This book provides a detailed study of the Atomic Layer Epitaxy technique (ALE), its development, current and potential applications. The rapid development of coating technologies over the last 25 years has been instrumental in generating interest and expertise in thin films of materials, and indeed the market for thin film coatings is currently £3 billion with projected annual growth of 20 to 30% [1]. ALE is typical of thin-film processes in that problems in the processing or preparation of good quality epitaxial films have been overcome, resulting in better performance, novel applications of previously unsuitable materials, and the development of new devices. Many materials exhibit interesting and novel properties when prepared as thin films and doped. Vapour-deposited coatings and films are used extensively in the semiconductor and related industries for making single devices, integrated circuits, microwave hybrid integrated circuits, compact discs, solar reflective glazing, fibre optics, photo voltaic cells, sensors, displays, and many other products in general, everyday use. The ALE technique was developed by a research team led by Tuomo Suntola, working for Instrumentarium Oy in Finland. The key members of this team were lorma Antson, Arto Pakkala and Sven Lindfors. In 1977, the research team moved from Instrumentarium to Lohja Corporation, where they continued the development of ALE and were granted a patent in the same year. By 1980, the technique was sufficiently advanced that they were producing flat-screen electroluminescent displays based on a manganese-doped zinc sulphide layer. Publisher ‏: ‎ Springer; 1st edition (October 31, 1989), 280 pages.

Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors. Part of the book series: Topics in Organometallic Chemistry (TOPORGAN, volume 9).Gas-Phase Thermochemistry and Mechanism of Organometallic Tin Oxide CVD PrecursorsMark D. Allendorf, A. M. B. van MolMaterials Chemistry of Group 13 NitridesAnjana Devi, Rochus Schmid, Jens Müller, Roland A. FischerSingle-Source-Precursor CVD: Alkoxy and Siloxy Aluminum HydridesMichael VeithCVD Deposition of Binary AlSb and GaSb Material Films -- a Single-Source ApproachStephan SchulzOrganometallic Precursors for Atomic Layer DepositionMatti Putkonen, Lauri NiinistöSurface Reactivity of Transition Metal CVD Precursors: Towards the Control of the Nucleation StepPhilippe Serp, Jean-Cyrille Hierso, Philippe KalckOrganometallic and Metallo-Organic Precursors for NanoparticlesM. A. Malik, P. O'Brien 

This monograph is the first text to review the subject of Atomic Layer Deposition (ALD) comprehensively. It not only covers its application to microelectronics, but also many important new and emerging applications in Nanotechnology. It is the culmination of over 10 years of pioneering research and development by the author. Not only does it cover thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides, but also reviews the formation of mixed and multilayer materials. Also, the newer radical enhanced technology is described and evaluated. Finally, the author presents some of the most recent applications of ALD to the emerging field of Nanotechnology. These include MEMS, solar cells, optical coatings, and organic/inorganic films among others. This treatment of an important and emerging technology will be particularly useful to engineers and scientists both in industry and universities.  Publisher: Ivoryton Press; First edition (June 16, 2008), Hardcover: 256 pages

Among the many atomic/molecular assembling techniques used to develop artificial materials, molecular layer deposition (MLD) continues to receive special attention as the next-generation growth technique for organic thin-film materials used in photonics and electronics.Thin-Film Organic Photonics: Molecular Layer Deposition and Applications describes how photonic/electronic properties of thin films can be improved through MLD, which enables precise control of atomic and molecular arrangements to construct a wire network that achieves "three-dimensional growth". MLD facilitates dot-by-dot—or molecule-by-molecule—growth of polymer and molecular wires, and that enhanced level of control creates numerous application possibilities.Explores the wide range of MLD applications in solar energy and optics, as well as proposed uses in biomedical photonicsThis book addresses the prospects for artificial materials with atomic/molecular-level tailored structures, especially those featuring MLD and conjugated polymers with multiple quantum dots (MQDs), or polymer MQDs. In particular, the author focuses on the application of artificial organic thin films to:Photonics/electronics, particularly in optical interconnects used in computersOptical switching and solar energy conversion systemsBio/ medical photonics, such as photodynamic therapyOrganic photonic materials, devices, and integration processesWith its clear and concise presentation, this book demonstrates exactly how MLD enables electron wavefunction control, thereby improving material performance and generating new photonic/electronic phenomena.Publisher ‏ : ‎ CRC Press; 1st edition (March 2, 2011), 370 pages.

HgCdTe or Mer-Cad-Tel is the most widely used Infrared material. The present study describes the growth of MCT via Electrochemical ALD, using an automated electrochemical flow cell deposition system. Deposits were characterized using X-ray diffraction (XRD), electron probe microanalysis (EPMA) and reflection absorption Fourier transform Infrared spectroscopy (FTIR). As deposited films showed a strong (111) preferred orientation. Changes in deposit composition showed the expected trend in band gaps: the more Hg the lower the band gap, but with some significant deviations. Electrochemical quartz crystal microbalance (EQCM) studies, using an automated flow cell, indicated that some deposited Cd was stripping at potentials used to deposit Hg. In addition, redox replacement of deposited Cd for Hg was evident, a function of the greater stability of Hg than Cd. Publisher: LAP LAMBERT Academic Publishing (April 6, 2011), 116 pages.

Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). Publisher: Wiley-VCH; 1st edition (September 19, 2012), 472 pages.

