Small area high density plasma sources, such as some types of microwave and inductively coupled plasma (ICP) sources, are often used to supply plasma species over much larger areas, effectively diluting those species over the substrate area. The reason for this configuration is that back-flow of metalorganic into the plasma source and subsequent deposition on the dielectric liner can damage the source, gas flow must be maintained to prevent this. In contrast, Meaglow's large area plasma sources are immune to these detrimental effects, allowing high density plasma sources to be developed that are about the same size as the substrate and so that plasma species delivery can occur without area dilution. The first of of our large area sources was an 8" diameter source developed for the NASA Jet Propulsion Laboratory. It has been in operation for 6 years now, operating many months at a time without the need for removal from the system for cleaning. Since then three 12" sources and numerous 8" and 4" systems have been sold.

Technical features

• Conversion of commercial and home built ALD systems.
• 300 and 600 watt systems , higher power on demand.
• 4” and 8” wafer diameter, plus larger on request.
• 300 watt systems may not require water cooling
• Oxides, nitrides, other
• Low oxygen contamination (no dielectrics)
• High electron density – similar to or greater than inductively coupled and microwave plasma sources, up to 1012 cm-3 for some plasma conditions.
• Wide range of operating pressures (eg. from <20 mTorr to >5 Torr).
• Improved growth per cycle for many material systems