Atomic Layer Deposition
ALD PRODUCTS
ALD Systems
- Manufacturer
- EugeneTech
- Product model
- The BlueJay™
- Type of product
- Single Thermal LPCVD System
- Description
The BlueJay-e™ : Next generation, compact version offering the same process advantages with a smaller footprint and lower CO2
The BlueJay™: Temperature uniformity control and tunable process gas flow in our multi-chamber, single wafer platform offer unique process flexibility, excellent film thickness uniformity and repeatability, lower thermal budgets and ease of tool matching.
- Technical features
Specifications:
- Independent Dual Zone Temperature Control for Better Film Uniformity
- Up to 800°C Process Capability
- High Throughput
- Optimized Design Based on the Computational Flow Dynamics (CFD)
- Flexible Gas Panel Configuration
- Centralized Architecture Using Device Net Protocol
Benefits:
- Excellent Thickness Uniformity & Reproducibility
- Lower Thermal Budget vs. Traditional Batch Furnaces
- Lower Particle Generation via In-situ Dry Cleaning
- Multiple Applications with Versatile Gas Options
- Industry Standard Tool with Production-proven Platform
Applications:
SI
NAND
DRAM
- Low Temp a-Si
- Ultra Thin a-Si
- Hardmask a-Si
- STI Liner a-Si- Deposited Gate Oxide
3D
- 3D NAND Channel Si
- 3D NAND Oxide/Niride
StackPlanar
- Floating Gate Nano Poly
Si
- Control Gate Gap Fill
Si
- Hardmask Nitride
- Si rich Nitride
- Hardmask a-Si- Low Temp a-Si for Multiple Patterning
- Capacitor plate electrode SiGe(B)
- Buried Gate Capping Nitride
- Hardmask Nitride
- Hardmask a-Si
- Capacitor Mold Si
- Contact Gap Fill Si- Independent Dual Zone Temperature Control for Better Film Uniformity
- Product Links
-
EugeneTech The BlueJay™ manufacturer page