This book will be mainly devoted to demonstrate the rich phenomenology exhibited by fine powders when they are fluidized by a gas flow. Fine powder cohesiveness leads to poor flowability, clumping, difficulty in fluidizing, irregular avalanching behavior, etc. Despite all the inconveniences, fine powder processes pervade the chemical, pharmaceutical, agricultural and mining industries among others. The author in this book analyzes the mechanism by which interparticle adhesive forces are reduced by means of surface additives. Different techniques have been developed in the last years to assist fluidization by helping the gas flow to mobilize and break cohesive aggregates, which help to homogenize fluidization. As reviewed in this book, the use of these techniques may have a relevant impact on novel processes based on fluidized beds of fine powder and with relevant applications on leading edge technologies such as Atomic Layer Deposition on nanoparticles and CO2 capture by gas-fluidized beds of adsorbent powders. The study of fluidized beds has a marked interdisciplinary character.  This book is thus intended for academic and industrial researchers in applied physics, mechanical, chemical, and environmental engineering, who are interested in the special characteristics of fine powders.Table of Contents:Introduction. The Classical Geldart’s Diagram and the New Type of Gas-Fluidization BehaviorThe Structure of Geldart A Gas-Fluidized BedsMagnetic Stabilization of Fluidized Beds of Magnetizable ParticlesThe Fluidlike Behavior of Granular Materials Fluidized by LiquidsThe Fluidlike Behavior of Fine and Ultrafine Powders Fluidized by GasOn the Question of Fluid-Like Fluidization StabilityDynamic Aggregation of Fine Particles in Gas-Fluidized BedsThe Modified Geldart’s DiagramFluidization of NanopowdersEffect of Gas Viscosity on the Fluidization Behavior of Fine PowdersFluidlike Fluidization as Affected by External FieldsThe Use of Additives to Control Powder Flow. Mechanical Properties of Fine Powder BedsFluidization Assistance Techniques 

With the development of new synthetic procedures and technological processes, the interest in biomimicry has gathered rejuvenation in the past decades. One particularly interesting research method is the atomic layer deposition (ALD), which was established in various fields of technology as a vacuum-based chemical-processing technique and enabler for the deposition of extremely thin functional coatings. The benefits of this technology over similar techniques make it increasingly attractive for applications in biomimicry. In this chapter, short descriptions of the technology and its benefits and drawbacks are given. Subsequently, we summarize development in various research topics involving ALD and biomimicry. Publisher: Elsevier (May 24, 2013), 45 pages.

Ultra-thin films can be coated on primary fine particles without significant aggregation by atomic layer deposition (ALD) in a fluidized bed reactor. Precursor doses can be delivered to the bed of particles sequentially and, in most cases, can be utilized at nearly 100% efficiency without precursor breakthrough and loss, with the assistance of an inline downstream mass spectrometer. A multitude of applications can be addressed in a competitive fashion using fine particles that have been surface-modified using ALD in scalable, high-throughput unit operations. Several examples of the applications of conformal ALD coatings have been discussed, including oxidation-resistant metals or ceramics, coatings that enable biomedical applications including tissue engineering, and corrosion-resistant particles for next-generation batteries, capacitors or fuel cells. It is expected that the technology of thin film coating by particle ALD will play a major role in the field of advanced materials. Publisher ‏ : ‎ Woodhead Publishing (July 31, 2013), 52 pages.

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials. Publisher: Wiley-Scrivener; 2nd edition (May 28, 2013), 272 pages.

III-nitride compound semiconductors (AlN, GaN, InN) and their alloys have emerged as versatile and high-performance materials for a wide range of electronic and optoelectronic device applications. Although high quality III-nitride thin films can be grown at high temperatures (>1000 °C) with significant rates, deposition of these films on temperature-sensitive device layers and substrates necessitates the adaptation of low-temperature methods such as atomic layer deposition (ALD). When compared to other low-temperature thin film deposition techniques, ALD stands out with its self-limiting growth mechanism, which enables the deposition of highly uniform and conformal thin films with sub-angstrom thickness control. These unique characteristics make ALD a powerful method especially for depositing films on nanostructured templates, as well as preparing alloy thin films with well-defined compositions. This monograph reports on the development of low-temperature (≤200 °C) plasma-assisted ALD processes for III-nitrides, and presents detailed characterization results for the deposited thin films and fabricated nanostructures. Publisher: LAP LAMBERT Academic Publishing (March 17, 2014), 180 pages.

Table of Contents available here.Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device. Publisher : ‎ Springer; 2014th edition (October 18, 2013), 479 pages.From the Back Cover: Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area  for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discusses ALD for all modern semiconductor devices, the basic chemistry of ALD, and models of ALD processes. The book also details ALD for both mass produced memories and emerging memories. Each chapter of the book provides history, operating principles, and a full explanation of ALD processes for each device.About the Author: Cheol Seong Hwang received M.S. and Ph.D. degrees from Seoul National University, Seoul, Korea, in 1989 and 1993, respectively. In 1993, he joined the Material Science and Engineering Laboratory at the National Institutes of Standards and Technology, Gaithersburg, MD, as a Postdoctoral Research Fellow. He then joined Samsung Electronics Company, Ltd., as a Senior Researcher in 1994. In 1998, Dr. Hwang became a professor in the department of material science and engineering at Seoul National University. He has authored or coauthored more than 380 papers in international peer-reviewed scientific journals, which have been cited more than 7,500 times.Dr. Hwang was a recipient of the Alexander von Humboldt Fellowship Award, the 7th Presidential Young Scientist Award of the Korean government, and Faculty Excellent Award of Air Products, USA.

