500 W (excluding pump)

Controls

LabVIEW™, Windows™ 7, Lenovo Laptop, USB control

Maximum Substrate Temperature

S100: RT – 400 °C
S200: RT – 350 °C
S300: RT – 350 °C

Deposition Uniformity

(Al2O3) <1% (1σ)

Cycle Time

<2 seconds per cycle with Al2O3 at 200 °C

Vacuum Pump

Alcatel 2021C2 – 14.6 CFM

Compatibility

Clean room class 100 compatible

Compliance

CE, TUV, FCC

Precursor Delivery System, Ports

2 lines standard, up to 6 lines available
Each line accommodates solid, liquid and gas precursors
Lines can be independently heated up to 200 °C

Precursor Delivery System, Valves

Industry standard high speed ALD valves with 10 msec response time

Precursor Cylinders

Individually heated 50 ml stainless steel cylinders, optional larger cylinders available

Carrier/Venting Gas

N2 mass flow controlled, 100 SCCM

Options

Low Vapor Pressure Delivery (LVPD) System
Ozone Generator
Dome lid for wafer cassette or 3D objects
Glove box Interface
In-Situ Ellipsometry
In-Situ Quartz Crystal MicroBalance (QCM)
Self Assembling Monolayers (SAMs)
Particle Coating

Product Links
Veeco Savannah G2 manufacturer page
Veeco Savannah G2 Video
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