Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications, 2nd edition

Tommi Kääriäinen (Author), David Cameron (Author), Marja-Leena Kääriäinen (Author), Arthur Sherman (Author)
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials. Publisher: Wiley-Scrivener; 2nd edition (May 28, 2013), 272 pages.

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