Vacuum Deposition onto Webs: Films and Foils, Third Edition, provides the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coating than deposition onto single pieces or non-flexible surfaces such as glass. This technology has been used in industrial-scale applications for some time, including a wide range of metalized packaging. Its potential as a high-speed, scalable process has seen an increasing range of new products emerging that employ this cost-effective technology, including solar energy products that are moving from rigid panels onto cheaper and more versatile flexible substrates, flexible electronic circuit ‘boards’, and flexible displays.  In this third edition, all chapters are thoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest developments in Atomic Layer Deposition (ALD).Provides the know-how to maximize productivity of vacuum coating systemsThoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest on Atomic Layer Deposition (ALD)Presents the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coatingEnables engineers to specify systems more effectively and enhances dialogue between non-specialists and suppliers/engineersEmpowers those in rapidly expanding fields such as solar energy, display panels, and flexible electronics to unlock the potential of vacuum coating to transform their processes and products.Publisher ‏ : ‎ William Andrew; 3rd edition (August 15, 2015),  519 pages

Nano-optical devices are gaining rapid finding applications in many areas, from sensors to biomolecular devices based on thin films. The precise atomic scale film thickness control and uniformity is a backbone for maintaining propagating optical modes through the waveguide nanostructures fabricated by lithography. Lithography is the key technology that has driven the dynamic growth in the microelectronics and nanophotonics industries over the past three decades. Lithography together with Atomic Layer Deposition (ALD) is a powerful tool for the size reduction of accurately fabricated nanostructures and devices. Replicated Nanophotonic structures in different optical polymer materials are achieved by Nanoimprinting Lithography technology which are employed to augment cost-effective methods and aid for rapidly growing Nanoencapsulation technologies. The design and fabrication of such Resonant Waveguide Gratings (RWGs) for different applications are presented herein. The book also describes the thermo-optic coefficients of various organic and inorganic materials for athermal operation of RWGs over a wide range of temperatures and Polarization-independent subwavelength RWGs.Publisher ‏ : ‎ Scholars' Press (March 24, 2015), Paperback ‏ : ‎ 204 pages

Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.Table of Contents PrefaceChapter 1Fluorine Doping Behavior in Zn-Based Conducting Oxide Film Grown by Atomic Layer Deposition(Hyung-Ho Park, Young-June Choi and Kyung-Mun Kang, Department of Materials Science and Engineering, Yonsei University, Seoul, Korea)Chapter 2Atomic Layer Deposition of Sub-Nano to Nanoscale Surface Coatings for Next-Generation Advanced Battery Systems(Xiangbo Meng and Jeffrey W. Elam, Energy Systems Division, Argonne National Laboratory, Argonne, Illinois, USA)Chapter 3Atomic Layer Deposition for Novel Nonvolatile Memory Devices(Ai-Dong Li, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, P. R. China)Chapter 4Theoretical Calculation on Mechanism of Thermal and Plasma-Enhanced Atomic Layer Deposition of SiO2(Guo-Yong Fang, Li-Na Xu and Ai-Dong Li, National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China)Chapter 5Platinum Nano- Thin Film for Plasmonic Photocatalytic Reaction(Hung Ji Huang and Bo-Heng Liu, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan)Book Details:Publisher ‏ : ‎ Nova Science Pub Inc; UK ed. edition (December 1, 2015)Language ‏ : ‎ EnglishHardcover ‏ : ‎ 175 pagesISBN-10 ‏ : ‎ 1634838696ISBN-13 ‏ : ‎ 978-1634838696

This book deals with synthesis of high quality nanocoatings thin films of alumina, titania, and alumina/titania multilayers with 25 nm and 50 nm thickness by Atomic Layer Deposition (ALD) method on different implantable orthopedic alloys ( Co-28Cr-6Mo ASTM F75 and Stainless steel 316L), and then characterization the structure of thin films by advanced nanotechnology methods and facilities, study the localized corrosion resistance in SBF, determine the biocompatibility, and demonstrate the bioactivity. Publisher: Scholars' Press (January 15, 2016), 192 pages.

This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis.The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. We will finally conclude approaching the subjects of feature shape evolution and the connection between nano and reactor scales and will briefly present different advanced algorithms that can be used to effectively compute particle transport, in some cases borrowing from other disciplines such as radiative heat transfer. The book gathers in a single place information scattered over thirty years of scientific research, including the most recent results in the field of Atomic Layer Deposition. Besides a mathematical description of the fundamentals of thin film growth in nanostructured materials, it includes analytic expressions and plots that can be used to predict the growth using gas phase synthesis methods in a number of ideal approximations. The focus on the fundamental aspects over particular processes will broaden the appeal and the shelf lifetime of this book. The reader of this book will gain a thorough understanding on the coating of high surface area and nanostructured materials using gas phase thin film deposition methods, including the limitations of each technique. Those coming from the theoretical side will gain the knowledge required to model the growth process, while those readers more interested in the process development will gain the theoretical understanding will be useful for process optimization.Publisher: Springer; 1st ed. 2017 edition (November 30, 2016), 142 pages

In this work Atomic Layer deposition of niobium and titanium doped ZnO based Transparent Conductive Oxide (TCO) coatings were developed. The fundamentals required for the deposition and doping of ZnO TCOs are discussed. The various opto-electronic properties of the niobium and titanium doped ZnO films were determined and compared. A model was proposed to explain the various changes in the opto-electronic properties of these films. Publisher: Fraunhofer Verlag (January 20, 2017), 202 pages.

Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry. Publisher ‏ : ‎ Wiley-VCH; 1st edition (March 15, 2017), 312 pages.About the Author: Julien Bachmann is Professor of Inorganic Chemistry at the Friedrich-Alexander University of Erlangen-Nürnberg in Erlangen, Germany. He obtained his chemistry diploma from the University of Lausanne, Switzerland, and a PhD in inorganic chemistry from the Massachusetts Institute of Technology in Boston, USA. After an Alexander von Humboldt postdoctoral fellowship at the Max Planck Institute of Microstructure Physics in Halle, Germany, he was hired as a Junior Professor of Applied Physics at the University of Hamburg, Germany, before joining the faculty in Erlangen.

Chemisorption: Properties, Reactions and Uses opens by presenting chemisorption analysis by a pulse flow system for determining the metal nanosize for different heterogeneous catalysts. The authors show some examples of palladium, nickel, platinum, copper and gold nanoparticles supported on different supports, and discuss potentialities, criticalities and applicability of the technique. Following this, the synthesis of titanium oxide coatings on a high-porosity silicas surface with a regular pore structure was studied using a thermogravimetric setup with a McBain balance and atomic force microscopy. The kinetic dependences of chemisorption processes used in the molecular layering method were determined, and the difference in flow mechanisms and results of coating synthesis on meso- and microporous silicas are presented. The salt-ammonia chemisorption cycle has been extensively developed in many fields such as low-grade heat driven refrigeration, heat pump, thermal storage and power generation. As such, the kinetic models of salt-ammonia chemisorption were reviewed and discussed in this work, and the values of kinetic parameters in different models were summarized and listed for ammonia chemisorption. In the concluding study, heterophase textured films of vanadium dioxide on single-crystal silicon substrates have been synthesized by the sol–gel method from solutions of triethoxyvanadyl VO(OEt)3 in methyl cellosolve CH3OCH2CH2OH. The effect of ozone and ethanol vapor chemisorption on the parameters of the semiconductor–metal phase transition in vanadium dioxide VO2(B) are also studied.Table of ContentsPrefaceChapter 1. Chemisorption Analysis by a Pulse Flow System for the Determination of Metal Nanosize(Federica Menegazzo, Elena Ghedini, Tania Fantinel and Michela Signoretto, CATMAT Lab, Department of Molecular Sciences and Nanosystems, Ca’ Foscari University Venice and Consortium INSTM, RU of Venice, Venezia, Italy)Chapter 2. Features of Chemisorption Processes on the Surface of Meso- and Microporous Silicas(Eugene A. Sosnov and Anatoly A. Malkov, Saint-Petersburg State Institute of Technology, Russia)Chapter 3. Kinetic Models of Salt-Ammonia Chemisorption: An Overview and Comparison(Huashan Bao, Zhiwei Ma and Anthony Paul Roskilly, Sir Joseph Swan Centre for Energy Research, Newcastle University, Newcastle upon Tyne, UK)Chapter 4. Chemisorption as an Instrument of Modification and “Molecular Probing” of Surface Properties for Materials(Evgeny A. Tutov, Voronezh State Technical University, Voronezh, Russia)IndexPublisher ‏ : ‎ Nova Science Pub Inc (November 1, 2018)Language ‏ : ‎ EnglishPaperback ‏ : ‎ 131 pagesISBN-10 ‏ : ‎ 1536146943ISBN-13 ‏ : ‎ 978-1536146943Item Weight ‏ : ‎ 8 ouncesDimensions ‏ : ‎ 5.75 x 0.25 x 8.75 inches 

A guide to modifying and functionalizing the surfaces of polymers, including the chapter “Atomic Layer Deposition and Vapor Phase Infiltration”,  by Mark D. Losego and Qing Peng.Surface Modification of Polymers is an essential guide to the myriad methods that can be employed to modify and functionalize the surfaces of polymers. The functionalization of polymer surfaces is often required for applications in sensors, membranes, medicinal devices, and others. The contributors?noted experts on the topic?describe the polymer surface in detail and discuss the internal and external factors that influence surface properties.This comprehensive guide to the most important methods for the introduction of new functionalities is an authoritative resource for everyone working in the field. This book explores many applications, including the plasma polymerization technique, organic surface functionalization by initiated chemical vapor deposition, photoinduced functionalization on polymer surfaces, functionalization of polymers by hydrolysis, aminolysis, reduction, oxidation, surface modification of nanoparticles, and many more. Inside, readers will find information on various applications in the biomedical field, food science, and membrane science. This important book:-Offers a range of polymer functionalization methods for biomedical applications, water filtration membranes, and food science-Contains discussions of the key surface modification methods, including plasma and chemical techniques, as well as applications for nanotechnology, environmental filtration, food science, and biomedicine-Includes contributions from a team of international renowned expertsWritten for polymer chemists, materials scientists, plasma physicists, analytical chemists, surface physicists, and surface chemists, Surface Modification of Polymers offers a comprehensive and application-oriented review of the important functionalization methods with a special focus on biomedical applications, membrane science, and food science. ABOUT THE EDITORSJean Pinson, PhD, is Professor Emeritus of the Université Paris Diderot. He is interested in the functionalization and modification of polymer surfaces and the surface chemistry of diazonium salts.Damien Thiry, PhD, is Senior Researcher at the University of Mons (Chimie des Interactions Plasma-Surface (ChIPS)), Belgium. TABLE OF CONTENTSIntroduction xiii1 The Surface of Polymers 1by Rosica Mincheva and Jean-Marie Raquez1.1 Introduction 11.2 The Surface of Polymers 21.2.1 Definition of a Polymer Surface 21.2.2 Factors Determining a Polymer Surface 31.2.2.1 Internal Factors 31.2.2.2 External Factors 41.2.3 The Polymer Surface at a Microscopic Level 111.3 Properties of Polymer Surfaces at Interfaces 121.3.1 Surface Wettability 131.3.2 Surface Thermal Properties 151.3.2.1 Surface Tg 151.3.2.2 Surface Crystallization 171.4 Experimental Methods for Investigating Polymer Surfaces at Interfaces 211.5 Conclusions 21References 21Part I Gas Phase Methods 31 2 Surface Treatment of Polymers by Plasma 33Pieter Cools, Laura Astoreca, Parinaz Saadat Esbah Tabaei, Monica Thukkaram, Herbert De Smet, Rino Morent, and Nathalie De Geyter2.1 Plasma: An Introduction 332.1.1 Definition 332.1.2 Thermal Versus Nonthermal Plasma 342.1.3 The Formation of Nonthermal Plasma 352.1.4 Plasma Generation and Operating Conditions 372.1.4.1 Different Methods of Plasma Generation 372.1.4.2 DC Discharges 382.1.4.3 DC Pulsed Discharges 382.1.4.4 RF and MW Discharges 382.1.4.5 Dielectric Barrier Discharge (DBD) 392.1.4.6 Atmospheric Pressure Plasma Jet (APPJ) 402.1.4.7 Gliding Arc 412.1.5 Nonthermal Plasma for Polymer Surface Treatment 412.2 Applications of Plasma Surface Activation of Polymers 432.2.1 Adhesion Improvement 432.2.2 Packaging and Textile Applications 472.2.2.1 Printability Enhancement 472.2.2.2 Dyeability Improvement 472.2.2.3 Mass Transfer Changes 492.2.3 Biomedical Applications 502.2.3.1 Inert Synthetic Polymers 502.2.3.2 Biodegradable Polymers 532.3 Plasma Grafting 562.4 Hydrophobic Recovery 592.5 Conclusion 61References 613    A Joint Mechanistic Description of Plasma Polymers Synthesized at Low and Atmospheric Pressure 67Damien Thiry, François Reniers, and Rony Snyders3.1 Introduction 673.2 Plasma Polymerization 693.2.1 Plasma Fundamentals 703.2.2 Growth Mechanism 723.3 Probing the Plasma Chemistry 833.3.1 Optical Emission Spectroscopy 843.3.2 Mass Spectrometry 873.4 Conclusions 96References 974 Organic Surface Functionalization by Initiated CVD (iCVD) 107Karen K. Gleason4.1 Introduction 1074.2 Mechanistic Principles of iCVD 1084.3 Functional, Surface Reactive, and Responsive Organic Films Prepared by iCVD 1134.4 Interfacial Engineering with iCVD: Adhesion and Grafting 1274.5 Reactors for Synthesizing Organic Films by iCVD 1284.6 Summary 129References 1305 Atomic Layer Deposition and Vapor Phase Infiltration 135Mark D. Losego and Qing Peng5.1 Atomic Layer Deposition Versus Vapor Phase Infiltration 1355.2 Atomic Layer Deposition (ALD) on Polymers 1385.2.1 Chemical Mechanisms of ALD 1385.2.2 ALD on Polymers with Dense –OH Groups: Cellulose and Poly(vinyl alcohol) 1405.2.3 ALD onto “Unreactive” Polymer Substrates 1415.2.4 Applications of ALD Coated Polymers 1435.2.4.1 ALD Coated Cotton Fibers 1435.2.4.2 Applications for ALD Coatings on Other Polymers 1445.3 Vapor Phase Infiltration of Polymers 1455.3.1 Processing Thermodynamics and Kinetics of VPI 1455.3.1.1 Thermodynamics of Vapor-Phase Precursor Sorption into Polymers 1455.3.1.2 Kinetics of Precursor Diffusion During VPI 1475.3.1.3 VPI Processes Incorporating Both Penetrant Diffusion and Reaction 1485.3.1.4 Measuring the Thermodynamics and Kinetics of a VPI Process 1495.3.2 Applications of Vapor Phase Infiltrated Polymers 1505.3.2.1 Altering Mechanical Performance 1505.3.2.2 Contrasting Agent for Multi-phase Polymer Imaging 1525.3.2.3 Improved Chemical Resistance 1525.3.2.4 Patterning for Microsystems 1535.3.2.5 Vapor Diffusion Barriers 1545.3.2.6 Conducting Polymers and Hybrid Photovoltaic Cells 1545.3.2.7 Other Application Spaces 1555.4 Summary and Future Outlook for ALD and VPI on Polymers 156References 156Part II UV and Related Methods 161 6 Photoinduced Functionalization on Polymer Srfaces 163Kazuhiko Ishihara6.1 Introduction 1636.2 Improving the Surface Properties of Polymeric Materials by Photoirradiation 1656.3 Photoreaction of Polymers with Other Polymers 1666.3.1 Photoinduced Chemical Reaction Between Polymers 1666.3.2 Photoinduced Grafting at the Polymer Surface 1686.3.3 Preparation of High-functionality Surface by Photoinduced Graft Polymerization 1696.3.4 Application of Photoinduced Grafting Process to Artificial Organs 1726.4 Self-initiated Photoinduced Graft Polymerization 1746.4.1 Poly(ether ketone) as Photoinitiator for Graft Polymerization 1746.4.2 Effects of Inorganic Salts on Photoinduced Graft Polymerization in an Aqueous System 1786.5 Conclusion and Future Perspective 180References 1817 𝜸-Rays and Ions Irradiation 185Alejandro Ramos-Ballesteros, Victor H. Pino-Ramos, Felipe López-Saucedo,Guadalupe G. Flores-Rojas, and Emilio Bucio7.1 𝛾-Rays and Ions Irradiation 1857.2 Ionizing Radiation Sources 1867.3 𝛾-Ray-Induced Modifications 1867.3.1 Grafting Modifications 1867.3.1.1 Radiation-induced Grafting Methods 1887.3.1.2 Ionic Grafting 1927.3.1.3 RAFT-graft Polymerization 1937.3.1.4 Applications 1947.3.2 Cross-linking 1977.3.2.1 𝛾-Ray Cross-linking Modifications 1997.3.2.2 Cross-linking with Additives 2007.3.2.3 Industrial Applications 2017.4 Heavy Ion-Induced Modifications 2027.4.1 Polymers 2047.5 Conclusions 205Acknowledgments 206References 206Part III Chemical Methods 211 8 Functionalization of Polymers by Hydrolysis, Aminolysis, Reduction, Oxidation, and Some Related Reactions 213Dardan Hetemi and Jean Pinson8.1 Hydrolysis and Aminolysis 2138.1.1 PLA and Polyesters 2138.1.2 Hydrolysis 2148.1.3 Aminolysis 2148.1.4 PCL 2158.1.5 PET 2168.1.6 PMMA 2168.1.7 Cellulose 2178.2 Chemical Reduction 2208.2.1 PEEK 2208.2.2 PET 2258.2.3 PMMA 2278.2.4 PC 2278.2.5 PTFE 2298.3 Chemical Oxidation 2318.4 Non-covalent Surface Modification 2348.5 Conclusion 235References 2369 Functionalization of Polymers by Reaction of Radicals, Nitrenes, and Carbenes 241Jean Pinson9.1 Functionalization of Polymers by Reaction of Radicals 2419.1.1 Peroxides as Radical Initiators 2419.1.2 Hydrogen Peroxides as Radical Initiator 2449.1.3 Persulfates as Radical Initiators 2469.1.4 Oxygen as Radical Initiator 2489.1.5 Azo Compounds as Radical Initiator 2499.1.6 Diazonium Salts as Radical Initiator 2509.1.6.1 Polypyrrole 2519.1.6.2 Polyaniline 2519.1.6.3 Poly(3,4-ethylenedioxythiophene)–Poly(styrenesulfonate) (PEDOT:PSS) 2539.1.6.4 Polymethylmethacrylate (PMMA) 2549.1.6.5 Polypropylene (PP) 2559.1.6.6 Polyvinyl Chloride 2559.1.6.7 Cyclic Olefin Copolymers (COC) 2569.1.6.8 Polyetheretherketone (PEEK) 2569.1.6.9 PET (Polyethylene Terephthalate) 2579.1.6.10 Polysulfone Membranes 2589.1.6.11 Cation Exchange Membranes 2589.1.6.12 Fluoro Polymers 2599.1.6.13 Natural Polymers 2609.1.7 Alkyl Halides as Radical Initiator 2609.2 Surface Modification of Polymers with Carbenes and Nitrenes 2609.2.1 Carbenes 2619.2.2 Nitrenes 2649.3 Conclusion 267References 26810 Surface Modification of Polymeric Substrates with Photo- and Sonochemically Designed Macromolecular Grafts 273Fatima Mousli, Youssef Snoussi, Ahmed M. Khalil, Khouloud Jlassi, Ahmed Mekki, and Mohamed M. Chehimi10.1 Introduction 27310.1.1 Context 27310.1.2 Scope of the Chapter 27410.2 Surface-confined Radical Photopolymerization of Insulating Vinylic and Other Monomers 27410.2.1 Type I and Type II Photoinitiation Systems 27510.2.2 Simultaneous Photoinduced Electron Transfer and Free Radical Polymerization Confined to Surfaces 28210.2.3 Surface-initiated Photoiniferter 28410.2.4 “Brushing Up from Anywhere” Using Polydopamine Thin Adhesive Coatings 28410.2.5 Recent Trends in Surface-confined Photopolymerization (CRP) 28710.3 Surface-confined Photopolymerization of Conjugated Monomers 28910.3.1 Polypyrrole 29010.3.1.1 Mechanisms of Photopolymerization of Pyrrole 29010.3.1.2 Substrates for in Situ Photoinduced Polymerization of Pyrrole and Potential Applications 29110.3.2 Polyaniline 29410.3.2.1 Mechanisms of Photopolymerization of Aniline 29410.3.2.2 Substrates for in Situ Photoinduced Polymerization of Aniline 29810.4 Surface-confined Sonochemical Polymerization of Conjugated and Vinylic Monomers 29810.4.1 Insights into Sonochemistry: Origin of the Phenomenon and Mechanism of Polymer Synthesis 29810.4.2 Ultrasound-assisted Polymerization or Polymer Deposition over Organic Polymeric Substrates 30310.4.2.1 Sonopolymerization 30310.4.2.2 Ultrasonic Spray 30310.4.3 Sonopolymerization over Miscellaneous Types of Surface: Inorganic Polymeric Substrates 30510.5 Conclusion 306Acknowledgments 307References 307Part IV Applications 31711 Surface Modification of Nanoparticles: Methods and Applications 319Gopikrishna Moku, Vijayagopal Raman Gopalsamuthiram, Thomas R. Hoye, and Jayanth Panyam11.1 Introduction 31911.2 Polymers Used in the Preparation of Nanoparticles 32011.3 Common Biodegradable Polymers for Nanoparticle Fabrication 32011.3.1 Albumin 32011.3.2 Alginate 32011.3.2.1 Chitosan 32111.3.3 Gelatin 32211.3.4 Poly(lactide-co-glycolide) (PLGA) and Polylactide (PLA) 32211.3.5 Poly-ε-caprolactone (PCL) 32311.4 Fabrication of Nanoparticles 32311.5 Linker Chemistry for Attaching Ligands on Polymeric Nanoparticles 32411.5.1 Hydrazone Bond Formation 32711.5.2 Non-covalent Attachment 32811.6 Surface-functionalized Polymeric Nanoparticles for Drug Delivery Applications 32811.6.1 Polysaccharides 32911.6.2 Lipids 32911.6.3 Aptamers 33211.6.4 Antibodies 33211.6.5 Peptides 33311.6.5.1 Polyethylene Glycol (PEG) 33411.7 Characterization of Surface-modified Nanoparticles 33611.7.1 Particle Size 33611.7.2 Dynamic Light Scattering (DLS) 33711.7.3 Scanning Electron Microscopy (SEM) 33711.7.4 Transmission Electron Microscopy (TEM) 33911.7.5 Surface Charge 33911.7.6 Surface Hydrophobicity 34011.7.7 Fourier Transform IR (FTIR) Spectroscopy 34111.8 Summary/Conclusion 342References 34212 Surface Modification of Polymers for Food Science 347Valentina Siracusa12.1 Introduction 34712.2 Physical and Chemical Methods 34812.2.1 Gas Phase and Radiation 34912.2.1.1 Gas Phase 34912.2.1.2 Radiation 35012.2.2 Liquid and Bulk Phase Methods 35212.2.2.1 Adsorption Methods 35212.2.2.2 Desorption Method 35212.2.3 Interfacial Adhesion of Polymers 35312.2.4 Grafting and Polymerization 35412.3 Mechanical Method 35412.4 Biological Method 35412.5 Surface Modification of Polymer for Food Packaging 35512.5.1 Applications 35512.5.1.1 Surface Sterilization 35512.5.1.2 Printing 35512.5.1.3 Mass Transfer 35612.5.2 Polymers 35612.6 Conclusion 358References 35913 Surface Modification of Water Purification Membranes 363Anthony Szymczyk, Bart van der Bruggen, and Mathias Ulbricht13.1 Introduction 36313.2 Irradiation-Based Direct Polymer Modification 36513.2.1 Plasma Treatment 36513.2.2 UV Irradiation 36613.2.3 Irradiation with High Energy Sources 36813.3 Coatings 36913.3.1 Coatings from Gas Phase 36913.3.2 Coatings from Wet Phase 37113.4 Grafting Methods 37813.4.1 Grafting-to 37813.4.2 Grafting-from 38113.4.2.1 Plasma-Induced Graft Polymerization 38113.4.2.2 UV-Induced Grafting 38313.4.2.3 Grafting Induced by High Energy Radiations 38513.4.2.4 Grafting Initiated by Chemical/Electrochemical Means 38513.4.3 Controlled Grafting-from 38913.5 Conclusion 392References 39414 Surface Modification of Polymer Substrates for Biomedical Applications 399P. Slepicka, N. Slepičková Kasálková, Z. Kolská, and V. Švorčík14.1 Introduction 39914.2 Plasma Treatment 40014.3 Laser Modification 41114.3.1 Interaction with Cells 41114.3.2 Sensor Construction 41214.4 Conclusion 416Acknowledgments 417References 417Index 427 

Nanomaterials are becoming increasingly important photovoltaic technologies from absorbers to contacts. This book is dedicated to describing the novel materials and technologies for photovoltaics that derive from these new and novel approaches in solar technologies. Chapter 10 discusses spatial ALD for thin film solar cells. Atmospheric pressure spatial atomic layer deposition has recently gained traction as an attractive method for rapidly growing oxide thin films. In this chapter, we compare the reactors that have been developed in laboratories and in industry. We review the n-type and p-type materials that have been grown and discuss how these materials, with widely tunable properties, have been used to improve the performance of solar cells. In addition, we explore the use of AP-SALD in complex structures and discuss future opportunities of AP-SALD for solar cells. Dimensions link to the book here, to Chapter 10 here.We have collected a set of renowned experts in their respective fields as authors and their expertise covers a broad set of areas including novel oxides, quantum dots, CZTS and organic solar cells, as well as light management and reliability testing. The organization of the book is divided into three sections; the first part deals with emerging photovoltaic absorbers and absorber approaches, the second part is focused on novel solar cell architectures and device concepts and components; and the last part is focused on their integration into module technologies. The first chapter is an introduction to the basics of solar cells technology facilitating an understanding by the non-expert of the following chapters. The book is intended for academics and professionals, at the research and R&D level in materials and devices, who are looking for opportunities for applications in the solar materials, devices and modules areas. Hopefully it will serve as a reference for students and professionals looking into the potential and development of novel photovoltaic technologies, researchers looking into the development of innovative projects, and teachers in the field of energy and sustainability.BOOK Table of ContentsPart I Novel micro– and nano– materials and concepts for photovoltaic absorbers1. Fundamental understanding of solar cells2. Oxide and ferroelectric solar cells3. Thin-film colloidal quantum dot solar cells4. Hot carrier thin film solar cells, François Gibelli, Laurent Lombez5. Kesterite: new progress toward earth-abundant thin-film photovoltaicPart II Novel micro– and nano– solar cells architectures and concepts6. Photon converters for photovoltaics7. Multifunctional optical coatings and Light Management for photovoltaics8. Hybrid multi-functional transparent conductors9. New directions for thin film organic solar cells: stability and performancePart III Micro– and nano–materials and concepts for modules10. Atmospheric Pressure Spatial Atomic Layer deposited metal oxides for thin film solar cells 11. Combined and Sequential Accelerated Stress Testing for Derisking Photovoltaic Modules

Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing - known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics. Publisher ‏ : ‎ Mdpi AG (August 11, 2020) 142 pages.

This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how the surface-precursor interaction governs atomic layer deposition processes. The underlying principles in atomic layer deposition rely on the chemistry of a precursor with a surface. Publisher ‏: ‎ De Gruyter; 1st edition (November 8, 2021), 225 pages.ContentsForewordChapter 1. Introduction1.1 Atomic layer deposition1.2 Precursor1.3 Adsorption1.4 Surface vs. substrate1.5 Monolayer1.6 Self-limiting1.7 Layer-by-layer growth1.8 Atomic layer deposition history1.9 Trimethyl aluminum and water1.10 Helpful resourcesChapter 2. Saturation2.1 The saturation curve2.2 Selectivity and saturation2.3 Steric bulk and saturation2.4 SelectivityChapter 3. Ligands3.1 Ligand bondingChapter 4. Precursors4.1 Atmospheric sensitivity4.2 Halide precursors4.3 Alkyl precursors4.4 General synthetic reactions4.5 Designing precursors4.6 Volatility4.7 Thermal stability4.8 ReactivityChapter 5. Thermolysis5.1 Definitions of thermal onset temperatures5.2 Thermogravimetry5.3 Differential scanning calorimetry5.4 Thermal range and figure of merit5.5 Decomposition testing5.6 Volatility control5.7 Impurity controlChapter 6. Nucleation6.1 Protonated surface nucleation sites6.2 Metal surface nucleation sites6.3 Hydride surfaces6.4 Surface blocking groups and selective area depositionChapter 7. ALD processes7.1 Alumina deposition7.2 Titanium nitride deposition7.3 Copper metal deposition7.4 Gold metal deposition7.5 Tin oxide depositionChapter 8. MLD processes8.1 Alucone deposition8.1.1 Bifunctional monomers8.2 Tetracyanoethylene deposition8.3 Alq3 deposition8.4 Kevlar deposition8.5 PEDOT depositionChapter 9 ALE processes9.1 Etching oxides9.2 Etching metalIndex

Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching.The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology.Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from:A complete discussion of the fundamentals of how to remove atoms from various surfacesAn examination of emerging etching technologies, including laser and electron beam assisted etchingA treatment of process control in etching technology and the role played by artificial intelligenceAnalyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and morePerfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.ABOUT THE AUTHORThorsten Lill is a Vice President for Emerging Etch Technologies and Systems at Lam Research, the market leader in etching tools for the semiconductor industry. He has been working in the field of plasma, radical, thermal, ion beam and plasma etching since 1995. He has a Ph.D. in Physics from the Albert-Ludwigs-University in Freiburg, Germany and was a post doc at the Argonne National Laboratory. He has a track record in developing commercially successful etching equipment for the semiconductor industry. He published 85 articles and 66 patents in the field. Thorsten Lill holds a certificate in Entrepreneurship and Innovation from Stanford University.

Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale-nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications. Publisher: Mdpi AG (January 13, 2021), Hardcover: 106 pages

Atomic layer deposition (ALD) is a gas-phase method to grow layers of solid materials with subnanometer precision. It has been invented independently in the Soviet Union in the 1960s under the name molecular layering, and in the 1970s in Finland under the name atomic layer epitaxy. ALD relies on alternatingly exposing a surface to gaseous reactants—separated by a purge step—that react in a self-terminating manner. This article introduces the fundamentals of the surface chemistry of ideal ALD, including saturating and irreversible reactions, growth per cycle, monolayer concepts relevant to ALD, typical surface reaction mechanisms, saturation-limiting factors, growth modes, area-selective ALD, growth kinetics, and conformality. It also discusses typical deviations from ideal ALD. Over the years, many different ALD process chemistries have been developed. A range of reactor systems is available, depending on the type of substrate and required productivity. ALD is broadly applicable in practice since it couples nanoscale precision with a good scalability and can be used to deposit a large variety of materials. In recent years, the interest in ALD has been growing strongly. The most important sector regarding commercial applications of ALD is currently the semiconductor industry. 

NoteThis book will become available in March 2023. SummaryThis book provides concepts and experimental demonstrations for various types of MLD and organic multiple quantum dots (Organic MQDs), which is a typical tailored organic thin-film material. Possible applications of MLD to optical interconnects, energy conversion systems, molecular targeted drug delivery, and cancer therapy are also proposed. First the author reviews various types of MLD processes including vapor-phase MLD, liquid-phase MLD, and selective MLD. Next, he introduces organic multiple quantum dots (Organic MQDs) that are typical tailored organic thin-film materials produced by MLD. The author then describes the design of light modulators/optical switches, predicts their performance, and discusses impacts of the organic MQDs on them. He then also discusses impacts of the organic MQDs on optical interconnects within computers and on optical switching systems. Finally the author presents MLD applications to molecular targeted drug delivery, photodynamic therapy, and laser surgery for cancer therapy. This book is intended for researchers, engineers, and graduate students in optoelectronics, photonics, and any other fields where organic thin film materials can be applied.About the AuthorTetsuzo Yoshimura was born in Tokyo, Japan in 1951, and graduated from Tokyo Metropolitan Aoyama High School in 1970. He received the B.Sc. degree in Physics from Tohoku University in 1974, and the M.Sc. and Ph.D. degrees in Physics from Kyoto University in 1976 and 1985, respectively. From 2001 to 2017, he was a professor at Tokyo University of Technology, where he extended the research on MLD-based nanotechnologies and SOLNET-based optoelectronics for optical interconnects, solar energy conversion systems, and cancer therapy. He is currently a professor emeritus at Tokyo University of Technology, a scientific writer, and a musician in a rock group, the TYNC.Product detailsPublisher ‏ : ‎ CRC Press; 1st edition (March 14, 2023)Language ‏ : ‎ EnglishHardcover ‏ : ‎ 432 pagesISBN-10 ‏ : ‎ 0367554747ISBN-13 ‏ : ‎ 978-0367554743Item Weight ‏ : ‎ 1.74 pounds